arXiv subjects

Haoxing Ren

Publications and source records attributed to Haoxing Ren.

At least 55 records · Page 3Linked to original sources

arXiv2024

DRC-Coder: Automated DRC Checker Code Generation Using LLM Autonomous Agent

In the advanced technology nodes, the integrated design rule checker (DRC) is often utilized in place and route tools for fast optimization loops for power-performance-area. Implementing integrated DRC checkers to meet the standard of commercial DRC tools demands extensive human expertise to interpret foundry specifications, analyze layouts, and debug code iteratively. However, this labor-intensive process, requiring to be repeated by every update of technology nodes, prolongs the turnaround time of designing circuits. In this paper, we present DRC-Coder, a multi-agent framework with vision capabilities for automated DRC code generation. By incorporating vision language models and large language models (LLM), DRC-Coder can effectively process textual, visual, and layout information to perform rule interpretation and coding by two specialized LLMs. We also design an auto-evaluation function for LLMs to enable DRC code debugging. Experimental results show that targeting on a sub-3nm technology node for a state-of-the-art standard cell layout tool, DRC-Coder achieves perfect F1 score 1.000 in generating DRC codes for meeting the standard of a commercial DRC tool, highly outperforming standard prompting techniques (F1=0.631). DRC-Coder can generate code for each design rule within four minutes on average, which significantly accelerates technology advancement and reduces engineering costs.

cs.AR↗

arXiv2024

BOSON$^{-1}$: Understanding and Enabling Physically-Robust Photonic Inverse Design with Adaptive Variation-Aware Subspace Optimization

Nanophotonic device design aims to optimize photonic structures to meet specific requirements across various applications. Inverse design has unlocked non-intuitive, high-dimensional design spaces, enabling the discovery of high-performance devices beyond heuristic or analytic methods. The adjoint method, which calculates gradients for all variables using just two simulations, enables efficient navigation of this complex space. However, many inverse-designed structures, while numerically plausible, are difficult to fabricate and sensitive to variations, limiting their practical use. The discrete nature with numerous local-optimal structures also pose significant optimization challenges, often causing gradient-based methods to converge on suboptimal designs. In this work, we formulate inverse design as a fabrication-restricted, discrete, probabilistic optimization problem and introduce BOSON-1, an end-to-end, variation-aware subspace optimization framework to address the challenges of manufacturability, robustness, and optimizability. To overcome optimization difficulty, we propose dense target-enhanced gradient flows to mitigate misleading local optima and introduce a conditional subspace optimization strategy to create high-dimensional tunnels to escape local optima. Furthermore, we significantly reduce the runtime associated with optimizing across exponential variation samples through an adaptive sampling-based robust optimization, ensuring both efficiency and variation robustness. On three representative photonic device benchmarks, our proposed inverse design methodology BOSON^-1 delivers fabricable structures and achieves the best convergence and performance under realistic variations, outperforming prior arts with 74.3% post-fabrication performance. We open-source our codes at https://github.com/ScopeX-ASU/BOSON.

physics.optics↗

arXiv2024

GPU-Accelerated Inverse Lithography Towards High Quality Curvy Mask Generation

Inverse Lithography Technology (ILT) has emerged as a promising solution for photo mask design and optimization. Relying on multi-beam mask writers, ILT enables the creation of free-form curvilinear mask shapes that enhance printed wafer image quality and process window. However, a major challenge in implementing curvilinear ILT for large-scale production is mask rule checking, an area currently under development by foundries and EDA vendors. Although recent research has incorporated mask complexity into the optimization process, much of it focuses on reducing e-beam shots, which does not align with the goals of curvilinear ILT. In this paper, we introduce a GPU-accelerated ILT algorithm that improves not only contour quality and process window but also the precision of curvilinear mask shapes. Our experiments on open benchmarks demonstrate a significant advantage of our algorithm over leading academic ILT engines.

cs.CV↗

arXiv2024

FVEval: Understanding Language Model Capabilities in Formal Verification of Digital Hardware

The remarkable reasoning and code generation capabilities of large language models (LLMs) have spurred significant interest in applying LLMs to enable task automation in digital chip design. In particular, recent work has investigated early ideas of applying these models to formal verification (FV), an approach to verifying hardware implementations that can provide strong guarantees of confidence but demands significant amounts of human effort. While the value of LLM-driven automation is evident, our understanding of model performance, however, has been hindered by the lack of holistic evaluation. In response, we present FVEval, the first comprehensive benchmark and evaluation framework for characterizing LLM performance in tasks pertaining to FV. The benchmark consists of three sub-tasks that measure LLM capabilities at different levels: from the generation of SystemVerilog assertions (SVAs) given natural language descriptions to reasoning about the design RTL and suggesting assertions directly without additional human input. As test instances, we present both collections of expert-written verification collateral and methodologies to scalably generate synthetic examples aligned with industrial FV workflows. A wide range of existing LLMs, both proprietary and open-source, are evaluated against FVEval, based on which we investigate where today's LLMs stand and how we might further enable their application toward improving productivity in digital FV. Our benchmark and evaluation code is available at \url{https://github.com/NVlabs/FVEval}.

