arXiv subjects

Adrian Fedorko

Publications and source records attributed to Adrian Fedorko.

6 recordsLinked to original sources

arXiv2025

Engineering Tunable Kagome Moir\'e Superlattices in Twisted Transition Metal Dichalcogenides

Kagome systems are an ideal platform for exploring strongly correlated phases due to their unique electronic structure and geometric frustration. While recent solid-state realizations have uncovered a wealth of correlated states, they suffer from key limitations, including limited tunability of carrier density and interaction strength. Here, we propose an experimentally viable scheme to realize a breathing kagome moir\'e superlattice using a twisted trilayer of transition metal dichalcogenides (TMDs). By twisting the top and bottom layers relative to the middle by small angles $\theta$ and $2\theta$, respectively, we generate a kagome-like moir\'e potential on the central layer. Continuum model calculations reveal isolated kagome bands featuring flat bands, Dirac points with tunable gaps, and van Hove singularities. Crucially, this platform offers unprecedented control over band structure, carrier density, and interactions, achievable via twist angle and electrostatic gating. Our work opens a new route to realizing clean, tunable kagome metals and provides a versatile platform for studying strongly correlated and topological phenomena.

cond-mat.mes-hall↗

arXiv2023

Spintronic Quantum Phase Transition in a $Graphene/Pb_{0.24}Sn_{0.76}Te$ Heterostructure with Giant Rashba Spin-Orbit Coupling

Mechanical stacking of two dissimilar materials often has surprising consequences for heterostructure behavior. In particular, a two-dimensional electron gas (2DEG) is formed in the heterostructure of the topological crystalline insulator Pb0.24Sn0.76Te and graphene due to contact of a polar with a nonpolar surface and the resulting changes in electronic structure needed to avoid polar catastrophe. We study the spintronic properties of this heterostructure with non-local spin valve devices. We observe spin-momentum locking at lower temperatures that transitions to regular spin channel transport only at ~40 K. Hanle spin precession measurements show a spin relaxation time as high as 2.18 ns. Density functional theory calculations confirm that the spin-momentum locking is due to a giant Rashba effect in the material and that the phase transition is a Lifshitz transition. The theoretically predicted Lifshitz transition is further evident in the phase transition-like behavior in the Landé g-factor and spin relaxation time.

cond-mat.mes-hall↗

arXiv2022

The effect of vanadium substitution on the structural and magnetic properties of (Fe$_{1-x}$V$_{x}$)$_{3}$Ga$_{4}$

Fe$_{3}$Ga$_{4}$ displays a complex magnetic phase diagram that is sensitive and tunable with both electronic and crystallographic structure changes. In order to explore this tunability, vanadium-doped (Fe$_{1-x}$V$_{x}$)$_{3}$Ga$_{4}$ has been synthesized and characterized. High-resolution synchrotron X-ray diffraction and Rietveld refinement show that samples up to 20\% V-doping remain isostructural to Fe$_{3}$Ga$_{4}$ and display a linear increase in unit cell volume as doping is increased. Magnetic measurements reveal a suppression of the antiferromagnetic helical spin-density wave (SDW) with V-doping, revealed by changes in both the low-temperature ferromagnetic-antiferromagentic (FM-AFM) transition (T$_{1}$) and high-temperature AFM-FM transition (T$_{2}$). At 7.5\% V-doping, the metamagnetic behavior of the helical AFM SDW phase is no longer observed. These results offer an avenue to effective tuning of the magnetic order in Fe$_{3}$Ga$_{4}$ for devices, as well as increased understanding of the magnetism in this system.

cond-mat.mtrl-sci↗

arXiv2022

Interface Engineering Enabled Low Temperature Growth of Magnetic Insulator on Topological Insulator

