arXiv subjects

Fernando Maia de Oliveira

Publications and source records attributed to Fernando Maia de Oliveira.

4 recordsLinked to original sources

arXiv2026

Interface-Driven Growth Mode Control of 2D GaSe on 3D GaAs Substrates with Distinct Crystallographic Orientations

Previous studies of the growth of two-dimensional (2D) gallium selenide (GaSe) by molecular beam epitaxy (MBE) on a gallium arsenide (GaAs) three-dimensional (3D) substrate have reported significant differences in growth morphology, polytype, and the nature of the interface. The results differ, ranging from GaSe 2D film growth at tilted 2D planes to observed spiral structures, thereby calling for a deeper understanding of the impact of the substrate interface on the growth of GaSe films. In this paper, we conduct a comprehensive reexamination of the growth mechanism of GaSe on GaAs substrates with (211)B and (001)B orientations, investigating the nature of the 2D/3D interface and the resulting morphology of the 2D GaSe films. We do this by investigating different methods of preparation of the GaAs substrate surface before the growth of GaSe by MBE, the importance of which has not been considered before. Our results resolve the mechanistic origin of tilted versus non-tilted 2D growth and establish a general interface-driven orientation selection rule linking substrate symmetry and dangling-bond coordination to layered heteroepitaxy. This framework provides a scalable interface-engineering pathway for deterministic control of layered chalcogenide heterostructures and enables wafer-scale integration with established semiconductor device platforms.

cond-mat.mtrl-sci↗

arXiv2025

Neutralizing Optical Defects in GeSn

Reports of photoluminescence from GeSn grown on Ge substrates by molecular beam epitaxy have been limited. We find that one limiting factor to observing photoluminescence is due to localized defect states marked by photoluminescence at 2400 nm and originating from the Ge substrate and buffer layer. In this study, we report on an optical study utilizing doped Ge(001) substrates to effectively suppress defect-related photoluminescence in GeSn layers by filling localized defect trap states. For this experiment, a GeSn layer with Sn content up to 10.5% was grown on a doped Ge(001) substrate. Analysis of the physics of the photoluminescence spectrum collected from the GeSn thin film shows an emission at the expected wavelength of 2300 nm for 10.5% Sn content and the absence of the typically observed defect related signal at 2400 nm. This understanding is further confirmed using short pulse optical excitation of the GeSn grown on undoped Ge substrates.

cond-mat.mtrl-sci↗

arXiv2025

Direct Bandgap Photoluminescence of GeSn grown on Si(100) substrate by Molecular Beam Epitaxy Growth

Group IV alloys of GeSn have gained significant attention for electronic and optoelectronic applications on a Si platform due to their compatibility with existing CMOS technology, tunable band structure, and potential for a direct bandgap at high Sn concentrations. However, synthesizing Sn-rich GeSn structures remains challenging due to the low solid solubility of Sn in Ge (less than 1%) and the substantial lattice mismatch ( about 14%) between Sn and Ge. In this work, we demonstrate the successful growth of high-quality, relaxed GeSn layers with Sn contents of 9.2% and 11.4% on Si(100) substrates via molecular beam epitaxy (MBE). As far as we know, this is the first report of direct bandgap photoluminescence observed from MBE-grown GeSn films without post-growth annealing. Structural characterizations including X-ray diffraction (XRD), secondary ion mass spectrometry (SIMS), and transmission electron microscopy (TEM) confirm uniform Sn incorporation with minimal defect formation. Atomic force microscopy (AFM) reveals smooth surfaces with low roughness. Temperature-dependent photoluminescence (PL) measurements further confirm direct bandgap emission, representing a new stage in the development of MBE-grown GeSn.

physics.app-ph↗

arXiv2024

Algorithm-Based Linearly Graded Compositions of GeSn on GaAs (001) via Molecular Beam Epitaxy

The growth of high-composition GeSn films of the future will likely be guided via algorithms. In this study we show how a logarithmic-based algorithm can be used to obtain high-quality GeSn compositions up to 16 % on GaAs (001) substrates via molecular beam epitaxy. Within we demonstrate composition targeting and logarithmic gradients to achieve linearly graded pseudomorph Ge1-xSnx compositions up to 10 % before partial relaxation of the structure and a continued gradient up to 16 % GeSn. In this report, we use X-ray diffraction, simulation, SIMS and atomic force microscopy to analyze and demonstrate some of the possible growths that can be produced with the enclosed algorithm. This methodology of growth is a major step forward in the field of GeSn development and the first demonstration of algorithmically driven, linearly graded GeSn films.

cond-mat.mtrl-sci↗