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Bo-Wen Jia

Publications and source records attributed to Bo-Wen Jia.

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AnalogMaster: Large Language Model-based Automated Analog IC Design Framework from Image to Layout

Design automation has the potential to substantially improve the efficiency of analog integrated circuit (IC) design. However, existing algorithms and tools typically focus on individual stages, such as device sizing, placement, or routing, and still require significant manual intervention to complete the full design flow. While large language models (LLMs) have recently demonstrated remarkable success in automating digital IC design workflows, these advances cannot be directly transferred to analog IC design. Key challenges include strongly coupled performance metrics, the predominance of unstructured circuit schematic images, and the fact that most prior approaches address only isolated stages of the analog design process, limiting their ability to capture end-to-end performance impact. To address these challenges, we propose AnalogMaster, an extensible, LLM-based framework that enables end-to-end automation of analog IC design through a unified pipeline spanning circuit image-to-netlist generation, parameter optimization, placement, and routing. AnalogMaster integrates a joint reasoning mechanism that leverages in-context learning and intent reasoning to achieve accurate and robust image-to-netlist conversion. A parameter search agent integrating self-enhanced prompt engineering and context truncation is developed for effective device sizing and downstream physical design. Experimental evaluations on 15 representative circuits with varying levels of complexity demonstrate strong and consistent performance across multiple models. In particular, GPT-5 achieves success rates of 92.9% and 99.9% on Pass@1 and Pass@5, respectively. These results validate the effectiveness and robustness of the proposed framework and establish a practical paradigm for applying LLMs to full-stack analog IC design automation.

cs.AR

Uncovering the Maximum Chirality in Dielectric Nanostructures

Maximum structural chirality refers to the highest selectivity for circularly polarized light (CPL) in nanostructures, often manifested as maximum circular dichroism (CD), optical rotation (OR), and spin-orbit coupling (SOC). However, the underlying physical mechanisms that lead to maximum chirality remain unclear. In this work, we demonstrate that maximum chirality in dielectric nanostructures arises from the constructive and destructive interference of multipole moments with different CPL. By employing generalized multipole decomposition, we introduce a generalized chiral multipole mechanism that allows for direct numerical calculation of CD and establishes the conditions required to achieve maximum chirality. This approach provides a comprehensive framework for analyzing chirality and serves as a foundation for future investigations of chiral nanostructures.

physics.optics