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B. G. Chae

Publications and source records attributed to B. G. Chae.

10 recordsLinked to original sources

Recursive Dynamics in Fast-Weights Homeostatic Reentry Networks: Toward Reflective Intelligence

This study introduces the Fast-Weights Homeostatic Reentry Layer (FH-RL), a neural mechanism that integrates fast-weight associative memory, homeostatic regularization, and learned reentrant feedback to approximate self-referential computation in neural networks. Unlike standard transformer architectures that operate in a purely feedforward manner during inference, FH-RL enables internal recurrence without external looping, allowing prior latent states to be dynamically re-entered into the ongoing computation stream. We conduct controlled experiments sweeping the reentry gain $γ$ and evaluate emergent internal dynamics using three novel metrics: the Information Reentry Ratio (IRR), Eigen-Spectrum Recursion Index (ESRI), and Representational Drift Periodicity (RDP). Results show that reentry quantity increases proportionally with~$γ$, while the learned feedback matrix $W_r$ remains bounded and becomes more structured at moderate gains. Critically, a stable reflective band emerges around $γ\approx 0.10-0.20$, where internal feedback is maximally expressive yet spectrally stable: IRR rises smoothly, ESRI remains near zero, and RDP exhibits consistent low-frequency cycles. These findings provide quantitative evidence that reflective, thought-like internal processing can arise from a principled balance between feedback amplification and homeostatic regulation, linking modern fast-weight architectures to theories of cortical reentry and recursive cognition.

cs.LG

Electrostatic modification of infrared response in gated structures based on VO2

We investigate the changes in the infrared response due to charge carriers introduced by electrostatic doping of the correlated insulator vanadium dioxide (VO2) integrated in the architecture of the field effect transistor. Accumulation of holes at the VO2 interface with the gate dielectric leads to an increase in infrared absorption. This phenomenon is observed only in the insulator-to-metal transition regime of VO2 with coexisting metallic and insulating regions. We postulate that doped holes lead to the growth of the metallic islands thereby promoting percolation, an effect that persists upon removal of the applied gate voltage.

cond-mat.str-el

Electrodynamics of the vanadium oxides VO2 and V2O3

The optical/infrared properties of films of vanadium dioxide (VO2) and vanadium sesquioxide (V2O3) have been investigated via ellipsometry and near-normal incidence reflectance measurements from far infrared to ultraviolet frequencies. Significant changes occur in the optical conductivity of both VO2 and V2O3 across the metal-insulator transitions at least up to (and possibly beyond) 6 eV. We argue that such changes in optical conductivity and electronic spectral weight over a broad frequency range is evidence of the important role of electronic correlations to the metal-insulator transitions in both of these vanadium oxides. We observe a sharp optical transition with possible final state (exciton) effects in the insulating phase of VO2. This sharp optical transition occurs between narrow a1g bands that arise from the quasi-one-dimensional chains of vanadium dimers. Electronic correlations in the metallic phases of both VO2 and V2O3 lead to reduction of the kinetic energy of the charge carriers compared to band theory values, with paramagnetic metallic V2O3 showing evidence of stronger correlations compared to rutile metallic VO2.

cond-mat.str-el

Correlated metallic state of vanadium dioxide

The metal-insulator transition and unconventional metallic transport in vanadium dioxide (VO$_2$) are investigated with a combination of spectroscopic ellipsometry and reflectance measurements. The data indicates that electronic correlations, not electron-phonon interactions, govern charge dynamics in the metallic state of VO$_2$. This study focuses on the frequency and temperature dependence of the conductivity in the regime of extremely short mean free path violating the Ioffe-Regel-Mott limit of metallic transport. The standard quasiparticle picture of charge conduction is found to be untenable in metallic VO$_2$.

cond-mat.str-el

Observation of First-Order Metal-Insulator Transition without Structural Phase Transition in VO_2

