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Gyehyun Park

Publications and source records attributed to Gyehyun Park.

3 recordsLinked to original sources

Atomic-Scale Mechanisms of SiO$_2$ Plasma-Enhanced Chemical Vapor Deposition Revealed by Molecular Dynamics with a Machine-Learning Interatomic Potential

Plasma-enhanced chemical vapor deposition (PECVD) of silicon dioxide (SiO$_2$) is widely used for low-temperature fabrication of dielectric thin films, yet its atomic-scale growth mechanisms remain incompletely understood. In this work, we investigate SiO$_2$ PECVD using silane and N$_2$O as source gases via molecular dynamics simulations driven by a machine-learning interatomic potential. By systematically varying the oxidant-to-silane-derived species ratio $r$, we elucidate the evolution of film stoichiometry, density, and hydrogen content. Formation of the Si-O-Si network primarily proceeds via oxidation of surface Si-H groups to form Si-OH species, followed by condensation of neighboring Si-OH groups that produces H$_2$O as the dominant byproduct. At low $r$, H$_2$ formation via reactions between Si-H and Si-OH groups also contributes to the network formation. Increasing oxidant supply promotes the network formation through oxidation of residual Si-H species, suppressing hydrogen incorporation and leading to saturation of the Si/O ratio. Rapid chemisorption of silane-derived species, together with steric hindrance from pre-deposited species, results in localized growth and surface roughness. We further show that high-kinetic-energy plasma species can etch SiO$_2$ films, which potentially limits growth rates and enhances surface roughness under high RF-power conditions. These results provide atomic-scale insight into PECVD growth and guidance for optimizing film composition and quality.

cond-mat.mtrl-sci

Atomistic insights into hydrogen migration in IGZO from machine-learning interatomic potential: linking atomic diffusion to device performance

Understanding hydrogen diffusion is critical for improving the reliability and performance of oxide thin-film transistors (TFTs), where hydrogen plays a key role in carrier modulation and bias instability. In this work, we investigate hydrogen diffusion in amorphous IGZO ($a$-IGZO) and $c$-axis aligned crystalline IGZO (CAAC-IGZO) using machine learning interatomic potential molecular dynamics (MLIP-MD) simulations. We construct accurate phase-specific MLIPs by fine-tuning SevenNet-0, a universal pretrained MLIP, and validate the models against a comprehensive dataset covering hydrogen-related configurations and diffusion environments. Hydrogen diffusivity is evaluated over 650--1700 K, revealing enhanced mobility above 750 K in $a$-IGZO due to the glassy matrix, while diffusion at lower temperatures is constrained by the rigid network. Arrhenius extrapolation of the diffusivity indicates that hydrogen in $a$-IGZO can reach the channel/insulator interface within $10^{4}$ seconds at 300--400 K, likely contributing to negative bias stress-induced device degradation. Trajectory analysis reveals that long-range diffusion in $a$-IGZO is enabled by a combination of hydrogen hopping and flipping mechanisms. In CAAC-IGZO, hydrogen exhibits high in-plane diffusivity but severely restricted out-of-plane transport due to a high energy barrier along the $c$-axis. This limited vertical diffusion in CAAC-IGZO suggests minimal impact on bias instability. This work bridges the atomic-level hydrogen transport mechanism and device-level performance in oxide TFTs by leveraging large-scale MLIP-MD simulations.

cond-mat.mtrl-sci

Many-Chain Effects on the Co-nonsolvency of Polymer Brushes in a Good Solvent Mixture

Polymer brushes normally swell in a good solvent and collapse in a poor solvent. An abnormal response of polymer brushes, so-called co-nonsolvency, is the phenomenon where the brush counter-intuitively collapses in a good solvent mixture. In this work, we employed molecular dynamics simulations to investigate the structural properties of the grafted polymers on the occurrence of co-nonsolvency. Brushes with various grafting densities were considered to study the effect of topological excluded volumes on the co-nonsolvency. We found that the brush height follows a novel scaling behavior of the grafting density $h \sim σ_{\text g}^{0.71}$ in the co-nonsolvent mixture. Using the scaling exponent and Alexander-de Gennes theory, an analytic function that predicts the monomer density was obtained. The many-chain effects in the co-nonsolvent lead to the formation of both intermolecular and intramolecular bridging structures. Increasing the grafting density entails lower looping events occuring because of the intermolcular bridging, causing diverse structural properties. We report how the average thickness, the polymer orientation, and the looping probability varies as the grafting density increases. Based on these observations, we constructed a phase diagram of the polymer brush system using the average thickness and orientation as order parameters. Our simulations and analytical results reveal the nature of co-nonsolvency in polymer brushes in an explicit way and will help to provide practical guidelines for applications such as drug delivery and sensor devices.

cond-mat.soft