arXiv subjects

Giovanni Capellini

Publications and source records attributed to Giovanni Capellini.

14 recordsLinked to original sources

arXiv2026

Mobility Enhancement in Si/SiGe Quantum Well Enabled by a Buried Si Layer Trapping Oxygen Impurities

Reducing disorder in undoped Si/SiGe field-effect heterostructures remains an important materials challenge for scalable quantum devices, particularly electron spin qubits. Background impurities such as oxygen have been identified as mobility-limiting, yet practical heterostructure-design strategies for suppressing their incorporation remain underexplored, and their influence across different transport regimes is not fully established. Here, we demonstrate a simple route to oxygen reduction and mobility enhancement in Si/SiGe quantum-well heterostructures grown by reduced-pressure chemical vapor deposition (RP-CVD) on 200 mm Si(100) substrates through the introduction of a thin, electrically passive buried Si layer within the lower SiGe barrier. Secondary-ion mass spectrometry shows that the buried Si layer reproducibly reduces the oxygen background in the subsequently grown SiGe by approximately a factor of five, without modifying the active quantum-well region. Density- and temperature-dependent magnetotransport measurements further show that this reduction increases the electron mobility, while leaving the percolation density and density-dependent mobility scaling largely unchanged. Upon cooling to 0.3 K, both high- and low-oxygen devices exhibit similar density-dependent fractional mobility enhancements, indicating that the reduced oxygen background improves momentum relaxation without substantially altering the dominant low-density disorder landscape. These results establish the buried Si layer as a straightforward and process-compatible heterostructure-design element for reducing oxygen incorporation and improving transport in 200 mm CVD-grown Si/SiGe quantum-device materials.

cond-mat.mes-hall↗

arXiv2026

Disorder signatures emerging at millikelvin temperatures in Si/SiGe field-effect stacks

The performance and scalability of electron spin qubits based on gate-defined quantum-dots in undoped Si/SiGe field-effect stacks remain constrained by disorder originating from the gate stack. Its coupling to the quantum well can be reduced by increasing the Si quantum well depth, while electrostatic charge history, for example through interface-trap filling, can further modify the effective disorder landscape. Although such disorder is commonly benchmarked through mobility measurements using magnetotransport and Hall bar devices, dedicated investigations at millikelvin temperatures relevant for quantum-dot operation remain limited. Here, we use temperature-dependent magnetotransport on Hall bar shaped field-effect transistors to investigate how mobility-based disorder signatures depend on quantum-well depth and charge history from $1.5~\mathrm{K}$ down to the millikelvin regime. We show that magnetotransport characterization at $1.5~\mathrm{K}$ captures the dominant mobility improvement associated with reduced dielectric-interface coupling, but can underestimate disorder differences that emerge at millikelvin temperatures, particularly in the low-density regime. Our results therefore highlight that millikelvin magnetotransport characterization of Hall bar devices can provide additional insight for optimizing Si/SiGe field-effect stacks, particularly in the context of gate-defined quantum dot spin qubits.

cond-mat.mes-hall↗

arXiv2026

Epitaxial SiGeSn alloys for CMOS-compatible thermoelectric devices

The integration of thermoelectric devices into mainstream microelectronic technological platform could be a major breakthrough in various fields within the \emph{so-called} Green-IT realm. In this article, the thermoelectric properties of heteroepitaxial SiGeSn alloys, a novel CMOS compatible material system, are evaluated to assess their possible application in thermoelectric devices. To this purpose, starting from the experimentally low lattice thermal conductivity of SiGeSn/Ge/Si layers of about $\sim$1-2 W/m$\cdot$K assessed by means of 3-$\omega$ measurements, the figure of merits are calculated through the use of Boltzmann transport equation, taking into account the relevant inter-valley scattering processes, peculiar of this multi-valley material system. Values for the figure of merit $ZT$ exceeding $1$ have been obtained for both p- and n- type material at operating temperatures within the 300---400 K range, i.e. at a typical On-Chip temperatures. In this interval, the predicted power factor also features very competitive values of the order of 20 $\rm{\mu W/cm\cdot K^2}$. Our finding indicates that this new class of Si-based materials has extremely good prospects for real-world applications, and can further stimulate scientific investigation in this ambit.

cond-mat.mtrl-sci↗

arXiv2026

Resolving the Metastable Si-XIII Structure through Convergent Theory and Experiment

