arXiv subjects

Ana Sofia Sousa

Publications and source records attributed to Ana Sofia Sousa.

4 recordsLinked to original sources

arXiv2026

Formation of Ag and Au Plasmonic Nanoparticles by Ion Implantation in Ga$_2$O$_3$ thin films

Gallium oxide (Ga$_2$O$_3$) is a wide-bandgap semiconductor with exceptional electrical and optical properties, making it a promising material for optoelectronic and sensing applications. In this work, we demonstrate for the first time the formation of plasmonic silver (Ag) and gold (Au) nanoparticles embedded in Ga$_2$O$_3$ thin films via ion implantation. Ga$_2$O$_3$ films deposited by RF sputtering on sapphire substrates were implanted with Ag or Au ions at 150 keV and a nominal fluence of 5 $\times$ 10$^{16}$ ions/cm$^2$, followed by thermal annealing between 200 and 700 °C. Rutherford backscattering spectrometry (RBS) measurements revealed saturation effects during implantation, resulting in lower incorporated fluences, as well as out-diffusion with post-implantation annealing. Transmission electron microscopy confirmed the formation of metallic nanoparticles with a distribution consistent with the metal profiles measured by RBS. Optical absorption measurements showed a pronounced localized surface plasmon resonance (LSPR) band in the Ag-implanted films, visible even in the as-implanted state and red-shifting with increasing annealing temperature, while Au-implanted films exhibited a distinct LSPR peak only after annealing at $\geq$500 °C. The observed LSPR shifts with annealing are attributed primarily to changes in the Ga$_2$O$_3$ matrix rather than a change in nanoparticle size. These results establish ion implantation as a viable approach for integrating plasmonic nanostructures into Ga$_2$O$_3$.

cond-mat.mtrl-sci↗

arXiv2026

Au and Ag nanoparticles produced by ion implantation in single-crystalline $β$-Ga$_2$O$_3$

This work reports the successful formation of Ag and Au nanoparticles in $β$-Ga$_2$O$_3$ single-crystals by ion implantation and annealing at 550 °C. X-ray diffraction measurements revealed that nanoparticles were formed after the annealing step, presenting a highly-ordered crystalline structure and conforming to a crystallographic relation with respect to the matrix: $\left(0\overline{1}0\right)_β\parallel \left(110\right)_{\mathrm{Ag/Au}}$ and $\left[102\right]_β\parallel \left[1\overline{1}2\right]_{\mathrm{Ag/Au}}$. The presence of these nanoparticles was also confirmed via absorbance measurements revealing the localised surface plasmon resonance peaks associated with these particles. Considering the multiple advantages and the versatility of metallic nanoparticles, their combination with the exceptional properties of $β$-Ga$_2$O$_3$ paves the way for a wide range of applications.

cond-mat.mtrl-sci↗

arXiv2026

Study on the Effect of Annealing on Ga$_2$O$_3$ Thin Films Deposited on Silicon by RF Sputtering

Gallium oxide is an ultra-wide bandgap semiconductor with excellent opto-electronic properties, making it a highly promising material for a wide range of applications and devices. In this article, we report how the optical, morphological, structural, and compositional properties of $β$-Ga$_2$O$_3$ thin films deposited by RF sputtering on silicon substrates are affected by thermal treatments. Ellipsometric spectra recorded at multiple angles of incidence from several samples subjected to thermal annealing in the range of 550-1000 $^\circ$C were analyzed to extract the optical functions using appropriate multilayer models. This analysis is complemented by compositional, structural, and morphological characterization techniques. A significant increase of the refractive index was found after annealing at 1000 $^\circ$C, accompanied by a stark improvement in the samples' crystalline structure, as confirmed by complementary structural and compositional characterization techniques.

cond-mat.mtrl-sci↗

arXiv2025

Effect of Annealing on Al Diffusion and its Impact on the Properties of Ga$_2$O$_3$ Thin Films Deposited on c-plane Sapphire by RF Sputtering

Gallium oxide is a wide-bandgap semiconductor which has been steadily growing in popularity due to its ultra-wide bandgap, suitability for harsh environments and distinctive opto-electrical properties. Notable applications include deep-UV photodetectors, low loss waveguides or even transparent solar cells. RF sputtering stands out among possible techniques for the epitaxial deposition of Ga$_{2}$O$_{3}$ thin films with high quality and at a low cost. By using sapphire substrates, and through thermal annealing, we can form a $β$-(Al$_{x}$Ga$_{1-x}$)$_{2}$O$_{3}$ alloy by Al diffusion, which has tunable opto-electrical properties such as the bandgap and breakdown electric field. In this work, techniques such as X-ray diffraction, Rutherford backscattering spectrometry, Raman spectroscopy, atomic force microscopy and optical transmission are used to determine the optical properties, morphology and composition of Ga$_{2}$O$_{3}$ deposited and annealed thin films. To explore the formation of the $β$-(Al$_{x}$Ga$_{1-x}$)$_{2}$O$_{3}$ alloy, annealing was performed at variable temperature, in ambient air. It was determined that the bandgap can indeed be tuned between 4.85 and 5.30 eV by varying the annealing temperature, corresponding to an Al content between 0$-$68.5.

cond-mat.mtrl-sci↗