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Anton Konakov

Publications and source records attributed to Anton Konakov.

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Numerical analysis of the spin-orbit coupling parameters in III-V quantum wells using 8-band Kane model and finite-difference method

By means the envelope function approximation, 8-band Kane model and a finite-difference scheme with the coordinate space discretization, we numerically performed calculations of the spin-orbit coupling parameters for 2D electron gas confined in both symmetric and asymmetric [0 0 1] quantum wells based on zinc-blende III-V semiconductors. Influence of the quantum well band parameters and width as well as the magnitude of the external electric field applied along the growth direction on the Dresselhaus and Rashba spin-orbit coupling parameters is investigated. It has been found that in the symmetric InGaAs/GaAs quantum wells linear-in-momentum spin-orbit coupling disappears for the third electron subband at certain values of well width and the indium content. It is also shown that in asymmetric InGaAs/GaAs structures the spin-orbit coupling parameters can be equal at a certain electric field that is the condition for the realization of the SU(2) spin symmetry and formation of persistent spin helices. Besides, we calculated the spin-orbit coupling in the persistent spin helix regime as a function of the well width, indium content and external field. The proposed approach for the calculation of the spin-orbit coupling parameters can be applied to other 2D structures with the spin-orbit coupling.

cond-mat.mes-hall

Photoluminescence of ion-synthesized 9R-Si inclusions in SiO2/Si structure: effect of irradiation dose and oxide film thickness

The study of hexagonal silicon polytypes attracts special attention due to their unique physical properties compared to the traditional cubic phase of Si. Thus, for some hexagonal phases, a significant improvement in the emission properties has been demonstrated. In this work, the luminescent properties of SiO2/Si structures irradiated with Kr+ ions at different doses and annealed at 800 °C have been systematically investigated. For such structures, a photoluminescence line at ~ 1240 nm is observed and associated with the formation of hexagonal 9R-Si phase inclusions. It is found that the variation in the thickness of oxide film and the relative position of ion distribution profile and film / substrate interface leads to a regular change in the luminescence intensity. The nature of the observed dependencies is discussed as related to the interplay between the desirable 3C-Si -> 9R-Si structural transition and generation of nonradiative defects. The revealed regularities suggest optimal ion irradiation conditions for synthesis of optically active 9R-Si phase in diamond-like silicon.

cond-mat.mtrl-sci