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Balram Khattar

Publications and source records attributed to Balram Khattar.

2 recordsLinked to original sources

Domain-Growth Kinetics and Scaling Laws Governing Pulse-Driven Accumulative Polarization Switching in HZO

Accumulative polarization switching driven by sequential sub-coercive electric-field pulses offers a promising route toward low-power ferroelectric memories and neuromorphic devices. However, the kinetic regimes governing this nonequilibrium process remain poorly understood. Here, we employ a phase-field model based on the time-dependent Landau-Ginzburg formalism to investigate pulse-driven accumulative switching in ferroelectric HZO. By systematically varying the initial domain configuration, pulse amplitude, pulse-on time, and pulse-off time, we establish a quantitative link between microscopic domain-wall dynamics and macroscopic polarization accumulation. We show that the effective switched-domain radius follows distinct scaling regimes characterized by the local kinetic exponent. Initially, a local exponent greater than 1 indicates superlinear domain growth driven by enhanced irreversible domain-wall propagation under successive pulses. As switching progresses, a local exponent close to unity marks steady self-similar growth, whereas a local exponent less than 1 signifies decelerating dynamics caused by geometric confinement, depletion of switchable polarization, and relaxation-induced back switching. The transition between these regimes is governed by the competition between field-driven excitation during the pulse-on interval and spontaneous relaxation during the pulse-off interval. The initial domain geometry further influences this transition. Increasing the pulse amplitude or pulse-on duration extends the superlinear regime, whereas longer pulse-off times promote relaxation and suppress accumulation. These findings establish a unified scaling framework for pulse-driven accumulative switching, providing quantitative insight into nonequilibrium ferroelectric domain evolution and design guidelines for HZO-based memory and neuromorphic devices.

cond-mat.mtrl-sci

Asymmetric Resonant Ferroelectric Tunnel Junctions for Simultaneous High Tunnel Electroresistance and Low Resistance-Area Product

Ferroelectric tunnel junctions offer potential for non-volatile memory with low power, fast switching, and scalability, but their performance is limited by a high resistance-area product and a low tunnel electroresistance ratio. To address these challenges, we propose a doped HfO2-based, silicon-compatible asymmetric resonant ferroelectric tunnel junction design with a quantum well embedded between two ferroelectric layers, replacing the conventional metal-ferroelectric-metal structure. Using a self-consistent coupling of the non-equilibrium Green's function method with a Preisach-based model, we demonstrate that the quantum well enhances resonant tunneling effects, leading to a simultaneous reduction in the resistance-area product and a boost in the tunnel electroresistance ratio. The low-resistance state becomes more robust, while the high-resistance state is suppressed, improving readout speed and reducing power usage. We observed that incorporating a 2 nm quantum well significantly enhances the tunnel electroresistance ratio, achieving a peak value of approximately 6.15 x 10^4 percent, while simultaneously minimizing the resistance-area product to 47.1 Ohm-cm^2 at 0.175 V. Additionally, the device exhibits negative differential resistance, further enhancing its functionality. Our results confirm that this design enables scalable, energy-efficient, and high-performance non-volatile memory, making it a strong candidate for future memory technologies.

cond-mat.mes-hall