SearcharxivSearch

arXiv subjects

E. M. Baeva

Publications and source records attributed to E. M. Baeva.

9 recordsLinked to original sources

Low-temperature electron dephasing rates indicate magnetic disorder in superconducting TiN films

We investigate electron transport and phase-breaking processes in thin titanium nitride (TiN) films of epitaxial quality. Previous studies show that a minute surface magnetic disorder significantly reduces the critical temperature ($T_\mathrm{c}$) and broadens the superconducting transition as the film thickness and device size decrease. We measure electron dephasing rates via magnetoresistance from $T_\mathrm{c}$ to $\sim 4T_\mathrm{c}$ in various-thickness TiN films. Electron dephasing occurs on the picosecond timescale and is nearly independent of temperature, differing from the expected inelastic scattering due to the electron-phonon and electron-electron interactions near $T_\mathrm{c}$, which occur over a nanosecond timescale. We propose spin-flip scattering as a possible additional phase-breaking mechanism. The significant increase in the dephasing rate for the thinnest film indicates that magnetic disorder resides near the surface of naturally oxidized films. Our research suggests that magnetic disorder may be a significant contributor to RF dissipation in superconducting devices based on TiN.

cond-mat.supr-con

Accurate measurement of energy relaxation via flux-flow instability

In this paper, we investigate flux-flow instability (FFI) in a superconducting single-crystal titanium nitride (TiN) film with negligible volume pinning. By studying the critical current density in 12-nm thick TiN strips of varying widths, we accurately identify the experimental parameters at which the FFI regime occurs. A comprehensive analysis of critical velocity measurements allows us to determine the quasiparticle energy relaxation time, $τ_E$. By comparing our results with the $τ_E$ values obtained from other experimental methods, we gain insight into the dominant microscopic process that governs quasiparticle relaxation within the vortex core in TiN. This mechanism is driven by an increase in quasiparticle temperature relative to phonons, rather than by quasiparticles leaving the core. Our findings indicate that $τ_E$ can be accurately determined through FFI measurements.

cond-mat.supr-con

Natural width of the superconducting transition in epitaxial TiN films

We investigate the effect of various fluctuation mechanisms on the DC resistance in superconducting devices based on epitaxial titanium nitride (TiN) films. The samples we studied show a relatively steep resistive transition (RT), with a transition width $ΔT/T_\mathrm{c} \sim 0.002-0.025$, depending on the film thickness (20 nm, 9 nm, and 5 nm) and device dimensions. This value is significantly broader than expected due to conventional superconducting fluctuations ($ΔT/T_\mathrm{c} \ll 10^{-3}$). The shape and width of the RT can be perfectly described by the well-known effective medium theory, which allows us to understand the origin of the inhomogeneity in the superconducting properties of TiN films. We propose that this inhomogeneity can have both dynamic and static origins. The dynamic mechanism is associated with spontaneous fluctuations in electron temperature (T-fluctuations), while the static mechanism is due to a random spatial distribution of surface magnetic disorder (MD). Our analysis has revealed clear correlations between the transition width and material parameters as well as device size for both proposed mechanisms. While T-fluctuations may contribute significantly to the observed transition width, our findings suggest that the dominant contribution comes from the MD mechanism. Our results provide new insights into the microscopic origin of broadening of the superconducting transition and inhomogeneity in thin superconducting films.

cond-mat.supr-con

Slow electron-phonon relaxation controls the dynamics of the superconducting resistive transition

We investigate the temporal and spatial scales of resistance fluctuations ($R$-fluctuations) at the superconducting resistive transition accessed through voltage fluctuations measurements in thin epitaxial TiN films. This material is characterized by a slow electron-phonon relaxation, which puts it far beyond the applicability range of the textbook scenario of superconducting fluctuations. The measured Lorentzian spectrum of the $R$-fluctuations identifies their correlation time, which is nearly constant across the transition region and has no relation to the conventional Ginzburg-Landau time scale. Instead, the correlation time coincides with the energy relaxation time determined by a combination of the electron-phonon relaxation and the relaxation via diffusion into reservoirs. Our data is quantitatively consistent with the model of spontaneous temperature fluctuations and highlight the lack of understanding of the resistive transition in materials with slow electron-phonon relaxation.

cond-mat.supr-con

Evidence of the disorder-independent electron-phonon scattering time in thin NbN films

