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Andre Vallieres

Publications and source records attributed to Andre Vallieres.

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Ultracoherent superconducting cavity-based multiqudit platform with error-resilient control

Realizing the promise of quantum computing requires simultaneously increasing Hilbert-space size and coherence times. While qubit-based architectures have long been the dominant paradigm, large local Hilbert spaces enable qudits, which offer more compact circuits and natural representations for quantum simulation in chemistry, condensed matter, and high-energy physics. Superconducting radio-frequency (SRF) cavities are attractive building blocks for qudit-based quantum technologies because of their exceptionally low dissipation and large bosonic Hilbert spaces, but turning them into programmable modules requires extra effort because the nonlinear circuitry required for control and measurement often introduces loss and noise that erode the memory advantage. Here we demonstrate a two-mode SRF cavity module weakly coupled to an ancillary transmon circuit and engineered to suppress controller-induced dissipation and dephasing, achieving single-photon lifetimes of 20.6 ms and 15.6 ms and a dephasing time exceeding 40 ms. Using sideband interactions together with error-resilient protocols incorporating measurement-based correction and post-selection, we prepare Fock states up to $N=20$ with fidelities exceeding 95% and generate two-mode entanglement near the coherence limit, approaching 99.9%. By combining ultracoherent storage with high-fidelity control, this work moves cavity-based hardware beyond memory-only operation and establishes a practical route toward high-dimensional encodings and scalable modular quantum information processing.

quant-ph

Enhanced Superconducting Qubit Performance Through Ammonium Fluoride Etch

The performance of superconducting qubits is often limited by dissipation and two-level systems (TLS) losses. The dominant sources of these losses are believed to originate from amorphous materials and defects at interfaces and surfaces, likely as a result of fabrication processes or ambient exposure. Here, we explore a novel wet chemical surface treatment at the Josephson junction-substrate and the substrate-air interfaces by replacing a buffered oxide etch (BOE) cleaning process with one that uses hydrofluoric acid followed by aqueous ammonium fluoride. We show that the ammonium fluoride etch process results in a statistically significant improvement in median $\text{T}_1$ by $\sim22\%$ ($p=0.002$), and a reduction in the number of strongly-coupled TLS in the tunable frequency range. Microwave resonator measurements on samples treated with the ammonium fluoride etch prior to niobium deposition also show $\sim33\%$ lower TLS-induced loss tangent compared to the BOE treated samples. As the chemical treatment primarily modifies the Josephson junction-substrate interface and substrate-air interface, we perform targeted chemical and structural characterizations to examine materials' differences at these interfaces and identify multiple microscopic changes that could contribute to decreased TLS.

cond-mat.mtrl-sci