arXiv subjects

Christoph Wilhelmer

Publications and source records attributed to Christoph Wilhelmer.

7 recordsLinked to original sources

arXiv2026

Towards ultra-scaled nanoelectronics using the zipper material system $Bi_2O_2Se/Bi_2SeO_5$

Two-dimensional (2D) materials could overcome the scaling bottleneck of nanoelectronics by enabling atomically thin channels, superior electrostatic control, and reduced short-channel effects. However, progress is limited by the lack of semiconductor–insulator interfaces being simultaneously scalable, stable, and reliable. Conventional 2D interfaces are often low quality or require transferring dissimilar materials, limiting reproducibility and scalability. We show that the zipper heterostructure formed by the high-mobility 2D semiconductor Bi 2 O 2 Se and its native high- κ oxide Bi 2 SeO 5 addresses these challenges, providing an atomically sharp, chemically matched interface with excellent electrostatics and promising scaling potential. We further present the first comprehensive multiscale assessment of Bi 2 O 2 Se/Bi 2 SeO 5 transistors targeting thermal stability, reliability, and scalability by linking atomic-scale structure and defects to device-level behavior across four transistor generations (top-gated, fin, and two gate-all-around architectures). Benchmarking against IRDS-2035 targets indicates that Bi 2 O 2 Se/Bi 2 SeO 5 devices could deliver high drive current with low gate leakage under aggressive scaling, potentially surpassing the targets in the upper-bound region of the sensitivity analysis. Finally, we identify oxygen-related oxide defects as the dominant origin of hysteresis consistent with a beneficial role of encapsulation and oxygen-rich annealing. Together, our findings support the potential of this zipper material system as a technologically-credible and manufacturing-relevant platform for future nanoelectronics.

cond-mat.mtrl-sci↗

arXiv2026

Efficient Quantum-Mechanical Modeling of Nonradiative Charge Transfer Processes

Nonradiative charge transfer processes play a central role in a wide range of physical phenomena, including reliability phenomena in semiconductor devices such as bias temperature instability, hysteresis, random telegraph noise, and trap-assisted tunneling. nonradiative multiphonon (NMP) theory provides a physically rigorous framework for describing such charge transitions, but its full quantum-mechanical formulation is computationally too demanding for large-scale simulations. In this work, we present a systematic and implementation-oriented treatment of NMP-based models for practical large-scale simulations. Starting from the quantum-mechanical foundations of coupled electron--phonon dynamics, we derive computationally efficient approximations for charge capture and emission rates and clearly identify the underlying assumptions and validity regimes. In particular, we introduce an effective crossing-preserving approximation that yields fully analytic, numerically stable, and computationally inexpensive transition rates while retaining the essential quantum-mechanical physics. The resulting expressions are therefore well suited for large-scale device simulations, where capture coefficients must be evaluated repeatedly over broad multidimensional parameter spaces. Furthermore, we derive continuum formulations for transitions between localized defect states and extended electronic bands, enabling direct incorporation into semiconductor-device simulations. The resulting framework bridges microscopic defect physics and practical large-scale simulations of charge transfer processes in complex semiconductor devices. At the same time this work serves as a practical guide for implementing physically grounded NMP-based models, providing both a systematic derivation of the underlying theory and a clear guidance on the validity limits.

cond-mat.mtrl-sci↗

arXiv2025

Valley Splittings in Si/SiGe Heterostructures from First Principles

We compute valley splittings in Si/SiGe superlattices using ab initio density functional theory (DFT). This first-principle approach is expected to provide an excellent description of interfaces, strains, and atomistic disorder without empirically fitted parameters. We benchmark atomistic tight-binding (TB) and the ``$2k_0$'' theory within the effective mass (EM) approximation against DFT. We show that DFT supports the main conclusions of the 2$k_0$ theory, but reveals some limitations of semi-empirical methods such as the EM and TB, in particular about the description of atomistic disorder. The DFT calculations also highlight the effects of strong valley-orbit mixing at large valley splittings. Nevertheless, TB and the 2$k_0$ theory shall provide reasonable valley splitting statistics in many heterostructures of interest for spin qubit devices.

cond-mat.mtrl-sci↗

arXiv2025

How to Identify Suitable Gate Dielectrics for Transistors based on Two-Dimensional Semiconductors

