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Catherine Marichy

Publications and source records attributed to Catherine Marichy.

4 recordsLinked to original sources

From Amorphous to Amorphous-Crystalline Mixed-Phase Boron Nitride: Evolution of the Thermal and Elastic Properties

Amorphous boron nitride (aBN) is a promising dielectric and protective coating, yet its nanoscale heat dissipation and elastic response remain poorly quantified. Here we synthesize a variety of BN thin films by borazine-based chemical vapor deposition (800-1000 C) and study the temperature-driven structural transition from fully amorphous networks to mixed amorphous-crystalline films with embedded BN nanocrystallites.Frequency-domain thermoreflectance data show an ultralow, thickness-dependent cross-plane thermal conductivity for aBN (kout < 0.5 W m-1 K-1 for 10-40 nm), which increases systematically with crystalline order up to 1.5 W m-1 K-1. Micro-Brillouin light scattering and finite-element modelling reveal a concomitant stiffening, with Young's modulus rising from 7.5 +/- 0.7 GPa (800 C) to 53 +/- 5 GPa (1000 C). Green-Kubo molecular dynamics simulations rationalize these trends via bonding topology and vibrational transport, and highlight how oxygen, hydrogen and carbon impurities and composition provide practical knobs to further tune the thermal and mechanical responses in BN films for improving nano-electronics, interconnects and coating applications.

cond-mat.mtrl-sci

Atomic-Scale Origins of Oxidation Resistance in Amorphous Boron Nitride

Amorphous boron nitride (\textrm{$α$}-BN) is a promising ultrathin barrier for nanoelectronics, yet the atomistic mechanisms governing its chemical stability remain poorly understood. Here, we investigate the structure-property relationship that dictates the oxidation of \textrm{$α$}-BN using a combination of machine-learning molecular dynamics simulations and angle-resolved X-ray photoelectron spectroscopy. The simulations reveal that the film structure, controlled by synthesis conditions, is the critical factor determining oxidation resistance. Dense, chemically ordered networks with a high fraction of B-N bonds effectively resist oxidation by confining it to the surface, whereas porous, defect-rich structures with abundant homonuclear B-B and N-N bonds permit oxygen penetration and undergo extensive bulk degradation. These computational findings are consistent with experimental trends observed in \textrm{$α$}-BN films grown by chemical vapour deposition. XPS analysis shows that a film grown at a higher temperature develops a more ordered structure with a B/N ratio nearer to stoichiometric and exhibits superior resistance to surface oxidation compared to its more defective, lower-temperature counterpart. Together, these results demonstrate that the oxidation resistance of \textrm{$α$}-BN is a tunable property directly linked to its atomic-scale morphology, providing a clear framework for engineering chemically robust dielectric barriers for future nanoelectronic applications.

cond-mat.mtrl-sci

Photonic hyperuniform networks by silicon double inversion of polymer templates

Hyperuniform disordered networks belong to a peculiar class of structured materials predicted to possess partial and complete photonic bandgaps for relatively moderate refractive index contrasts. The practical realization of such photonic designer materials is challenging however, as it requires control over a multi-step fabcrication process on optical length scales. Here we report the direct-laser writing of hyperuniform polymeric templates followed by a silicon double inversion procedure leading to high quality network structures made of polycrystalline silicon. We observe a pronounced gap in the shortwave infrared centered at a wavelength of $λ_{\text{Gap}}\simeq $ 2.5 $μ$m, in nearly quantitative agreement with numerical simulations. In the experiments the typical structural length scale of the seed pattern can be varied between 2 $μ$m and 1.54 $μ$m leading to a blue-shift of the gap accompanied by an increase of the silicon volume filling fraction.

physics.optics

High-quality photonic crystals with a nearly complete band gap obtained by direct inversion of woodpile templates with titanium dioxide

Photonic crystal materials are based on a periodic modulation of the dielectric constant on length scales comparable to the wavelength of light. These materials can exhibit photonic band gaps; frequency regions for which the propagation of electromagnetic radiation is forbidden due to the depletion of the density of states. In order to exhibit a full band gap, 3D PCs must present a threshold refractive index contrast that depends on the crystal structure. In the case of the so-called woodpile photonic crystals this threshold is comparably low, approximately 1.9 for the direct structure. Therefore direct or inverted woodpiles made of high refractive index materials like silicon, germanium or titanium dioxide are sought after. Here we show that, by combining multiphoton lithography and atomic layer deposition, we can achieve a direct inversion of polymer templates into TiO$_{2}$ based photonic crystals. The obtained structures show remarkable optical properties in the near-infrared region with almost perfect specular reflectance, a transmission dip close to the detection limit and a Bragg length comparable to the lattice constant.

physics.optics