We report on experimental study of the effect of disorder on electronic parameters and inelastic scattering mechanisms in ultrathin superconducting NbN films, which are commonly used in single-photon detectors. An increase in disorder in the studied 2.5 nm thick NbN films characterized by Ioffe-Regel parameter from 6.3 to 1.6 is accompanied by a decrease in the critical temperature $T_c$ from 11.5 K to 3.4 K. By measuring magnetoconductance in the range from $T_c$ to $\sim3T_c$, we extract the inelastic scattering rates of electrons, including electron-phonon (e-ph) scattering rates $τ_{e-ph}^{-1}$. We observe that $τ_{e-ph}^{-1}$ and their temperature dependencies are insensitive to disorder that is not described by the existing models of the e-ph scattering in disordered metals and can be due to the presence of weakly disordered metal grains. As the temperature decreases the temperature dependence $τ_{e-ph}^{-1}$ changes from $T^3$ to $T^2$, which can be result of a decrease in the dimension of the phonons involved in the e-ph scattering. The obtained values of material parameters of ultrathin NbN films can be useful for optimization of performance of NbN-based electronic devices.

cond-mat.supr-con

Thermal relaxation in metal films limited by diffuson lattice excitations of amorphous substrates

Here we examine the role of the amorphous insulating substrate in the thermal relaxation in thin NbN, InO$_x$, and Au/Ni films at temperatures above 5 K. The studied samples are made up of metal bridges on an amorphous insulating layer lying on or suspended above a crystalline substrate. Noise thermometry was used to measure the electron temperature $T_e$ of the films as a function of Joule power per unit of area $P_{2D}$. In all samples, we observe the dependence $P_{2D}\propto T_e^n$ with the exponent $n\simeq 2$, which is inconsistent with both electron-phonon coupling and Kapitza thermal resistance. In suspended samples, the functional dependence of $P_{2D}(T_e)$ on the length of the amorphous insulating layer is consistent with the linear $T$-dependence of the thermal conductivity, which is related to lattice excitations (diffusons) for the phonon mean free path smaller than the dominant phonon wavelength. Our findings are important for understanding the operation of devices embedded in amorphous dielectrics.

cond-mat.mtrl-sci

Universal bottleneck for thermal relaxation in disordered metallic films

We study the heat relaxation in current biased metallic films in the regime of strong electron-phonon coupling. A thermal gradient in the direction normal to the film is predicted, with a spatial temperature profile determined by the temperature-dependent heat conduction. In the case of strong phonon scattering the heat conduction occurs predominantly via the electronic system and the profile is parabolic. This regime leads to the linear dependence of the noise temperature as a function of voltage bias, in spite of the fact that all the dimensions of the film are large compared to the electron-phonon relaxation length. This is in stark contrast to the conventional scenario of relaxation limited by the electron-phonon scattering rate. A preliminary experimental study of a 200 nm thick NbN film indicates the relevance of our model for materials used in superconducting nanowire single-photon detectors.

cond-mat.mes-hall

Superconductivity behavior in epitaxial TiN films points at surface magnetic disorder

We analyze the evolution of the normal and superconducting electronic properties in epitaxial TiN films, characterized by high Ioffe-Regel parameter values, as a function of the film thickness. As the film thickness decreases, we observe an increase of in the residual resistivity, which becomes dominated by diffusive surface scattering for $d\leq20\,$nm. At the same time, a substantial thickness-dependent reduction of the superconducting critical temperature is observed compared to the bulk TiN value. In such a high quality material films, this effect can be explained by a weak magnetic disorder residing in the surface layer with a characteristic magnetic defect density of $\sim10^{12}\,\mathrm{cm}^{-2}$. Our results suggest that surface magnetic disorder is generally present in oxidized TiN films.

cond-mat.mtrl-sci

Thermal properties of NbN single-photon detectors

We investigate thermal properties of a NbN single-photon detector capable of unit internal detection efficiency. Using an independent calibration of the coupling losses we determine the absolute optical power absorbed by the NbN film and, via a resistive superconductor thermometry, the thermal resistance Z(T) of the NbN film in dependence of temperature. In principle, this approach permits a simultaneous measurement of the electron-phonon and phonon-escape contributions to the energy relaxation, which in our case is ambiguous for their similar temperature dependencies. We analyze the Z(T) within the two-temperature model and impose an upper bound on the ratio of electron and phonon heat capacities in NbN, which is surprisingly close to a recent theoretical lower bound for the same quantity in similar devices.

cond-mat.supr-con