Field-Driven Hybrid Filament Formation Governs Switching in Ta-HfO$_2$-Pt Memristors
Memristive devices have gained significant attention for their potential in next-generation non-volatile memory and neuromorphic computing architectures. Among emerging candidates, transition metal oxides have proven particularly promising. While the switching mechanism in Ta/HfO$_2$/Pt devices was long attributed solely to oxygen vacancy based filaments, recent experimental evidence suggests a more complex dual-regime: the diffusion of metal cations also contributes to the formation of a conductive bridge. However, the precise atomistic mechanisms governing this metal cation migration remain poorly understood. Additionally, the role of defects such as oxygen vacancies present in the transition metal oxide in determining the final filament size and shape is also not well understood. Here, we employ molecular dynamics (MD) simulations with dynamic charge transfer to provide a detailed analysis of the atomistic mechanisms governing the co-formation of Ta-cation and oxygen-deficient filaments. We clearly show how varying the initial oxygen vacancy concentrations and spatial configurations within the HfO$_2$ matrix influences the final morphology and dimensions of the conductive filament. The switching is governed by field-driven formation and rupture of a hybrid Ta-cation-rich, oxygen-deficient filament in HfO$_2$. Our simulations closely match experiment, validating the model as a robust framework for understanding switching in oxide memristors and guiding designs that reduce cycle-to-cycle and device-to-device variability -- key barriers to high-performance devices.