arXiv subjects

Albert Hertel

Publications and source records attributed to Albert Hertel.

2 recordsLinked to original sources

arXiv2026

Proximitized Topological Insulator Charge Island Fabricated via In Situ Multi-Angle Stencil Lithography

Hybrid superconductor-topological insulator (TI) nanostructures constitute a promising materials platform for exploring proximity-induced superconductivity in systems with topologically protected surface states. A key obstacle has been the realization of clean and well-controlled superconductor-TI interfaces, as TI surfaces rapidly degrade under ambient conditions. Here, we introduce a fully in situ, multi-angle stencil lithography technique that enables the fabrication of proximitized charge islands in TIs. The approach combines selective-area growth of (Bi,Sb)$_2$Te$_3$ nanoribbons with angle-controlled deposition of diffusion barriers, superconducting Al, and ultrathin oxide tunnel barriers, allowing scalable fabrication of hybrid nanostructures without post-growth processing. Low-temperature transport measurements reveal robust Coulomb blockade and a pronounced suppression of low-energy conductance which vanishes with magnetic field, consistent with proximity-induced superconductivity in the island. These results establish a versatile nanofabrication platform that enables access to previously unexplored TI-based hybrid quantum devices and opens new routes for investigating superconductivity in topological nanostructures.

cond-mat.mes-hall↗

arXiv2025

On-chip stencil lithography for superconducting qubits

Improvements in circuit design and more recently in materials and surface cleaning have contributed to a rapid development of coherent superconducting qubits. However, organic resists commonly used for shadow evaporation of Josephson junctions (JJs) pose limitations due to residual contamination, poor thermal stability and compatibility under typical surface-cleaning conditions. To provide an alternative, we developed an inorganic SiO$_2$/Si$_3$N$_4$ on-chip stencil lithography mask for JJ fabrication. The stencil mask is resilient to aggressive cleaning agents and it withstands high temperatures up to 1200{\deg}C, thereby opening new avenues for JJ material exploration and interface optimization. To validate the concept, we performed shadow evaporation of Al-based transmon qubits followed by stencil mask lift-off using vapor hydrofluoric acid, which selectively etches SiO$_2$. We demonstrate average $T_1 \approx 75 \pm 11 \mu$s over a 200 MHz frequency range in multiple cool-downs for one device, and $T_1 \approx 44\pm 8 \mu$s for a second device. These results confirm the compatibility of stencil lithography with state-of-the-art superconducting quantum devices and motivate further investigations into materials engineering, film deposition and surface cleaning techniques.

quant-ph↗