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David Z. Pai

Publications and source records attributed to David Z. Pai.

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Photonic Interactions with Semiconducting Barrier Discharges

Semiconducting Barrier Discharges (SeBDs) generate uniform ionization waves in air at atmospheric pressure. In this work, we investigate how externally applied irradiation synchronized with the discharge can mimic photoconductive-type coupling between the plasma and the semiconductor surface. By illuminating the Si-SiO$_2$ interface with nanosecond pulsed irradiation at wavelengths from 532 nm to 1064 nm, and using fast imaging, optical emission spectroscopy, and current-voltage measurements, we demonstrate that the photoexcitation of charge carriers in silicon enhances the plasma emission and increases the reduced electric field, with no detectable change in the electrical energy. The magnitude and thresholds of these responses depend on wavelength. By comparing the SeBD to a MOS photodetector, this behaviour can be explained by the absorption length. This length determines whether carriers are photogenerated inside the depletion region at the SiO$_2$-Si interface, where they are efficiently separated and undergo impact-ionization amplification, or deeper in the silicon bulk where carrier separation is weaker and free-carrier absorption diminishes the quantum efficiency. These results focus on the microscopic processes governing the plasma-semiconductor coupling and demonstrate how the optoelectronic properties of silicon can influence surface ionization waves.

physics.plasm-ph

Stimulation of surface ionization waves by pulsed laser irradiation

The inclusion of semiconducting material within a composite barrier enables the perfectly uniform propagation of surface ionization waves (SIW) in air at atmospheric pressure regardless of the polarity of the applied electric field, unlike surface discharges generated using purely dielectric barriers. We exploit the photonic properties of silicon to stimulate the SIW using external irradiation by a 2-ns pulsed laser at 532 nm, with a fluence of 1.3 mJ/cm$^2$ per pulse at the surface. No effect is observed when irradiation occurs more than 3 $μ$s before plasma generation. This timescale is attributed to the ambipolar diffusion of photoexcited carriers away from the Si-SiO$_2$ interface. When this delay shortens to less than 3 $μ$s, the SIW propagates farther and with more intense optical emission. Furthermore, the energy of the discharge increases by up to 7%. The sensitivity to the laser-plasma delay demonstrates that the observed stimulation of the SIW cannot be due to the desorption of surface charge by irradiation.

physics.plasm-ph