Alec Talin | Searcharxiv

arXiv2026

Strong radial electric field scaling near nanoscale conductive filaments and the ReRAM resistive switching mechanism

The physics underlying reset in bipolar resistive memory has been the subject of decades of controversy and has been identified as the primary barrier to resistive memory technology development. This manuscript introduces a nanoscale effect in current carrying conductors, whereby surface charge induced radial electric fields are found to be inversely proportional to the radius of the conductive path. This nanoscale effect is then applied to explain the negative resistance switching (reset) mechanism in filamentary metal oxide resistive switching memory devices (memristors). Previous explanations for the negative resistive switching mechanism state that diffusion constitutes the radial driving mechanism for oxygen ions, and drift under electric fields is restricted to the direction parallel to current flow. This explanation conflicts with retention and microscopy data collected in a subset of devices presented in literature. We demonstrate that the electric field's dependency on the on the radius of a nanoscale conductive path can result in radial fields on the order of 10^5 to 10^6 V/cm at only -1 V bias, sufficient to govern the negative resistance switching mechanism in filamentary metal oxides. By accounting for this nanoscale size effect, long standing anomalous experimental data about the negative (reset) resistance switching mechanism in bipolar filamentary resistive memory devices is finally reconciled. Wide understanding of surface charges and associated electric fields in nanoscale conductive paths could prove important for further scaling of integrated circuits and aid in elucidating many nanoscale phenomena.

cond-mat.mes-hall↗

arXiv2014

Fabrication of high quality GaN nanopillar arrays by dry and wet chemical etching

We study strain relaxation and surface damage of GaN nanopillar arrays fabricated using inductively coupled plasma (ICP) etching and post etch wet chemical treatment. We controlled the shape and surface damage of such nanopillar structures through selection of etching parameters. We compared different substrate temperatures and different chlorine-based etch chemistries to fabricate high quality GaN nanopillars. Room temperature photoluminescence and Raman scattering measurements were carried to study the presence of surface defect and strain relaxation on these nanostructures, respectively. We found that wet KOH etching can remove the side wall damages caused by dry plasma etching, leading to better quality of GaN nanopillars arrays. The Si material underneath the GaN pillars was removed by KOH wet etching, leaving behind a fine Si pillar to support the GaN structure. Substantial strain relaxations were observed in these structures from room temperature Raman spectroscopy measurements. Room temperature Photoluminescence spectroscopy shows the presence of whispering gallery modes from these the nano disks structures.

cond-mat.mtrl-sci↗