The recent progress in nanosheet transistors has established two-dimensional (2D) semiconductors as viable candidates for future ultra-scaled electronic devices. Next to reducing contact resistance, identifying good gate dielectrics is a fundamental challenge, as the dielectric/channel interface dramatically impacts virtually all performance parameters. While several promising gate dielectrics have recently been reported, the evaluation of their quality and suitability is often fragmentary and focused on selected important performance metrics of the gate stack, such as the capacitive gate control, leakage currents, reliability, and ease of fabrication and integration. However, identifying a suitable gate stack is a complex problem that has not yet been approached systematically. In this perspective, we aim to formulate general criteria for good gate dielectrics.

physics.app-ph↗

arXiv2024

Machine Learning Force Field for Thermal Oxidation of Silicon

Looking back at seven decades of highly extensive application in the semiconductor industry, silicon and its native oxide SiO$_2$ are still at the heart of several technological developments. Recently, the fabrication of ultra-thin oxide layers has become essential for keeping up with trends in down-scaling of nanoelectronic devices and for the realization of novel device technologies. With this comes a need for better understanding of the atomic configuration at the Si/SiO$_2$ interface. Classical force fields offer flexible application and relatively low computational costs, however, suffer from limited accuracy. Ab-initio methods give much better results but are extremely costly. Machine learning force fields (MLFF) offer the possibility to combine the benefits of both worlds. We train a MLFF for the simulation of the dry thermal oxidation process of a Si substrate. The training data is generated by density functional theory calculations. The obtained structures are in line with ab-initio simulations as well as with experimental observations. Compared to a classical force field, the most recent reactive force field (reaxFF), the resulting configurations are vastly improved.

cond-mat.mtrl-sci↗

arXiv2024

Coherence limit due to hyperfine interaction with nuclei in the barrier material of Si spin qubits

On the quest to understand and reduce environmental noise in Si spin qubits, hyperfine interactions between electron and nuclear spins impose a major challenge. Silicon is a promising host material because one can enhance the spin coherence time by removing spinful $^{29}$Si isotopes. As more experiments rely on isotopic purification of Si, the role of other spinful atoms in the device should be clarified. This is not a straightforward task, as the hyperfine interactions with atoms in the barrier layers are poorly understood. We utilize density functional theory to determine the hyperfine tensors of both Si and Ge in a crystalline epitaxial Si/SiGe quantum well as well as Si and O atoms in an amorphous Si/SiO$_2$ (MOS) interface structure. Based on these results, we estimate the dephasing time $T_2^*$ due to magnetic noise from the spin bath and show that the coherence is limited by interactions with non-Si barrier atoms to a few \textmu s in Si/SiGe (for non-purified Ge) and about 100\,\textmu s in Si-MOS. Expressing these numbers alternatively, in Si/SiGe the interactions with Ge dominate below 1000\,ppm of $^{29}$Si content, and, due to low natural concentration of the spinful oxygen isotopes, the interactions with oxygen in Si-MOS become significant only below 1\,ppm of $^{29}$Si content.

cond-mat.mes-hall↗

arXiv2022

Modeling the Initial Stages of Si(100) Thermal Oxidation: An Ab-initio Approach

Silicon together with its native oxide SiO$_2$ was recognized as an outstanding material system for the semiconductor industry in the 1950s. In state-of-the-art device technology, SiO$_2$ is widely used as an insulator in combination with high-$k$ dielectrics such as HfO$_2$, demanding fabrication of ultra-thin interfacial layers. The classical standard model derived by Deal and Grove accurately describes the oxidation of Si in a progressed stage, however, strongly underestimates growth rates for thin oxide layers. Recent studies report a variety of oxidation mechanisms during the growth of oxide films in the range of \SI{10}{\angstrom} with various details still under debate. This paper presents a first-principles based approach to theoretically assess the thermal oxidation process of the technologically relevant Si(100) surfaceduring this initial stage. Our investigations range from the chemisorption of single O$_2$ molecules onto the $p(2\times2)$ reconstructed Si surface to oxidized Si surface layers with a thickness of up to \SI{20}{\angstrom}. The initially observed enhanced growth rate is assigned to barrierless O$_2$ chemisorption events upon which the oxygen molecule dissociate. We present strong evidence for an immediate amorphization of the oxide layer from the onset of oxidation. Surface reactions dominate until the surface is saturated with oxygen and separated from the Si substrate by a \SI{5}{\angstrom} transition region. The saturated surface becomes inert to dissociative reactions and enables the diffusion of molecular oxygen to the \interface interface as assumed within the Deal-Grove model. Further oxidation of the Si substrate is then provided by O$_2$ dissociations at the interface due to the same charge transfer process responsible for the chemisorption at the surface.

cond-mat.mtrl-sci↗