Silicon is the undisputed cornerstone of modern technology, with applications ranging from micro- and opto-electronics to quantum technologies. Recently, the exploration of its allotropes has emerged as a pivotal frontier for engineering materials with tailored optical and electronic functionalities. High-pressure experiments have revealed several metastable silicon phases, among which is Si-XIII. First observed more than 20 years ago, this phase has remained structurally unidentified, representing a significant gap in our understanding of elemental silicon allotropy. In this work, a convergent methodology is employed combining advanced theoretical modeling with experimental characterization to finally resolve the long-standing structural assignment of Si-XIII. Guided by careful experimental observations, a structural model validated through first-principles optimization and systematically tested against multiple experimental signatures is constructed. All the fingerprints of this phase are rationalized by our proposed crystal structure: interplanar spacings, Raman frequencies, thermodynamic stability, and kinetic pathways. These findings provide a crucial missing piece in the high-pressure phase diagram of silicon and demonstrate the power of integrating computational predictions with experimental validation to resolve complex structural problems in materials science.

cond-mat.mtrl-sci↗

arXiv2025

Brittle-to-ductile transition and strain relaxation in Si$_{1-x}$Ge$_x$ linearly graded buffers

The strain-relaxation mechanism of a set of Si$_{0.6}$Ge$_{0.4}$ linearly graded buffers (LGBs), grown following different temperature profiles, has been investigated by means of defect-etching and variable-temperature high-resolution X-ray diffraction (VT-HRXRD). Defect-etching experiments demonstrate that a sharp increase of threading dislocation density (TDD) from $3 \times 10^{5}$\,cm$^{-2}$ to $1.2 \times 10^{6}$\,cm$^{-2}$ takes place when the final growth temperature exceeds a critical value T$_c\approx 530^\circ$C. VT-HRXRD measurements show that in low TDD samples extra relaxation takes place for annealing temperatures larger than T$_c$, thanks to the nucleation of new dislocations. These results indicate that, below T$_c$, strain relaxation is driven by the gliding of existing dislocations while above T$_c$ new dislocations are nucleated, suggesting a link with our results and the brittle-to-ductile transition in Si$_{1-x}$Ge$_x$ alloys.

cond-mat.mtrl-sci↗

arXiv2025

High yield, low disorder Si/SiGe heterostructures for spin qubit devices manufactured in a BiCMOS pilot line

The prospect of achieving fault-tolerant quantum computing with semiconductor spin qubits in Si/SiGe heterostructures relies on the integration of a large number of identical devices, a feat achievable through a scalable (Bi)CMOS manufacturing approach. To this end, both the gate stack and the Si/SiGe heterostructure must be of high quality, exhibiting uniformity across the wafer and consistent performance across multiple fabrication runs. Here, we report a comprehensive investigation of Si/SiGe heterostructures and gate stacks, fabricated in an industry-standard 200 mm BiCMOS pilot line. We evaluate the homogeneity and reproducibility by probing the properties of the two-dimensional electron gas (2DEG) in the shallow silicon quantum well through magnetotransport characterization of Hall bar-shaped field-effect transistors at 1.5 K. Across all the probed wafers, we observe minimal variation of the 2DEG properties, with an average maximum mobility of $(4.25\pm0.17)\times 10^{5}$ cm$^{2}$/Vs and low percolation carrier density of $(5.9\pm0.18)\times 10^{10}$ cm$^{-2}$ evidencing low disorder potential in the quantum well. The observed narrow statistical distribution of the transport properties highlights the reproducibility and the stability of the fabrication process. Furthermore, wafer-scale characterization of a selected individual wafer evidenced the homogeneity of the device performances across the wafer area. Based on these findings, we conclude that our material and processes provide a suitable platform for the development of scalable, Si/SiGe-based quantum devices.

cond-mat.mes-hall↗

arXiv2024

Formation of Micrometer-Sized Textured Hexagonal Silicon Crystals via Nanoindentation

