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Quantum lithography by coherent control of classical light pulses

Avi Pe'er·Barak Dayan·Marija Vucelja·Yaron Silberberg·Asher A. Friesem
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Abstract

The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum lithography, which utilizes interference between groups of N entangled photons, was recently proposed to beat the diffraction limit by a factor N. Here we propose a simple method to obtain N photons interference with classical pulses that excite a narrow multiphoton transition, thus shifting the "quantum weight" from the electromagnetic field to the lithographic material. We show how a practical complete lithographic scheme can be developed and demonstrate the underlying principles experimentally by two-photon interference in atomic Rubidium, to obtain focal spots that beat the diffraction limit by a factor of 2.

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Avi Pe'er, Barak Dayan, Marija Vucelja, Yaron Silberberg, Asher A. Friesem. 2004-11-22. Quantum lithography by coherent control of classical light pulses. https://doi.org/10.1364/opex.12.006600

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