arXiv subjects

Burkhard Beckhoff

Publications and source records attributed to Burkhard Beckhoff.

22 records · Page 2Linked to original sources

arXiv2019

Photon flux determination of a liquid-metal jet x-ray source by means of photon scattering

Liquid-metal jet X-ray sources promise to deliver high photon fluxes, which are unprecedented for laboratory based X-ray sources, because the regenerating liquid-metal anode is less sensitive to damage caused by an increased electron beam power density. For some quantitative X-ray analysis techniques, knowledge of the absolute photon flux is needed. However, a precise experimental determination of the photon flux of high-performance X-ray sources is challenging, because a direct measurement results in significant dead time losses in the detector or could even harm the detector. Indirect determinations rely on data base values of attenuation or scattering cross sections leading to large uncertainties. In this study we present an experimental determination of the photon flux of a liquid-metal jet X-ray source by means of elastic and inelastic photon scattering. Our approach allows for referencing the unpolarized output radiation of the liquid-metal jet X-ray source to polarized synchrotron radiation in a simple setup. Absolute photon fluxes per solid angle are presented with a detailed uncertainty budget for the characteristic emission lines of Ga K$α$ and In K$α$ for two different acceleration voltages of the X-ray source. For a nominal setting of 200 W (70 kV, 2.857 mA) the determined values for Ga K$α$ and In K$α$ are 6.0(5)$\times 10^{12}$ s$^{-1}$sr$^{-1}$ and 3.8(4)$\times 10^{11}$ s$^{-1}$sr$^{-1}$, respectively.

physics.ins-det↗

arXiv2019

Reference-free GIXRF-XRR as a methodology for independent validation of XRR on ultrathin layer stacks and a depth-dependent characterization

Nanolayer stacks are technologically very relevant for current and future applications in many fields of research. A non-destructive characterization of such systems is often performed using X-ray reflectometry (XRR). For complex stacks of multiple layers, low electron density contrast materials or very thin layers without any pronounced angular minima, this requires a full modeling of the XRR data. As such modeling is using the thicknesses, the densities and the roughnesses of each layer as parameters, this approach quickly results in a large number of free parameters. In consquence, cross-correlation effects or interparameter dependencies can falsify the modeling results. Here, we present a route for validation of such modeling results which is based on the reference-free grazing incidence X-ray fluorescence (GIXRF) methodology. In conjunction with the radiometrically calibrated instrumentation of the Physikalisch-Technische Bundesanstalt the method allows for reference-free quantification of the elemental mass depositions. In addition, a modeling approach of reference-free GIXRF-XRR data is presented, which takes advantage of the quantifiable elemental mass depositions by distributing them depth dependently. This approach allows for a reduction of the free model parameters. Both the validation capabilities and the combined reference-free GIXRF-XRR modeling are demonstrated using several nanoscale layer stacks consisting of HfO$_2$ and Al$_2$O$_3$ layers.

physics.app-ph↗

arXiv2018

Accurate experimental determination of Gallium K- and L3-shell XRF fundamental parameters

The fluorescence yield of the K- and L3-shell of gallium was determined using the radiometrically calibrated (reference-free) X-ray fluorescence instrumentation at the BESSY II synchrotron radiation facility. Simultaneous transmission and fluorescence signals from GaSe foils were obtained, resulting in K- and L3-shell fluorescence yield values consistent with existing database values(omega_Ga_K=0.515 +- 0.019, omega_Ga_L3=0.013 +- 0.001). For the first time, these standard combined uncertainties are obtained from a properly constructed Uncertainty Budget. These K-shell fluorescence yield values support Bambynek's semi-empirical compilation from 1972: these and other measurements yield a combined recommended value of omega_Ga_K=0.514 +- 0.010. Using the measured fluorescence yields together with production yields from reference Ga-implanted samples where the quantity of implanted Ga was determined at 1.3% traceable accuracy by Rutherford backscattering spectrometry, the K-shell and L3-subshell photoionization cross sections at selected incident photon energies were also determined and compared critically with the standard databases.

physics.atom-ph↗

arXiv2018

Characterization of sub-monolayer coatings as novel calibration samples for X-ray spectroscopy

With the advent of both modern X-ray fluorescence (XRF) methods and improved analytical reliability requirements the demand for suitable reference samples has increased. Especially in nanotechnology with the very low areal mass depositions, quantification becomes considerably more difficult. However, the availability of suited reference samples is drastically lower than the demand. Physical vapor deposition (PVD) techniques have been enhanced significantly in the last decade driven by the need for extremely precise film parameters in multilayer production. We have applied those techniques for the development of layer-like reference samples with mass depositions in the ng-range and well below. Several types of reference samples were fabricated: multi-elemental layer and extremely low (sub-monolayer) samples for various applications in XRF and total-reflection XRF (TXRF) analysis. Those samples were characterized and compared at three different synchrotron radiation beamlines at the BESSY II electron storage ring employing the reference-free XRF approach based on physically calibrated instrumentation. In addition, the homogeneity of the multi-elemental coatings was checked at the P04 beamline at DESY. The measurements demonstrate the high precision achieved in the manufacturing process as well as the versatility of application fields for the presented reference samples.

physics.app-ph↗