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A simple model of epitaxial growth

M. Biehl·W. Kinzel·S. Schinzer
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Abstract

A discrete solid-on-solid model of epitaxial growth is introduced which, in a simple manner, takes into account the effect of an Ehrlich-Schwoebel barrier at step edges as well as the local relaxation of incoming particles. Furthermore a fast step edge diffusion is included in 2+1 dimensions. The model exhibits the formation of pyramid-like structures with a well-defined constant inclination angle. Two regimes can be distinguished clearly: in an initial phase (I) a definite slope is selected while the number of pyramids remains unchanged. Then a coarsening process (II) is observed which decreases the number of islands according to a power law in time. Simulations support self-affine scaling of the growing surface in both regimes. The roughness exponent is alpha =1 in all cases. For growth in 1+1 dimensions we obtain dynamic exponents z = 2 (I) and z = 3 (II). Simulations for d=2+1 seem to be consistent with z= 2 (I) and z= 2.3 (II) respectively.

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M. Biehl, W. Kinzel, S. Schinzer. 1997-08-29. A simple model of epitaxial growth. https://doi.org/10.1209/epl%2Fi1998-00171-0

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