Electron transport in a 1.6~nm-thick double-gated (100) silicon nanosheet: A theoretical study accounting for phonon confinement and remote-phonon scattering
We study theoretically electron transport in an top-and bottom-gated (100) 1.6 nm-thin silicon nanosheet with SiO2/HfO2 gate stacks, focusing on the intrinsic physical processes that affect transport: the confinement of phonons and the presence of interface hybrid plasmon-phonon excitations (IPPs or `remote phonons'). The band structure is calculated using local empirical pseudopotentials; an approximated elastic continuum model is used to consider the confinement of acoustic phonons; the dielectric continuum limit is used to deal with the IPPs. We find that the electron mobility is affected significantly by the boundary conditions chosen to deal with phonon confinement. The more realistic assumption of phonons clamped at the SiO2/HfO2 interfaces and optical phonons at the Si/SiO2 interfaces results in a room temperature mobility much smaller than what is obtained using the common assumption of bulk phonons in the elastic, high-temperature approximation. We also find that, as a result of the complicated structure of the primed subbands, the high-field saturated velocity is significantly lower than its bulk value, as it had been measured in the past in the case of Si inversion layers but never explained theoretically. Finally, we find that IPP scattering does depress the low-field mobility but to a small extent, thanks to the presence of the interfacial SiO2 layers and to the proximity of the metal gates. Moreover, by keeping electrons `cooler', IPP scattering results in a higher saturated velocity. Therefore, the presence of high-kappa materials in the gate-insulator stacks should not affect negatively the performance of field effect transistors based on Si nanosheets.