arXiv subjects

C. Corley-Wiciak

Publications and source records attributed to C. Corley-Wiciak.

3 recordsLinked to original sources

arXiv2026

Watching a GaN Transistor Switch: Real-Time Nanoscale Strain and Heat Dynamics

Digital and energy technologies depend on microelectromechanical and power electronic components whose performance is critically impacted by rapid, cyclic deformations. Real-time information on their operation has remained inaccessible due to the need for nanosecond and nanometer resolution in fully integrated devices. We break this limitation by imaging the complete switching cycle of an industrial GaN high electron mobility transistor through stroboscopic dark field X ray microscopy at a fourth-generation synchrotron, resolving electromechanical and thermal micro strain fields across the entire device and correlating them with time dependent voltage characteristics. Coupled simulations benchmarked against the measurements reproduce electric field evolution and transient thermal hotspots. This combined approach provides direct insight into device physics and informs design strategies for next generation energy and information processing technologies.

cond-mat.mtrl-sci↗

arXiv2025

Oblique diffraction geometry for the observation of several non-coplanar Bragg reflections under identical illumination

We present a method to determine the strain tensor and local lattice rotation with Dark Field X-ray Microscopy. Using a set of at least 3 non-coplanar, symmetry-equivalent Bragg reflections, the illuminated volume of the sample can be kept constant for all reflections, facilitating easy registration of the measured lattice variations. This requires an oblique diffraction geometry, i.e.~the diffraction plane is neither horizontal nor vertical. We derive a closed, analytical expression that allows determination of the strain and lattice rotation from the deviation of experimental observables (e.g.~goniometer angles) from their nominal position for an unstrained lattice.

cond-mat.mtrl-sci↗

arXiv2023

Lattice deformation at the sub-micron scale: X-ray nanobeam measurements of elastic strain in electron shuttling devices

The lattice strain induced by metallic electrodes can impair the functionality of advanced quantum devices operating with electron or hole spins. Here we investigate the deformation induced by CMOS-manufactured titanium nitride electrodes on the lattice of a buried, 10 nm-thick Si/SiGe Quantum Well by means of nanobeam Scanning X-ray Diffraction Microscopy. We were able to measure TiN electrode-induced local modulations of the strain tensor components in the range of $2 - 8 \times 10^{-4}$ with ~60 nm lateral resolution. We have evaluated that these strain fluctuations are reflected into local modulations of the potential of the conduction band minimum larger than 2 meV, which is close to the orbital energy of an electrostatic quantum dot. We observe that the sign of the strain modulations at a given depth of the quantum well layer depends on the lateral dimensions of the electrodes. Since our work explores the impact of device geometry on the strain-induced energy landscape, it enables further optimization of the design of scaled CMOS-processed quantum devices.

cond-mat.mtrl-sci↗