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A. Deng

Publications and source records attributed to A. Deng.

2 recordsLinked to original sources

All-optical density downramp injection in electron-driven plasma wakefield accelerators

Injection of well-defined, high-quality electron populations into plasma waves is a key challenge of plasma wakefield accelerators. Here, we report on the first experimental demonstration of plasma density downramp injection in an electron-driven plasma wakefield accelerator, which can be controlled and tuned in all-optical fashion by mJ-level laser pulses. The laser pulse is directed across the path of the plasma wave before its arrival, where it generates a local plasma density spike in addition to the background plasma by tunnelling ionization of a high ionization threshold gas component. This density spike distorts the plasma wave during the density downramp, causing plasma electrons to be injected into the plasma wave. By tuning the laser pulse energy and shape, highly flexible plasma density spike profiles can be designed, enabling dark current free, versatile production of high-quality electron beams. This in turn permits creation of unique injected beam configurations such as counter-oscillating twin beamlets.

physics.plasm-ph

Tunable Electron Multibunch Production in Plasma Wakefield Accelerators

Synchronized, independently tunable and focused $μ$J-class laser pulses are used to release multiple electron populations via photo-ionization inside an electron-beam driven plasma wave. By varying the laser foci in the laboratory frame and the position of the underdense photocathodes in the co-moving frame, the delays between the produced bunches and their energies are adjusted. The resulting multibunches have ultra-high quality and brightness, allowing for hitherto impossible bunch configurations such as spatially overlapping bunch populations with strictly separated energies, which opens up a new regime for light sources such as free-electron-lasers.

physics.plasm-ph