Searcharxiv⌕ Search

arXiv subjects

G. López-Polín

Publications and source records attributed to G. López-Polín.

2 recordsLinked to original sources

Electron density modulation in monolayer $MoS_{2}$ along the phase transition of a relaxor ferroelectric substrate

The integration of transition metal dichalcogenides (TMDs) with ferroelectric substrates is a powerful strategy to modulate their electronic and optical properties. However, the use of relaxor ferroelectrics for this purpose remains unexplored. Here, we demonstrate a reversible photoluminescence (PL) and charge density modulation of monolayer $MoS_{2}$ on a $Sr_{0.61}Ba_{0.39}Nb_{2}O_{6}$ (SBN) substrate, a prototypical relaxor ferroelectric. The smearing of the phase transition in SBN enables continuous tuning of $MoS_{2}$ electronic properties over a broad temperature range ($30-90°C$). A pronounced PL enhancement occurs as the substrate transitions from ferro-to-paraelectric phase due to the vanishing spontaneous polarization and the consequent change in charge balance at the $MoS_{2}-SBN$ interface. Moreover, thermal hysteresis in the electron density modulation is observed during heating and cooling cycles. These findings highlight the potential of relaxor ferroelectrics as reconfigurable platforms for electron doping and light-emission control in 2D materials, opening avenues for temperature-responsive optoelectronic and nanophotonic applications.

cond-mat.mtrl-sci↗

Improved graphene blisters by ultrahigh pressure sealing

Graphene is a very attractive material for nanomechanical devices and membrane applications. Graphene blisters based on silicon oxide micro-cavities are a simple but relevant example of nanoactuators. A drawback of this experimental set up is that gas leakage through the graphene-SiO2 interface contributes significantly to the total leak rate. Here we study the diffusion of air from pressurized graphene drumheads on SiO2 micro-cavities and propose a straightforward method to improve the already strong adhesion between graphene and the underlying SiO2 substrate, resulting in reduced leak rates. This is carried out by applying controlled and localized ultrahigh pressure (> 10 GPa) with an Atomic Force Microscopy diamond tip. With this procedure, we are able to significantly approach the graphene layer to the SiO2 surface around the drumheads, thus enhancing the interaction between them allowing us to better seal the graphene-SiO2 interface, which is reflected in up to ~ 4 times lower leakage rates. Our work opens an easy way to improve the performance of graphene as a gas membrane on a technological relevant substrate such as SiO2.

cond-mat.mtrl-sci↗