arXiv subjects

Dajun Lin

Publications and source records attributed to Dajun Lin.

2 recordsLinked to original sources

arXiv2026

Single-exposure holographic lithography of ultra-high aspect-ratio microstructures

Volumetric lithography offers a path to scalable fabrication of complex three-dimensional (3D) micro- and nanoscale architectures, yet existing approaches are limited by quasi-two-dimensional exposure physics or slow serial writing. We present a single-exposure volumetric fabrication strategy that enables creation of ultrahigh-aspect-ratio 3D structures with 6 um minimum features. An inverse-designed volumetric (holographic) phase mask generates an extended-depth-of-field intensity distribution inside a photoresist volume while preserving high transverse resolution, enabling uniform polymerization of the full volume in a single exposure. With exposure times of approximately 20 s, we fabricate lattices, Penrose tilings, and micromechanical elements with feature sizes down to 6 um over volumes up to 800 x 800 x 720 um^3, achieving aspect ratios exceeding 120:1. Quantitative analysis of capillary flow in hollow lattices demonstrates controlled fluid transport with an effective capillary transport coefficient of 176.3 um/(ms)^(1/2). In situ nanoindentation-based micro-compression reveals that the printed 3D hexagonal close-packed lattices exhibit a well-defined linear elastic regime with an effective Young's modulus of 5.7 GPa, followed by progressive buckling and densification characteristic of mechanically robust cellular architectures. Overlapping, tilted and multi-mask exposures further enable quasi-3D complex geometries with potential for reconfigurability. This approach establishes a new regime of high-throughput volumetric fabrication.

physics.optics↗

arXiv2026

Single-exposure holographic 3D printing via inverse-designed phase masks

Additive manufacturing using light is commonly constrained by serial voxel-by-voxel or layer-by-layer processing, which fundamentally limits fabrication speed and scalability. Here, we introduce a single-exposure holographic three-dimensional (3D) printing approach that synthesizes an entire volumetric dose distribution optically in one step. The method combines inverse-designed microstructured phase masks with photopolymer resins engineered for controlled optical absorption. By precisely tailoring the phase-mask topography, we generate arbitrary 3D light-intensity distributions within the resin, including intentionally encoded dark regions that define hollow internal features. Simultaneously, the resin formulation is designed to balance optical penetration with sufficient local energy deposition to achieve high-fidelity polymerization throughout the volume. Using this approach, millimeter-scale architectures comprising more than $10^{6}$ addressable voxels are fabricated in a single 7.5~s exposure, corresponding to a volumetric throughput of $\sim$1~mm$^{3}$/s ($>10^{5}$~voxels/s). The demonstrated performance is presently limited by resin kinetics and illumination geometry rather than by the phase-mask framework itself. Because the volumetric information capacity scales with the space--bandwidth product of the phase mask, this approach provides a clear pathway toward substantially higher throughput, enabling scalable fabrication of micro-optical components, biomedical scaffolds, and other precision-engineered mesoscale systems.

physics.optics↗