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B. Khromets

Publications and source records attributed to B. Khromets.

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Electroluminescence in dopant-free GaAs/AlGaAs single heterojunctions: 2D free excitons, H-band, and the tidal effect

Bright electroluminescence (EL) from dopant-free ambipolar lateral p-n junctions in GaAs/AlGaAs single heterointerface (SH) heterostructures is used to probe neutral free excitons arising from two-dimensional electron and hole gases (2DEGs and 2DHGs). The EL spectra reveal both the heavy-hole neutral free exciton (X$^0$) and the high-energy free exciton of the H band (HE). A combination of transition energies, lifetimes, spatial emission profiles, and temperature dependences points to a predominantly two-dimensional character for these excitons at the SH. For X$^0$, the EL peak energies (1515.5-1515.7 meV) lie slightly above the corresponding bulk GaAs photoluminescence (PL) line at 1515.3 meV, while time-resolved measurements yield markedly shorter lifetimes for EL than for PL (337 ps vs. 1610 ps), consistent with recombination in a confined interfacial layer. The HE exciton exhibits a Stark blueshift under forward bias below threshold, and its energies and lifetimes (down to 575 ps) are tuned by the topgate voltage; above threshold, HE emission is quenched in favor of X$^0$. Finally, the tidal effect $-$ a form of pulsed EL generated by swapping the topgate voltage polarity in ambipolar field-effect transistors $-$ produces an X$^0$ line at the same energy as in the lateral p-n junction and reproduces the characteristic nonmonotonic frequency dependence of the brightness previously observed in quantum-well heterostructures, again indicating a 2D-like origin. Taken together, these results show electrically generated and controllable 2D-like excitons (HE and X$^0$), thereby bridging 2D exciton physics and 2DEG/2DHG platforms in dopant-free GaAs/AlGaAs SH devices.

cond-mat.mes-hall

Observation of an Abrupt 3D-2D Morphological Transition in Thin Al Layers Grown by MBE on InGaAs surface

Among superconductor/semiconductor hybrid structures, in-situ aluminum (Al) grown on InGaAs/InAs is widely pursued for the experimental realization of Majorana Zero Mode quasiparticles. This is due to the high carrier mobility, low effective mass, and large Landé g-factor of InAs, coupled with the relatively high value of the in-plane critical magnetic field in thin Al films. However, growing a thin, continuous Al layer using the Molecular Beam Epitaxy (MBE) is challenging due to aluminum's high surface mobility and tendency for 3D nucleation on semiconductor surfaces. A study of epitaxial Al thin film growth on In0.75Ga0.25As with MBE is presented, focusing on the effects of the Al growth rate and substrate temperature on the nucleation of Al layers. We find that for low deposition rates, 0.1 Å/s and 0.5 Å/s, the growth continues in 3D mode during the deposition of the nominal 100 Å of Al, resulting in isolated Al islands. However, for growth rates of 1.5 Å/s and above, the 3D growth mode quickly transitions into island coalescence, leading to a uniform 2D Al layer. Moreover, this transition is very abrupt, happening over an Al flux increase of less than 1%. We discuss the growth mechanisms explaining these observations. The results give new insights into the kinetics of Al deposition and show that with sufficiently high Al flux, a 2D growth on substrates at close to room temperature can be achieved already within the first few Al monolayers. This eliminates the need for complex cryogenic substrate cooling and paves the way for the development of high-quality superconductor-semiconductor interfaces in standard MBE systems.

cond-mat.mtrl-sci