An abrupt first-order metal-insulator transition (MIT) without structural phase transition is first observed by current-voltage measurements and micro-Raman scattering experiments, when a DC electric field is applied to a Mott insulator VO_2 based two-terminal device. An abrupt current jump is measured at a critical electric field. The Raman-shift frequency and the bandwidth of the most predominant Raman-active A_g mode, excited by the electric field, do not change through the abrupt MIT, while, they, excited by temperature, pronouncedly soften and damp (structural MIT), respectively. This structural MIT is found to occur secondarily.

cond-mat.str-el

Temperature dependence and control of the Mott transition in VO_2 based devices

The transition voltage of an abrupt metal-insulator transition (MIT), observed by applying an electric field to two-terminal devices fabricated on a Mott insulator VO_2 film, decreases with increasing temperature up to 334K. The abrupt current jump disappears above 334 K near the MIT temperature. These results suggest that the mechanism of the abrupt MIT induced by temperature is the same as that by an electric field. The magnitude of the current jump (a large current) decreases with increasing external resistance; this is an important observation in terms of applying the abrupt MIT to device applications. Furthermore, the temperature and resistance dependence of the MIT cannot be explained by the dielectric breakdown although a current jump known as breakdown is similar to that observed in an abrupt MIT.

cond-mat.str-el

Fabrication and Electrical Properties of Pure VO2 Phase Films

We have grown VO2 thin films by laser ablation for electronic device applications. In obtaining the thin films of the pure VO2 phase, oxygen partial pressure is a critical parameter because vanadium oxides have several phases with the oxygen concentration. It is found that the pure VO2 films are epitaxially grown on Al2O3 substrate in the narrow ranges of 55-60 mTorr in an Ar+10% O2 ambient, and that the mixed phase films are synthesized when the deposition pressure slightly deviates from the optimum pressure. The (100) oriented VO2 films undergo an abrupt metal-insulator transition (MIT) with resistance change of an order of 104 at 338K. In the films of mixed phases, the small change of the resistance is observed at the same temperature. The polycrystalline films grown on SiO2/Si substrate undergo a broaden MIT of the resistance. Furthermore, the abrupt MIT and collective current motion appearing in metal are observed when the electric field is applied to the film.

cond-mat.mtrl-sci

Gate-Induced Mott Transition

For a strongly correlated material, VO2, near a critical on-site Coulomb energy U/Uc=1, the abrupt Mott metal-insulator transition (MIT) rather than the continuous Hubbard MIT is observed by inducing internal optical phonon-coupled holes (hole inducing of 0.018%) into conduction band, with a gate field of fabricated transistors. Observed gate effects, change of the MIT drain-source voltage caused by a gate field, are the effect of measurement due to inhomogeneity of channel material and is an average over the measurement region of the true gate effect based on the large conductivity (or effective mass) near the MIT predicted by the Brinkman-Rice picture. A discontinuous gate effect such as digital is observed, which is a characteristic of the transistor and a possible condition of a very high-speed switching transistor.

cond-mat.str-el

Observation of Mott Transition in VO_2 Based Transistors

An abrupt Mott metal-insulator transition (MIT) rather than the continuous Hubbard MIT near a critical on-site Coulomb energy U/U_c=1 is observed for the first time in VO_2, a strongly correlated material, by inducing holes of about 0.018% into the conduction band. As a result, a discontinuous jump of the density of states on the Fermi surface is observed and inhomogeneity inevitably occurs. The gate effect in fabricated transistors is clear evidence that the abrupt MIT is induced by the excitation of holes.

cond-mat.str-el

Asymmetry in fatigue and recovery in ferroelectric Pb(Zr,Ti)O3 thin-film capacitors

We investigate the fatigue and refreshment by dc-electrical field of the electrical properties of Pt/Pb(Ti,Zr)O$_3$/Pt ferroelectric capacitors. We find an asymmetry in the refreshment, that is, the fatigued state can be refreshed by application of negative high dc-voltage to the top electrode, but no refreshment is measured by positive dc-voltage application. We also find that the fatigue can be prevented by driving the capacitor asymmetrically.

cond-mat.mtrl-sci