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Two-dimensional atomic lithography by sub-micron focusing of atomic beams

W. Williams·M. Saffman
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Abstract

We analyze a method for serial writing of arbitrary two-dimensional patterns using optical focusing of a collimated atomic beam. A spatial light modulator is used in a side illumination geometry to create a localized optical spot with secondary maxima that are well separated from the central peak. Numerical simulation of a lithography experiment using a magneto-optical trap as a source of cold Cs atoms, collimation and cooling in a magnetic guide, and optical focusing predicts full width at half maximum pixel sizes of 110 x 110 nm and writing times of about $20 \rm ms$ per pixel.

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W. Williams, M. Saffman. 2005-06-02. Two-dimensional atomic lithography by sub-micron focusing of atomic beams. https://doi.org/10.1364/josab.23.001161

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