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Microscopic mechanism for mechanical polishing of diamond (110) surfaces

M. R. Jarvis·R. Perez·F. M. van Bouwelen·M. C. Payne
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Abstract

Mechanically induced degradation of diamond, as occurs during polishing, is studied using total--energy pseudopotential calculations. The strong asymmetry in the rate of polishing between different directions on the diamond (110) surface is explained in terms of an atomistic mechanism for nano--groove formation. The post--polishing surface morphology and the nature of the polishing residue predicted by this mechanism are consistent with experimental evidence.

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M. R. Jarvis, R. Perez, F. M. van Bouwelen, M. C. Payne. 1998-03-24. Microscopic mechanism for mechanical polishing of diamond (110) surfaces. https://doi.org/10.1103/physrevlett.80.3428

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