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Effect of disorder on the Kondo behavior of thin Cu(Mn) films

T. M. Jacobs·N. Giordano
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Abstract

We have studied the influence of disorder on the Kondo effect in thin films of Cu(Mn), i.e., Cu doped with a small amount of Mn. We find that the Kondo contribution to the resistivity is suppressed when the elastic mean-free-path, $λ$, is reduced. While this is qualitatively similar to results found previously by our group in a different material, our new experiments reveal in detail how this suppression depends on both film thickness and $λ$. These results are compared with the theory of Martin, Wan, and Phillips. While there is general qualitative agreement with this theory, there appear to be some quantitative discrepancies.

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T. M. Jacobs, N. Giordano. 1999-01-11. Effect of disorder on the Kondo behavior of thin Cu(Mn) films. https://arxiv.org/abs/cond-mat/9901092

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