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Ashley Wissel-Garcia

Publications and source records attributed to Ashley Wissel-Garcia.

2 recordsLinked to original sources

Ultra-Wide Bandgap AlGaN Heterostructure Field Effect Transistors with Current Gain Cutoff Frequency Above 85 GHz

We report the design and demonstration of ultra-wide-bandgap (UWBG) AlGaN polarization-graded field-effect transistors (PolFETs) that achieve a current-gain cutoff frequency above 85 GHz and a current density exceeding 1.3 A/mm. Ultra-thin channel and buffer layers were grown epitaxially on AlN substrates, and a reverse-graded AlGaN contact layer was incorporated to reduce the contact resistance to below 1 ohm.mm. With aggressively scaled device dimensions, the AlGaN PolFETs exhibit state-of-the-art high-frequency performance for UWBG transistors. Small-signal modeling reveals both parasitic and transit delays, confirming the benefits of reduced access resistance and enhanced intrinsic transconductance. These results establish a new performance benchmark for UWBG AlGaN devices and demonstrate their strong potential for next-generation millimeter-wave electronics.

physics.app-ph↗

Scaled Ultra-Wide Bandgap AlGaN Polarization-Graded FET with Ultra-thin Buffer Layer

We report on the design and demonstration of ultra-wide bandgap AlGaN polarization-graded field effect transistors with ultra-thin channels to enable excellent current density and high-frequency performance while significantly reducing thermal resistance. We use polarization-graded AlGaN layers and ultra-thin pseudomorphic AlGaN buffer layers to enable low thermal resistance and excellent structural quality. The polarization-graded field effect transistors (PolFETs) demonstrated here show Imax over 800mA/mm and current/power gain cutoff frequency (fT/fmax) of 26/28 GHz. Small signal modeling and analysis were used to determine parasitic/transit delays, and gate-resistance thermometry was implemented to thermally characterize AlGaN PolFET and benchmark against state-of-the-art AlGaN HEMTs. The ultra-thin AlGaN PolFET showed thermal resistance of 12 K.mm/W, representing a significant reduction from typical AlGaN transistors. These results show state-of-art combination of high current density, excellent fT-LG product for ultra-wide bandgap AlGaN transistors, and superior thermal performance, and highlight the promise of AlGaN transistors for future RF and mm-wave applications.

physics.app-ph↗