Combining topological insulators (TIs) and magnetic materials in heterostructures is crucial for advancing spin-based electronics. Magnetic insulators (MIs) can be deposited on TIs using the spin-spray process, which is a unique non-vacuum, low-temperature growth process. TIs have highly reactive surfaces that oxidize upon exposure to atmosphere, making it challenging to grow spin-spray ferrites on TIs. In this work, it is demonstrated that a thin titanium capping layer on TI, followed by oxidation in atmosphere to produce a thin TiOx interfacial layer, protects the TI surface, without significantly compromising spin transport from the magnetic material across the TiOx to the TI surface states. First, it was demonstrated that in Bi2Te3/TiOx/Ni80Fe20 heterostructures that TiOx provided an excellent barrier against diffusion of magnetic species, yet maintained a large spin-pumping effect. Second, the TiOx was also used as a protective capping layer on Bi2Te3, followed by the spin-spray growth of the MI, NixZnyFe2O4 (NZFO). For the thinnest TiOx barriers, Bi2Te3/TiOx/NZFO samples had AFM disordered interfacial layer because of diffusion. With increasing TiOx barrier thickness, the diffusion was reduced, but still maintained strong interfacial spin-pumping interaction. These experimental results demonstrate a novel method of low-temperature growth of magnetic insulators on TIs enabled by interface engineering.

cond-mat.mtrl-sci↗

arXiv2022

Effects of Crystalline Disorder on Interfacial and Magnetic Properties of Sputtered Topological Insulator/Ferromagnet Heterostructures

Thin films of Topological insulators (TIs) coupled with ferromagnets (FMs) are excellent candidates for energy-efficient spintronics devices. Here, the effect of crystalline structural disorder of TI on interfacial and magnetic properties of sputter-deposited TI/FM, Bi2Te3/Ni80Fe20, heterostructures is reported. Ni and a smaller amount of Fe from Py was found to diffuse across the interface and react with Bi2Te3. For highly crystalline c-axis oriented Bi2Te3 films, a giant enhancement in Gilbert damping is observed, accompanied by an effective out-of-plane magnetic anisotropy and enhanced damping-like spin-orbit torque (DL-SOT), possibly due to the topological surface states (TSS) of Bi2Te3. Furthermore, a spontaneous exchange bias is observed in hysteresis loop measurements at low temperatures. This is because of an antiferromagnetic topological interfacial layer formed by reaction of the diffused Ni with Bi2Te3 which couples with the FM, Ni80Fe20. For increasing disorder of Bi2Te3, a significant weakening of exchange interaction in the AFM interfacial layer is found. These experimental results Abstract length is one paragraph.

cond-mat.mtrl-sci↗

arXiv2021

Antiferromagnetic VdW Phase at the Interface of Sputtered Topological Insulator/Ferromagnet-Bi2Te3/Ni80Fe20 Heterostructures

Magnetic ordering in topological insulators (TI) is crucial for breaking time-reversal symmetry (TRS) and thereby opening a gap in the topological surface states (TSSs) [1-6], which is the key for realizing useful topological properties such as the quantum anomalous Hall (QAH) effect, axion insulator state and the topological magnetoelectric effect. Combining TIs with magnetic materials can be expected to yield interfaces [26-28] with unique topological and magnetic phases but such interfaces largely remain unexplored. Here, we report the discovery of a novel antiferromagnetic (AFM) Van der Waals (VdW) phase at the interface of a sputtered c-axis oriented TI/FM (Bi2Te3/Ni80Fe20) heterostructure due to the formation of a Ni-intercalated Bi2Te3 VdW interfacial layer. The TI/FM heterostructure is shown to possess a significant spontaneous exchange bias and the presence of an AFM order at the interface via measurements of the hysteresis loop as well as the observation of compensated magnetic moments at the interface using polarized neutron reflectometry (PNR). An in-depth analysis of the structural and chemical properties of the interfacial AFM phase was carried out using selected area electron diffraction (SAED), electron energy loss spectroscopy (EELS), and X-ray photoelectron spectroscopy (XPS). These studies show evidence of solid-state reaction between the intercalated Ni atoms and Bi2Te3 layers and of the formation of topologically nontrivial magnetic VdW compounds. The Néel temperature of the interfacial AFM phase is 63 K, which is higher than that of typical magnetic topological insulators [53]. Our study shows how industrial CMOS-process-compatible sputtered TI/FM heterostructures can provide a novel materials platform for exploring the emergence of interfacial topological magnetic phases and high-temperature topological magnetic states.

cond-mat.mtrl-sci↗