arXiv subjects

Filippo Campi

Publications and source records attributed to Filippo Campi.

5 recordsLinked to original sources

arXiv2022

Efficient extreme-ultraviolet high-order wave mixing from laser-dressed silica

The emission of high-order harmonics from solids \cite{ghimire11a,schubert14a,luu15a,golde08a} under intense laser-pulse irradiation is revolutionizing our understanding of strong-field solid-light interactions \cite{ghimire11a,schubert14a,luu15a,vampa15b,yoshikawa17a,hafez18a,jurgens20a}, while simultaneously opening avenues towards novel, all-solid, coherent, short-wavelength table-top sources with tailored emission profiles and nanoscale light-field control\cite{franz19a,roscamCLEO21}. To date, broadband spectra have been generated well into the extreme-ultraviolet (XUV) \cite{luu15a,luu18b,han19a,uzan20a}, but the comparatively low conversion efficiency still lags behind gas-based high-harmonic generation (HHG) sources \cite{luu15a,luu18b}, and have hindered wider-spread applications. Here, we overcome the low conversion efficiency by two-color wave mixing. A quantum theory reveals that our experiments follow a novel generation mechanism where the conventional interband and intraband nonlinear dynamics are boosted by Floquet-Bloch dressed states, that make solid HHG in the XUV more efficient by at least one order of magnitude. Emission intensity scalings that follow perturbative optical wave mixing, combined with the angular separation of the emitted frequencies, make our approach a decisive step for all-solid coherent XUV sources and for studying light-engineered materials.

physics.optics↗

arXiv2020

XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy

Inorganic molecular materials such as tin oxo cages are a promising generation of photoresists compatible with the demands of the recently developed Extreme UltraViolet (EUV) lithography technology. Therefore, a detailed understanding of the photon-induced reactions which occur in photoresists after exposure is important. We used XUV broadband laser pulses in the range of 25-40 eV from a table-top high-harmonic source to expose thin films of the tin oxo cage resist to shed light on some of the photo-induced chemistry via XUV absorption spectroscopy. During the exposure, the transmitted spectra were recorded and a noticeable absorbance decrease was observed in the resist. Dill parameters were extracted to quantify the XUV induced conversion and compared to EUV exposure results at 92 eV. Based on the absorption changes, we estimate that approximately 60% of tin-carbon bonds are cleaved at the end of the exposure.

physics.app-ph↗

arXiv2019

Divergence control of high-harmonic generation

We show that the divergence of extreme ultraviolet pulses from high harmonic generation, which is directly linked to the shape and size of the refocused beam, can be controlled by the relative delay between the fundamental and its intense orthogonally polarized second harmonic in two-color high-harmonic generation. We find that the divergence is minimized close to the delays were the number of emitted photons is maximized. These findings are rationalized as suppression and enhancement of long and short electron trajectories as function of the phase of the two-color laser field, respectively. The orthogonally polarized second harmonic introduces a lateral momentum component that can select one trajectory whereas it deflects the other. At the same time, the second harmonic profoundly influences the tunnel ionization process that initiates high-harmonic generation, which provides another trajectory gate. Our scheme for controlling the divergence facilitates larger numerical apertures for extreme ultraviolet microscopy. In addition, the associated reduction of the size of the focus is beneficial for extreme ultraviolet nonlinear optics and spectroscopy, as well as imaging and metrology of embedded structures.

physics.optics↗

arXiv2019

A Versatile Velocity Map Ion-Electron Covariance Imaging Spectrometer for High-Intensity XUV Experiments

We report on the design and performance of a velocity map imaging (VMI) spectrometer optimized for experiments using high-intensity extreme ultraviolet (XUV) sources such as laser-driven high-order harmonic generation (HHG) sources and free-electron lasers (FELs). Typically exhibiting low repetition rates and high single-shot count rates, such~experiments do not easily lend themselves to coincident detection of photo-electrons and -ions. In order to obtain molecular frame or reaction channel-specific information, one has to rely on other correlation techniques, such as covariant detection schemes. Our device allows for combining different photo-electron and -ion detection modes for covariance analysis. We present the expected performance in the different detection modes and present the first results using an intense high-order harmonic generation (HHG) source.

physics.atom-ph↗

arXiv2017

Micro-focusing of broadband high-order harmonic radiation by a double toroidal mirror

We present an optical system based on two toroidal mirrors in a Wolter configuration to focus broadband XUV radiation. Optimization of the focusing optics alignment is carried out with the aid of an XUV wavefront sensor. Back-propagation of the optimized wavefront to the focus yields a focal spot of 3.6$\times$4.0 $μ$m$^2$ full width at half maximum, which is consistent with ray-tracing simulations that predict a minimum size of 3.0$\times$3.2 $μ$m$^2$. This work is important for optimizing the intensity of focused high-order harmonics in order to reach the nonlinear interaction regime.

physics.ins-det↗