We present a comprehensive study on the formation of micrometer-sized, textured hexagonal diamond silicon (hd-Si) crystals via nanoindentation followed by annealing. Utilizing advanced characterization techniques such as polarized Raman spectroscopy, high-resolution transmission electron microscopy, and electron energy-loss spectroscopy, we demonstrate the successful transformation of silicon into high-quality hd-Si. The experimental results are further supported by first-principles calculations and molecular dynamics simulations. Notably, the hd-Si phase consists of nanometer-sized grains with slight misorientations, organized into large micrometer-scale textured domains. These findings underscore the potential of nanoindentation as a precise and versatile tool for inducing pressure-driven phase transformations, particularly for the stabilization of hexagonal silicon. The textured nature of hd-Si also presents a unique opportunity to tailor its optical properties, opening new avenues for its application in semiconductor and optoelectronic devices.

cond-mat.mtrl-sci↗

arXiv2024

Ge epitaxy at ultra-low growth temperatures enabled by a pristine growth environment

Germanium (Ge), the next-in-line group-IV material, bears great potential to add functionality and performance to next-generation nanoelectronics and solid-state quantum transport based on silicon (Si) technology. Here, we investigate the direct epitaxial growth of two-dimensional high-quality crystalline Ge layers on Si deposited at ultra-low growth temperatures ($T_{Ge} = 100^{\circ}\mathrm{C}-350^{\circ}\mathrm{C}$) and pristine growth pressures ($\lesssim 10^{-10}\,\mathrm{mbar}$). First, we show that $T_{Ge}$ does not degrade the crystal quality of homoepitaxial Ge/Ge(001) by comparing the point defect density using positron annihilation lifetime spectroscopy. Subsequently, we present a systematic investigation of the Ge/Si(001) heteroepitaxy, varying the Ge coverage ($θ_{Ge}$, 1, 2, 4, 8, 12, and 16 nm) and $T_{Ge}$ ($100^{\circ}\mathrm{C}$ to $300^{\circ}\mathrm{C}$, in increments of $50^{\circ}\mathrm{C}$) to assess the influence of these parameters on the layer's structural quality. Atomic force microscopy revealed a rippled surface topography with superimposed grainy features and the absence of three-dimensional structures, such as quantum dots. Transmission electron microscopy unveiled pseudomorphic, grains of highly crystalline growth separated by defective domains. Thanks to nanobeam scanning x-ray diffraction measurements, we were able to evidence the lattice strain fluctuations due to the ripple-like structure of the layers. We conclude that the heteroepitaxial strain contributes to the formation of the ripples, which originate from the kinetic limitations of the ultra-low temperatures.

cond-mat.mtrl-sci↗

arXiv2024

All epitaxial self-assembly of vertically-confined silicon color centers using ultra-low temperature epitaxy

Silicon-based color-centers (SiCCs) have recently emerged as quantum-light sources that can be combined with telecom-range Si Photonics platforms. Unfortunately, using current SiCC fabrication, deterministic control over the vertical emitter position is impossible due to ion-implantation's stochastic nature. To overcome this bottleneck towards high-yield integration, we demonstrate a radically innovative creation method for various SiCCs, solely relying on epitaxial growth of Si and C-doped Si at atypically-low temperatures in a ultra-clean growth environment. These telecom emitters can be confined within sub-1nm thick layers embedded at arbitrary vertical positions within a highly crystalline Si matrix. Tuning growth conditions and doping, different SiCC types, e.g., W-centers, T-centers, G-centers, or derivatives like G'-centers can be created, which are particularly promising as Si-based single-photon sources and spin-photon interfaces. The zero-phonon emission from G'-centers can be conveniently tuned by the C-concentration, leading to a systematic wavelength shift and linewidth narrowing towards low emitter densities.

cond-mat.mes-hall↗

arXiv2024

Thermal expansion and temperature dependence of Raman modes in epitaxial layers of Ge and Ge$_{1-x}$Sn$_{x}$

Temperature dependence of vibrational modes in semiconductors depends on lattice thermal expansion and anharmonic phonon-phonon scattering. Evaluating the two contributions from experimental data is not straightforward, especially for epitaxial layers that present mechanical deformation and anisotropic lattice expansion. In this work, a temperature-dependent Raman study in epitaxial Ge and Ge$_{1-x}$Sn$_{x}$ layers is presented. A model is introduced for the Raman mode energy shift as a function of temperature, comprising thermal expansion of the strained lattice and anharmonic corrections. With support of x-ray diffraction, the model is calibrated on experimental data of epitaxial Ge grown on Si and Ge$_{1-x}$Sn$_{x}$ grown on Ge/Si, finding that the main difference between bulk and epitaxial layers is related to the anisotropic lattice expansion. The phonon anharmonicity and other parameters do not depend on dislocation defect density (in the range $7\cdot 10^6$ - $4\cdot 10^8$ cm$^{-2}$) nor on alloy composition in the range 5-14 at.%. The strain-shift coefficient for the main model of Ge and for the Ge-Ge vibrational mode of Ge$_{1-x}$Sn$_{x}$ is weakly dependent on temperature and is around -500 cm$^{-1}$. In Ge$_{1-x}$Sn$_{x}$, the composition-shift coefficient amounts to -100 cm$^{-1}$, independent of temperature and strain.

