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Fabio Bersano

Publications and source records attributed to Fabio Bersano.

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Monolithically Integrated VO$_2$ Mott Oscillators for Energy-Efficient Spiking Neurons

Brain-inspired non-Boolean computing and sensing enable energy-efficient, error-tolerant, and highly parallel information processing, yet their deployment remains limited by the lack of compact, scalable spiking hardware. Mott phase-transition materials offer a promising route because their abrupt insulator-to-metal transitions enable neuron-like thresholding and oscillations. Among them, vanadium dioxide (VO$_2$) is particularly attractive owing to its near-room-temperature transition, fast switching, and scalability. However, existing VO$_2$ neuristors rely on discrete components, limiting integration density. Here, we report monolithic back-end-of-the-line (BEOL) integration of one-transistor-one-VO$_2$-memristor (1T-1MR) spiking neurons on a CMOS-compatible platform. VO$_2$ nanosheets are fabricated by pulsed-laser deposition atop dielectrically isolated silicon-on-insulator (SOI) p-type junctionless field-effect transistors (JLFETs) below 430 $^\circ$C. The architecture exhibits gate-tunable oscillations from 40 to 410 kHz in 60 nm-thin VO$_2$ devices with a 6 $μ$m$^2$ active area, achieving 18 pJ per spike and 8 $μ$W at room temperature, with potential for sub-3 $μ$W operation. We uncover a non-monotonic dependence of oscillation frequency on bias current and temperature and analyze bias-dependent stochastic firing, revealing the nonlinear physics of integrated VO$_2$ thin-film memristors. Finally, we demonstrate voltage-controlled oscillator functionality and on-chip resistive coupling between two nano-oscillators mediated by a JLFET. These results establish a pathway toward dense, energy-efficient, monolithically integrated Mott neuromorphic hardware compatible with future computing and spiking sensing systems.

eess.SY

Integration of Cobalt Ferromagnetic Control Gates for Electrical and Magnetic Manipulation of Semiconductor Quantum Dots

The rise of electron spin qubit architectures for quantum computing processors has led to a strong interest in designing and integrating ferromagnets to induce stray magnetic fields for electron dipole spin resonance (EDSR). The integration of nanomagnets imposes however strict layout and processing constraints, challenging the arrangement of different gating layers and the control of neighboring qubit frequencies. This work reports a successful integration of nano-sized cobalt control gates into a multi-gate FD-SOI nanowire with nanometer-scale dot-to-magnet pitch, simultaneously exploiting electrical and ferromagnetic properties of the gate stack at nanoscale. The electrical characterization of the multi-gate nanowire exhibits full field effect functionality of all ferromagnetic gates from room temperature to 10 mK, proving quantum dot formation when ferromagnets are operated as barrier gates. The front-end-of-line (FEOL) compatible integration of cobalt is examined by energy dispersive X-ray spectroscopy and high/low frequency capacitance characterization, confirming the quality of interfaces and control over material diffusion. Insights into the magnetic properties of thin films and patterned control-gates are provided by vibrating sample magnetometry and electron holography measurements. Micromagnetic simulations anticipate that this structure fulfills the requirements for EDSR driving for magnetic fields higher than 1 T, where a homogeneous magnetization along the hard magnetic axis of the Co gates is expected. The FDSOI architecture showcased in this study provides a scalable alternative to micromagnets deposited in the back-end-of-line (BEOL) and middle-of-line (MOL) processes, while bringing technological insights for the FEOL-compatible integration of Co nanostructures in spin qubit devices.

cond-mat.mes-hall