arXiv subjects

Artem K. Grebenko

Publications and source records attributed to Artem K. Grebenko.

5 recordsLinked to original sources

arXiv2026

Dynamics of amorphous membranes in the two-dimensional limit

Atomically thin mechanical resonators have been realized predominantly in crystalline two-dimensional (2D) materials, such as graphene, where long-range crystalline order sets their elastic properties and defines their nonlinear resonant behavior. Extending these concepts to the amorphous 2D limit has remained largely unexplored. Here, we demonstrate that monolayer amorphous carbon (MAC) forms suspended membranes that support optothermal actuation and sensitive interferometric readout across both linear and nonlinear regimes of its resonant motion. We resolve thermomechanical motion, driven resonances, and multimode spectra in MAC nanodrums. The frequencies of fundamental vibration modes correspond to unusually low pretensions, placing monolayer MAC nanodrums in a regime where geometric nonlinearities, stress heterogeneity, and mode coupling emerge at comparatively low drive powers. Consistently, we observe pronounced nonlinear dynamics, including hardening, softening, and mixed Duffing responses, nonlinear damping, parametrically excited modes, and signatures of intermodal coupling. These results establish MAC as a robust nanoelectromechanical platform and open an experimental route to disorder-governed nanomechanics in the 2D amorphous limit.

cond-mat.mes-hall↗

arXiv2026

Atomically Thin Amorphous Carbon with an Ultralow Dielectric Constant

Two-dimensional (2D) materials exhibit excellent properties at monolayer thickness and are viable replacements for various microelectronic components as scaling gradually approaches the atomic limit. Despite significant advancements in the ongoing 2D revolution of integrated circuits, one crucial building block, namely a 2D ultralow-k (ULK) dielectric, remains unreported. The challenge lies in achieving a dielectric constant less than 3, as traditional low-k dielectrics are inherently unstable at the 2D limit due to their amorphous or porous nature. The realisation of ultrathin dielectrics with low-k is also needed to address current bottlenecks in integrated circuits scaling. Specifically, low-k materials are necessary to minimise parasitic capacitances as the distance between conductive elements shrinks below 10 nm. Moreover, advanced architectures like gate-all-around field effect transistors (GAA FET) require even lower dielectric constants (k<2) at sub-3nm thickness. Here, we show that layer-by-layer grown multilayer amorphous carbon (ML-AC), as thin as 0.8 nm, is a mechanically robust 2D ULK dielectric with k of 1.35 and dielectric strength of 28-31 MV cm-1. The lack of any long-range order, its intrinsic 2D nature, sp2 carbon character and low density are all essential for minimising dielectric permittivity. Moreover, ML-AC overcomes the vulnerability of existing dielectrics to ion diffusion degradation with a record metal ion diffusion time to failure (TTF) of 10^10 s for even a single layer. Therefore, otherwise necessary additional layers occupying up to 3 nm can be eliminated, which is especially significant as metal line widths approach 10 nm. Combined with its low-temperature, direct and conformal growth even on a dielectric, these critical features enable substantial improvements in silicon-based semiconductor electronics and ensure compatibility with future 2D electronics.

cond-mat.mtrl-sci↗

arXiv2023

Atomistic mechanism of friction force independence on the normal load and other friction laws for dynamic structural superlubricity

We explore dynamic structural superlubricity for the case of a relatively large contact area, where the friction force is proportional to the area (exceeding $\sim 100\,nm^2$) experimentally, numerically, and theoretically. We use a setup comprised of two molecular smooth incommensurate surfaces -- graphene-covered tip and substrate. The experiments and MD simulations demonstrate independence of the friction force on the normal load, for a wide range of normal loads and relative surface velocities. We propose an atomistic mechanism of this phenomenon, associated with synchronic out-of-plane surface fluctuations of thermal origin, and confirm it by numerical experiments. Based on this mechanism, we develop a theory for this type of superlubricity and show that friction force increases linearly with increasing temperature and relative velocity, for velocities, larger than a threshold velocity. The MD results are in a fair agreement with predictions of the theory.

physics.comp-ph↗

arXiv2022

Local ultra-densification of single-walled carbon nanotube films: modeling and experiment

Fabrication of nanostructured metasurfaces poses a significant technological and fundamental challenge. Despite developing novel systems that support reversible elongation and distortion, their nanoscale patterning and control of optical properties remain an open problem. Herein we report the atomic force microscope lithography (AFML) application for nanoscale patterning of single-walled carbon nanotube films and the associated reflection coefficient tuning. We present models of bundling reorganization, formed-pattern stability, and energy distribution describing mechanical behavior with mesoscopic distinct element method (MDEM). All observed and calculated phenomena support each other and present a platform for developing AFML patterned optical devices using meshy nanostructured matter.

cond-mat.mtrl-sci↗

arXiv2022

Gentle patterning approaches towards compatibility with bio-organic materials and their environmental aspects

Advances in material science, bio-electronic, and implantable medicine combined with recent requests for eco-friendly materials and technologies inevitably formulate new challenges for nano- and micro-patterning techniques. Overall, the importance of creating micro and nanostructures is motivated by a large manifold of fundamental and applied properties accessible only at the nanoscale. Lithography is a crucial family of fabrication methods to create prototypes and produce devices on an industrial scale. The pure trend in the miniaturization of critical electronic semiconducting components is recently enhanced by implementing bio-organic systems in electronics. So far, significant efforts have been made to find novel lithographic approaches and develop old ones to reach compatibility with delicate bio-organic systems and minimize the impact on the environment. Herein, we briefly review such delicate materials and sophisticated patterning techniques.

cond-mat.mtrl-sci↗