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Gregory Smith

Publications and source records attributed to Gregory Smith.

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Resolving Light-Induced Structural Rearrangements in Responsive Microgels

Optically-responsive microgels offer a versatile platform for designing adaptive soft materials with coupled light and thermal responsiveness. Control over the crosslinking degree is particularly appealing as it can regulate not only particle size but also stiffness, thereby enabling remote tuning of key material functionalities. However, the internal structural changes that couple molecular photoresponsive mechanisms to mesoscopic properties remain poorly resolved. Here, we investigate different light-responsive microgels containing covalently incorporated coumarin moieties, which impart optical sensitivity through UV-induced cycloaddition, by combining dynamic light scattering, small-angle neutron scattering, and molecular dynamics simulations. We show that light irradiation alters not only particle size but also the internal polymer density distribution and subsequent thermal response. Before irradiation, the microgels exhibit a star-like architecture with a dense core and extended polymeric arms. After irradiation, the network evolves toward a markedly more compact structure. This transformation cannot be rationalized simply as an equivalent to an increase in crosslinking density during synthesis, as observed in the thermal response, revealing light as a powerful tool to regulate microgel architecture and multifunctional responsiveness.

cond-mat.soft

Wafer-Scale, Sub-5 nm Junction Formation by Monolayer Doping and Conventional Spike Annealing

We report the formation of sub-5 nm ultrashallow junctions in 4 inch Si wafers enabled by the molecular monolayer doping of phosphorous and boron atoms and the use of conventional spike annealing. The junctions are characterized by secondary ion mass spectrometry and non-contact sheet resistance measurements. It is found that the majority (~70%) of the incorporated dopants are electrically active, therefore, enabling a low sheet resistance for a given dopant areal dose. The wafer-scale uniformity is investigated and found to be limited by the temperature homogeneity of the spike anneal tool used in the experiments. Notably, minimal junction leakage currents (<1 uA/cm2) are observed which highlights the quality of the junctions formed by this process. The results clearly demonstrate the versatility and potency of the monolayer doping approach for enabling controlled, molecular-scale ultrashallow junction formation without introducing defects in the semiconductor.

cond-mat.mtrl-sci