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Aidan F. Campbell

Publications and source records attributed to Aidan F. Campbell.

3 recordsLinked to original sources

Two-step growth of (In,Ga)N pseudo-substrates on GaN templates by plasma-assisted molecular beam epitaxy

(In,Ga)N layers are grown by plasma-assisted molecular beam epitaxy on GaN templates. We introduce a two-step protocol that involves switching the growth conditions from initially N-stable to metal-stable. Reflection high-energy electron diffraction as well as scanning electron and atomic force microscopy reveal that the first step results in a rough intermediate surface with open pits, whereas the final surface is smooth. The narrow linewidth of the photoluminescence band indicates an excellent compositional homogeneity of the upper layer. Its in-plane lattice constant is determined to be $\approx$3.26 Åfrom X-ray diffraction measurements. This combination of favorable properties makes these layers attractive as pseudo-substrates for the growth of red-emitting (In,Ga)N light-emitting diodes. In particular, the approach presented here does not require any complex external processing and is, thus, scalable and economical.

cond-mat.mtrl-sci↗

Molecular Beam Epitaxy of Al$\mathrm{_{1-x}}$Sc$\mathrm{_{x}}$N Nanowires: Towards Group-III Nitride Piezoelectric Nanogenerators with Enhanced Response

We study the molecular beam epitaxy of self-assembled Al$\mathrm{_{1-x}}$Sc$\mathrm{_{x}}$N nanowires on conductive TiN layers and demonstrate their application in piezoelectric nanogenerators. Wurtzite Al$\mathrm{_{1-x}}$Sc$\mathrm{_{x}}$N nanowires with uniform Sc incorporation are grown across a wide composition range (0<x<0.35). At substrate temperatures below 700 $^\circ{}$C, these nanowires exhibit an inversely tapered morphology, whereas higher temperatures favor the nucleation of additional branches due to a phase separation of Al$\mathrm{_{1-x}}$Sc$\mathrm{_{x}}$N into wurtzite AlN and rock-salt ScN. Phase-pure Al$\mathrm{_{1-x}}$Sc$\mathrm{_{x}}$N nanowires are integrated into vertical nanogenerators, where the metallic TiN substrate serves as bottom electrode. The fabricated polymer-nanowire composite devices achieve effective piezoelectric charge coefficients of up to 8.5 pC N$^{-1}$ at x=0.32, thus exceeding the piezoelectric response of bulk AlN by nearly a factor of two. Although the charge response remains lower compared to Al$\mathrm{_{1-x}}$Sc$\mathrm{_{x}}$N thin films, the reduced effective dielectric permittivity of the nanowire-polymer composites compensates the reduction in piezoelectric charge coefficient, eventually yielding a higher voltage response and comparable energy harvesting efficiency. Finally, effective medium modeling reveals that the device architecture is the primary factor limiting performance, providing general design principles for highly efficient nanowire-based piezoelectric energy harvesters.

cond-mat.mtrl-sci↗

Fabrication of (In,Ga)N pseudo-substrates by a three-step growth protocol without ex-situ processing

We fabricate (In,Ga)N pseudo-substrates with a total thickness of ~1 um grown on GaN templates using plasma-assisted molecular beam epitaxy. In a three-step process, we change growth conditions from N-rich to metal-rich in order to sequentially form a roughened GaN layer, relaxed (In,Ga)N nanostructures, and a coalesced, smooth (In,Ga)N layer. Samples are analyzed by scanning electron and atomic force microscopy, X-ray diffraction, as well as photo- and cathodoluminescence spectroscopy. Compared to a reference layer grown directly on GaN, the pseudo-substrate exhibits a higher In content (~0.3), strain relaxation degree (~80%), narrower photoluminescence linewidth, and larger area fraction of bright regions in cathodoluminescence maps, showing the benefits of the three-step growth protocol. This straightforward approach does not necessitate any ex-situ processing and could enable the scalable fabrication of (In,Ga)N pseudo-substrates for high-efficiency red-emitting (In,Ga)N devices.

cond-mat.mtrl-sci↗