Polaron Self-Trapping Rates from First Principles
Polaron formation, also known as self-trapping, is a process akin to nonradiative carrier capture at point defects or impurities. In this work, we develop the formalism to determine how long it takes to form a small hole or electron polaron from first principles. We employ an accurate, fully first-principles approach based on a Koopmans compliant hybrid functional. The self-trapping rate is the product of two components: the nonradiative capture coefficient, which we evaluate using a one-dimensional approximation, and the maximum density of polaron sites, whose physics we elucidate based on finite-size interactions present in supercells. We apply our methodology to several technologically relevant materials known to host hole polarons, Ga$_2$O$_3$, Al$_2$O$_3$, BeO, KBr, MgO, NaCl, SiO$_2$, SnO$_2$, TiO$_2$, and ZnO, and to an electron polaron in rutile TiO$_2$. We also study an emerging semiconductor, rutile GeO$_2$, where we find that polaron formation could hamper $p$-type conductivity. The calculated self-trapping lifetimes span 7 orders of magnitude, from $10^{-1}$ to $10^6$~ps, in agreement with experiments where available, and providing detailed insight into the dynamics of carrier localization and relaxation in solids.