cond-mat.mtrl-sci↗

arXiv2024

Quantum steering from phase measurements with limited resources

Quantum steering captures the ability of one party, Alice, to control through quantum correlations the state at a distant location, Bob, with superior ability than allowed by a local hidden state model. Verifying the presence of quantum steering has implications for the certification of quantum channels, and its connection to the metrological power of the quantum state has been recently proved. This link is established by means of the violation of a Cramér-Rao bound holding for non-steerable states: its direct assessment would then require operation in the asymptotic regime of a large number of repetitions. Here, we extend previous work to account explicitly for the use of a limited number of resources, and put this modified approach to test in a quantum optics experiment. The imperfections in the apparatus demand an adaptation of the original test in the multiparameter setting. Our results provide guidelines to apply such a metrological approach to the validation of quantum channels.

quant-ph↗

arXiv2023

Local Alloy Order in a Ge1-xSnx/Ge Epitaxial Layer

The local ordering of atoms in alloys directly has a strong impact on their electronic and optical properties. This is particularly relevant in nonrandom alloys, especially if they are deposited using far from the equilibrium processes, as is the case of epitaxial Ge1-xSnx layers. In this work, we investigate the arrangement of Ge and Sn atoms in optoelectronic grade Ge1-xSnx epitaxial layers featuring a Sn content in the 5-14% range by using polarization-dependent Raman spectroscopy and density-functional-theory calculations. The thorough analysis of the polarization-dependent spectra in parallel and perpendicular configuration allowed us to properly tag all the observed vibrational modes, and to shed light on that associated to disorder-assisted Raman transitions. Indeed, with the help of large-scale atomistic simulations, we were able to highlight how the presence of Sn atoms, that modify the local environments of Ge atoms, gives rise to two spectral features at different Raman shifts, corresponding to distortions of the atomic bonds. This analysis provides a valuable framework for advancing the understanding of the vibrational properties in Ge1-xSnx alloys, particularly with regard to the impact of local ordering of the different atomic species.

cond-mat.mtrl-sci↗

arXiv2021

THz intersubband electroluminescence from n-type Ge/SiGe quantum cascade structures

We report electroluminescence originating from L-valley transitions in n-type Ge/Si$_{0.15}$Ge$_{0.85}$ quantum cascade structures centered at 3.4 and 4.9 THz with a line broadening of $Δf/f \approx 0.2$. Three strain-compensated heterostructures, grown on a Si substrate by ultrahigh vacuum chemical vapor deposition, have been investigated. The design is based on a single quantum well active region employing a vertical optical transition and the observed spectral features are well described by non-equilibrium Green's function calculations. The presence of two peaks highlights a suboptimal injection in the upper state of the radiative transition. Comparison of the electroluminescence spectra with similar GaAs/AlGaAs structure yields one order of magnitude lower emission efficiency.

physics.optics↗

arXiv2020

Intersubband transition engineering in the conduction band of asymmetric coupled Ge/SiGe quantum wells

: n-type Ge/SiGe asymmetric-coupled quantum wells represent the building block of a variety of nanoscale quantum devices, including recently proposed designs for a silicon-based THz quantum cascade laser. In this paper, we combine structural and spectroscopic experiments on 20-module superstructures, each featuring two Ge wells coupled through a Ge-rich tunnel barrier, as a function of the geometry parameters of the design and the P dopant concentration. Through the comparison of THz spectroscopic data with numerical calculations of intersubband optical absorption resonances, we demonstrated that it is possible to tune by design the energy and the spatial overlap of quantum confined subbands in the conduction band of the heterostructures. The high structural/interface quality of the samples and the control achieved on subband hybridization are the promising starting point towards a working electrically pumped light-emitting device.

cond-mat.mes-hall↗