Scalable Fabrication of Thermally Reconfigurable Ge Metasurfaces Using Stencil Lithography for Mid-Infrared Molecular Sensing
Mid-infrared (mid-IR) spectroscopy enables label-free molecular detection and is widely employed in biomedical, environmental, and chemical sensing; however, its broader deployment remains limited by bulky instrumentation and insufficient analytical sensitivity. Photonic metasurfaces supporting strong mid-IR resonances provide a promising route toward compact on-chip spectrometers and enhanced molecular sensing, yet their practical implementation is often constrained by limited spectral coverage and fabrication complexity. Here, we present a scalable, resist-free stencil lithography approach for fabricating arrays of Ge pillar metasurfaces on CaF2 substrates that support polarization-insensitive Mie resonances dominated by electric dipole modes. By varying the geometric design parameters during fabrication, we engineered metasurface arrays with discrete resonances spanning the 950-1700 cm^-1 molecular fingerprint region. Furthermore, leveraging the thermo-optic response of Ge, we achieved dynamic tuning of these discrete resonances, demonstrating continuous and reversible resonance shifts of approximately 36 cm^-1 per metasurface over 300-500 K, corresponding to a tuning rate of 0.18 cm^-1/K. The thermally induced spectral sweeping enables multiplexed detection of poly(methyl methacrylate) vibrational modes and continuous reconstruction of its absorbance spectrum across 1100-1215 cm^-1. These results establish a scalable dielectric metasurface platform with spectrally reconfigurable mid - IR modes for molecular sensing across the fingerprint region and compact infrared sensor technologies.