arXiv subjects

Daiki Katsube

Publications and source records attributed to Daiki Katsube.

6 recordsLinked to original sources

arXiv2026

Groove-shaped defects in as-grown (001)-oriented $β$-Ga$_2$O$_3$ epilayers prepared by halide vapor phase epitaxy

Groove-shaped defects (GSDs) degrade the surface flatness of as-grown (001)-oriented $β$-Ga$_2$O$_3$ epilayers and necessitate chemical mechanical polishing before device fabrication, increasing processing costs and the risk of damage. We investigated the morphology, subsurface structure, and formation mechanism of GSDs in a homoepitaxial layer grown by halide vapor phase epitaxy using synchrotron X-ray topography and electron microscopy. The GSDs extended several millimeters along [010] and consisted predominantly of (-102) basal facets bounded by steep (100) sidewalls. Their wafer-scale distribution showed a spatial correspondence with variations in wafer curvature, suggesting that local surface orientation influences GSD formation. Careful alignment of surface images with transmission X-ray topographs revealed no one-to-one correspondence between GSDs and substrate defects, providing no evidence that substrate dislocations serve as their nucleation sites. Instead, transmission electron microscopy revealed planar defects localized near the terminal boundaries where the faceted GSD sectors met the surrounding (001) growth region; no such defects were observed in specimens extracted from the middle of GSDs. These defects exhibited α-fringe contrast characteristic of inclined translational planar defects, with the dominant segments assigned to the (1-21) plane. The observations suggest that variations in local surface orientation and step supply may promote three-dimensional faceted growth, producing persistent (-102)/(100) sectors. The localized planar defects are therefore interpreted as consequences of growth-sector coalescence rather than the origins of GSD nucleation. These findings provide insight into the roles of wafer curvature and surface step supply in GSD formation.

cond-mat.mtrl-sci↗

arXiv2026

Dislocations in (011)-oriented vertical Bridgman $β$-Ga$_2$O$_3$ substrates

Dislocation in (011)-oriented $β$-Ga$_2$O$_3$ substrates grown by the vertical Bridgman method was investigated using X-ray topography (XRT), combined with X-ray reticulography. Transmission XRT reveals dislocations lying on the (001) plane and extending along [010], forming arrays associated with domain boundaries. Dislocations on the (011) plane were also identified but differ from those responsible for line-shaped pits on (001) epilayers. Reflection XRT shows good agreement with transmission XRT and enables classification of dislocation types based on contrast features. Reticulography confirms domain boundaries with misorientation on the order of 1E-5 rad, providing insight into defect formation relevant to epi-growth and device performance.

cond-mat.mtrl-sci↗

arXiv2026

Three-dimensional visualization of lattice defects in $β$-Ga$_2$O$_3$ via synchrotron-radiation Borrmann-effect X-ray topo-tomography

beta-Ga2O3 is a promising material for next-generation power electronics; however, its performance is strongly affected by lattice defects such as dislocations. In this study, we demonstrate three-dimensional (3D) visualization of dislocations in \b{eta}-Ga2O3 using synchrotron-radiation X-ray topo-tomography under a two-beam Borrmann-effect condition in transmission X-ray topography. By rotating the sample about the diffraction vector and acquiring a series of topo-tomographic images at different rotation angles, the evolution of dislocation contrast is captured, providing intuitive, depth-resolved visualization of dislocations. This method enables clear separation of dislocations in the epilayer and substrate in Schottky barrier diode structures, offering insight into dislocation propagation and their impact on epitaxial growth and device performance. This study represents the first demonstration of 3D dislocation reconstruction in beta-Ga2O3.

cond-mat.mtrl-sci↗

arXiv2026

High-throughput, Non-Destructive, Three-Dimensional Imaging of GaN Threading Dislocations with in-Plane Burgers Vector Component via Phase-Contrast Microscopy

We demonstrate a nondestructive, high-throughput method for observing dislocations in GaN (0001) using phase-contrast microscopy (PCM). The PCM images (359x300 $μ$m$^2$) analyzed in this study were acquired with an exposure time of 3 ms per image. The one-to-one correspondence between threading dislocation (TD) contrasts in PCM images and the corresponding contrasts in multiphoton excitation photoluminescence (MPPL) images provides clear evidence that PCM can detect TDs with in-plane Burgers vector components. The contrast shape in PCM reflects the inclination of dislocations with respect to the surface normal: dot contrasts correspond to vertical dislocations, whereas line contrasts correspond to inclined dislocations. By shifting the focal plane from the top surface to the back surface, the three-dimensional propagation paths of dislocations can be visualized. The PCM image obtained represents a projection of threading dislocations within a thickness of approximately 43 $μ$m. Dislocations spaced as close as 1.3 $μ$m can be individually resolved. In addition, the capability of PCM to detect scratches, subsurface scratches, facet boundaries, and voids was demonstrated. This study establishes PCM as a versatile and laboratory-accessible technique for three-dimensional, nondestructive characterization of dislocations and other defects in wide-bandgap semiconductors.

cond-mat.mtrl-sci↗

arXiv2026

High-speed, High-Resolution, Three-Dimensional Imaging of Threading Dislocations in beta-$Ga_{2}O_{3}$ via Phase-Contrast Microscopy

This study presents a nondestructive, high-resolution method for three-dimensional imaging of threading dislocations in beta-$Ga_{2}O_{3}$ (010) using phase-contrast microscopy (PCM). A one-to-one correspondence between dislocation contrasts in PCM images and synchrotron X-ray topography (SR-XRT) images confirms the detection capability of PCM. Compared to SR-XRT, PCM provides enhanced spatial resolution, enabling the distinction of closely spaced dislocations with sub-10-micrometer separation. PCM facilitates direct visualization of dislocation propagation paths along the depth (z) direction by systematically shifting the focal plane into the crystal. In addition, the projection of stacked PCM images enables in-plane (XY) tracing of dislocation lines, providing insight into the preferred slip systems in beta-$Ga_{2}O_{3}$. This work establishes PCM as a versatile and laboratory-accessible technique for three-dimensional, nondestructive characterization of dislocations across entire wide-bandgap semiconductor wafers within a practically acceptable time frame.

cond-mat.mtrl-sci↗

arXiv2020

Machine-learning Based Extraction of the Short-Range Part of the Interaction in Non-contact Atomic Force Microscopy

A machine-learning method for extracting the short-range part of the probe-surface interaction from force spectroscopy curves is presented. Our machine-learning algorithm consists of two stages: the first stage determines a boundary that separates the region where the short-range interaction is dominantly acting on the probe, and a second stage that finds the parameters to fit the interaction over the long-range region. We successfully applied this method to force spectroscopy maps acquired over the Si(111)-(7x7) surface and found, as a result, a faint structure on the short-range interaction for one of the probes used in the experiments that would have probably been obviated using human-supervised fitting strategies.

cond-mat.mes-hall↗