arXiv subjects

Carsten Richter

Publications and source records attributed to Carsten Richter.

5 recordsLinked to original sources

arXiv2026

Sharp periodic Ge concentration modulations beyond the conduction band valley wavevector $k_0$ in nuclear spin-free Si quantum wells

Periodic Ge modulations within strained Si quantum wells in SiGe heterostructures offer a route to deterministically enhance conduction-band valley splitting in Si, a key requirement for scalable spin-qubit quantum computing. Efficient enhancement requires modulations in the order of the Si valley wavevector $k_0$ (9.7 nm$^{-1}$), corresponding to a period of 0.64 nm and near-monolayer growth control. Using nuclear-spin-free molecular beam epitaxy with $^{28}$Si and $^{72}$Ge, we demonstrate Ge-modulated Si quantum wells with periods from 2.00 to 0.49 nm, including modulations at $k_0$ and $2k_0/3$. Synchrotron X-ray techniques and scanning transmission electron microscopy reveal laterally homogeneous Ge modulations over micrometer scales, with amplitudes up to 10 at-% and gradients reaching 20 at-%/nm. Two-bands $\mathbf{k}\cdot\mathbf{p}$ simulations suggest deterministic enhancement of valley splittings in steep trapezoidal $2k_0/3$ heterostructures, while the effect in $k_0$-type quantum wells is much weaker.

physics.app-ph↗

arXiv2026

Epitaxy of strained, nuclear-spin free $^{76}$Ge quantum wells from solid source materials

Germanium quantum well heterostructures have rapidly emerged as a leading platform for solid-state quantum information processing; however, material quality limits scalability, and higher structural quality, higher purity, as well as zero nuclear spin, are required. Here, we address these problems by employing the heaviest of Ge isotopes, by evaporating high-purity $^{76}$Ge radiation detector material, as utilized in fundamental neutrino particle physics experiments, to fabricate $^{76}$Ge/$^{28}$Si$^{76}$Ge quantum wells for quantum applications and explore the respective challenges. Specifically, we demonstrate improved results on strain-relaxed virtual Si$_{0.2}$Ge$_{0.8}$ substrates, forward graded from Si, with a dislocation density below 3.7$\cdot$10$^{5}$ cm$^{-2}$, explore nuclear spin-free solid-source molecular beam epitaxy, and demonstrate first quantum transport in $^{76}$Ge quantum wells. We demonstrate a record-level quantum well interface width of 0.3 nm by X-ray reflectivity, and quantitatively compare it to atom probe tomography and scanning transmission electron microscopy. The grown layer reveals nuclear-spin-bearing impurity concentrations below 10$^{19}$ cm$^{-3}$ and chemical impurity levels below 10$^{18}$ cm$^{-3}$, except for residual carbon attributed to the graphite crucible of the Ge source, which may reach up to 10$^{19}$ cm$^{-3}$. Low-temperature magneto-transport measurements yield electron mobilities of 6.1$\cdot$10$^4$ cm$^2$V$^{-1}$s$^{-1}$ at 15 mK with a carrier density of 2.2$\cdot$10$^{11}$ cm$^{-2}$, indicating that residual carbon is the dominant scattering mechanism.

physics.app-ph↗

arXiv2022

X-ray scattering study of GaN nanowires grown on Ti/Al$_{2}$O$_{3}$ by molecular beam epitaxy

GaN nanowires (NWs) grown by molecular beam epitaxy on Ti films sputtered on Al$_{2}$O$_{3}$ are studied by X-ray diffraction (XRD) and grazing incidence small-angle X-ray scattering (GISAXS). XRD, performed both in symmetric Bragg reflection and at grazing incidence, reveals Ti, Ti$_{3}$O, Ti$_{3}$Al, and TiO$_x$N$_y$ crystallites with in-plane and out-of-plane lattice parameters intermediate between those of Al$_{2}$O$_{3}$ and GaN. These topotaxial crystallites in Ti film, formed due to interfacial reactions and N exposure, possess fairly little misorientation with respect to Al$_{2}$O$_{3}$. As a result, GaN NWs grow on the top TiN layer possessing a high degree of epitaxial orientation with respect to the substrate. The measured GISAXS intensity distributions are modeled by the Monte Carlo method taking into account the orientational distributions of NWs, a variety of their cross-sectional shapes and sizes, and roughness of their side facets. The cross-sectional size distributions of the NWs and the relative fractions of $(1\bar{1}00)$ and $(11\bar{2}0)$ side facets are determined.

cond-mat.mtrl-sci↗

arXiv2022

Coexistence of local structural heterogeneities and long-range ferroelectricity in Pb-free (1-x)Ba(Zr0.2Ti0.8)O3-x(Ba0.7Ca0.3)TiO3 ceramics

Environmentally benign (1-x)Ba(Ti$_{0.8}$Zr$_{0.2}$)O$_3$-x(Ba$_{0.7}$Ca$_{0.3}$)TiO$_3$ (BZT-BCT) ceramics are promising materials due to their remarkable high piezoresponse [Liu and Ren, Phys. Rev. Lett. \textbf{103}, 257602 (2009)]. In this Letter, by focusing on local and average structure in combination with macroscopic electromechanical and dielectric measurements we demonstrate the structure property relationship in the tetragonal BZT-BCT ceramic. During high-temperature cubic to tetragonal phase transformation, polar nanoregions are manifested through the spontaneous volume ferroelectrostriction at temperatures below $\sim$ 477 K. Temperature-dependent local structural investigations across the Zr K edge extended x-ray absorption fine structure spectroscopy reveal an anomalous collaboration between the ZrO$_{6}$ and TiO$_6$ octahedra. These octahedra compromise their individuality during polarization development. The presence of domains of submicron size embedded inside the macroscopic ferroelectric regions below T$_{m}$, as well as their hierarchical arrangement, is observed by piezo-response force microscopy. Effects of the existence of the structural/polar heterogeneities below T$_{m}$ are observed also when polarizibilities of the poled and the unpoled samples are compared; the poled sample is found to be more susceptible to the electric field. In addition, by using electric field dependent x-ray diffraction studies we also show that this ceramic under field exhibits reduction of tetragonal distortion, which is consistent with earlier reports.

cond-mat.mtrl-sci↗

arXiv2022

Nanoscale mapping of the full strain tensor, rotation and composition in partially relaxed In$_x$Ga$_{1-x}$N layers by scanning X-ray diffraction microscopy

Strain and composition play a fundamental role in semiconductor physics, since they are means to tune the electronic and optical properties of a material and hence develop new devices. Today it is still a challenge to measure strain in epitaxial systems in a non-destructive manner which becomes especially important in strain-engineered devices that often are subjected to intense stress. In this work, we demonstrate a microscopic mapping of the full tensors of strain and lattice orientation by means of scanning X-ray diffraction microscopy. We develope a formalism to extract all components of strain and orientation from a set of scanning diffraction measurements and apply the technique to a patterned In$_x$Ga$_{1-x}$N double layer to study strain relaxation and indium incorporation phenomena. The contributions due to varying indium content and threading dislocations are separated and analyzed.

cond-mat.mtrl-sci↗