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G. P. Gallerano

Publications and source records attributed to G. P. Gallerano.

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IRIDE White Book, An Interdisciplinary Research Infrastructure based on Dual Electron linacs&lasers

This report describes the scientific aims and potentials as well as the preliminary technical design of IRIDE, an innovative tool for multi-disciplinary investigations in a wide field of scientific, technological and industrial applications. IRIDE will be a high intensity 'particle factory', based on a combination of a high duty cycle radio-frequency superconducting electron linac and of high energy lasers. Conceived to provide unique research possibilities for particle physics, for condensed matter physics, chemistry and material science, for structural biology and industrial applications, IRIDE will open completely new research possibilities and advance our knowledge in many branches of science and technology. IRIDE will contribute to open new avenues of discoveries and to address most important riddles: What does matter consist of? What is the structure of proteins that have a fundamental role in life processes? What can we learn from protein structure to improve the treatment of diseases and to design more efficient drugs? But also how does an electronic chip behave under the effect of radiations? How can the heat flow in a large heat exchanger be optimized? The scientific potential of IRIDE is far reaching and justifies the construction of such a large facility in Italy in synergy with the national research institutes and companies and in the framework of the European and international research. It will impact also on R&D work for ILC, FEL, and will be complementarity to other large scale accelerator projects. IRIDE is also intended to be realized in subsequent stages of development depending on the assigned priorities.

physics.ins-det

Extreme Ultraviolet (EUV) Sources for Lithography based on Synchrotron Radiation

The study presented here was initiated by a discussion to investigate the possibility of using synchrotron radiation as a source for the Next Generation Lithography (NGL) based on the EUV-concept (Extreme Ultra-Violet; here 13.5 nm or 11.3 nm radiation, respectively). The requirements are: 50 W, 2% bandwidth and minimal power outside this bandwidth. Three options were investigated. The first two deal with radiation from bending magnets and undulators. The results confirm the earlier work by Oxfords Instrument and others that these light-sources lack in-band power while emitting excessive out-of-band radiation. The third approach is a FEL (Free Electron Laser) driven by a 500 MeV linear accelerator with a superconducting mini-undulator as radiation emitting device. Such a device would produce in-band EUV-power in excess of 50 W with negligible out-of-band power.

physics.acc-ph