cs.AR↗

arXiv2024

Differentiable Edge-based OPC

Optical proximity correction (OPC) is crucial for pushing the boundaries of semiconductor manufacturing and enabling the continued scaling of integrated circuits. While pixel-based OPC, termed as inverse lithography technology (ILT), has gained research interest due to its flexibility and precision. Its complexity and intricate features can lead to challenges in mask writing, increased defects, and higher costs, hence hindering widespread industrial adoption. In this paper, we propose DiffOPC, a differentiable OPC framework that enjoys the virtue of both edge-based OPC and ILT. By employing a mask rule-aware gradient-based optimization approach, DiffOPC efficiently guides mask edge segment movement during mask optimization, minimizing wafer error by propagating true gradients from the cost function back to the mask edges. Our approach achieves lower edge placement error while reducing manufacturing cost by half compared to state-of-the-art OPC techniques, bridging the gap between the high accuracy of pixel-based OPC and the practicality required for industrial adoption, thus offering a promising solution for advanced semiconductor manufacturing.

cs.AI↗

arXiv2024

Intelligent OPC Engineer Assistant for Semiconductor Manufacturing

Advancements in chip design and manufacturing have enabled the processing of complex tasks such as deep learning and natural language processing, paving the way for the development of artificial general intelligence (AGI). AI, on the other hand, can be leveraged to innovate and streamline semiconductor technology from planning and implementation to manufacturing. In this paper, we present \textit{Intelligent OPC Engineer Assistant}, an AI/LLM-powered methodology designed to solve the core manufacturing-aware optimization problem known as optical proximity correction (OPC). The methodology involves a reinforcement learning-based OPC recipe search and a customized multi-modal agent system for recipe summarization. Experiments demonstrate that our methodology can efficiently build OPC recipes on various chip designs with specially handled design topologies, a task that typically requires the full-time effort of OPC engineers with years of experience.

cs.AI↗

arXiv2024

Code Less, Align More: Efficient LLM Fine-tuning for Code Generation with Data Pruning

Recent work targeting large language models (LLMs) for code generation demonstrated that increasing the amount of training data through synthetic code generation often leads to exceptional performance. In this paper we explore data pruning methods aimed at enhancing the efficiency of model training specifically for code LLMs. We present techniques that integrate various clustering and pruning metrics to selectively reduce training data without compromising the accuracy and functionality of the generated code. We observe significant redundancies in synthetic training data generation, where our experiments demonstrate that benchmark performance can be largely preserved by training on only 10% of the data. Moreover, we observe consistent improvements in benchmark results through moderate pruning of the training data. Our experiments show that these pruning strategies not only reduce the computational resources needed but also enhance the overall quality code generation.

cs.SE↗

arXiv2024

GOALPlace: Begin with the End in Mind

Co-optimizing placement with congestion is integral to achieving high-quality designs. This paper presents GOALPlace, a new learning-based general approach to improving placement congestion by controlling cell density. Our method efficiently learns from an EDA tool's post-route optimized results and uses an empirical Bayes technique to adapt this goal/target to a specific placer's solutions, effectively beginning with the end in mind. It enhances correlation with the long-running heuristics of the tool's router and timing-opt engine -- while solving placement globally without expensive incremental congestion estimation and mitigation methods. A statistical analysis with a new hierarchical netlist clustering establishes the importance of density and the potential for an adequate cell density target across placements. Our experiments show that our method, integrated as a demonstration inside an academic GPU-accelerated global placer, consistently produces macro and standard cell placements of superior or comparable quality to commercial tools. Our empirical Bayes methodology also allows a substantial quality improvement over state-of-the-art academic mixed-size placers, achieving up to 10x fewer design rule check (DRC) violations, a 5% decrease in wirelength, and a 30% and 60% reduction in worst and total negative slack (WNS/TNS).

cs.LG↗

arXiv2024

Assessing Economic Viability: A Comparative Analysis of Total Cost of Ownership for Domain-Adapted Large Language Models versus State-of-the-art Counterparts in Chip Design Coding Assistance

This paper presents a comparative analysis of total cost of ownership (TCO) and performance between domain-adapted large language models (LLM) and state-of-the-art (SoTA) LLMs , with a particular emphasis on tasks related to coding assistance for chip design. We examine the TCO and performance metrics of a domain-adaptive LLM, ChipNeMo, against two leading LLMs, Claude 3 Opus and ChatGPT-4 Turbo, to assess their efficacy in chip design coding generation. Through a detailed evaluation of the accuracy of the model, training methodologies, and operational expenditures, this study aims to provide stakeholders with critical information to select the most economically viable and performance-efficient solutions for their specific needs. Our results underscore the benefits of employing domain-adapted models, such as ChipNeMo, that demonstrate improved performance at significantly reduced costs compared to their general-purpose counterparts. In particular, we reveal the potential of domain-adapted LLMs to decrease TCO by approximately 90%-95%, with the cost advantages becoming increasingly evident as the deployment scale expands. With expansion of deployment, the cost benefits of ChipNeMo become more pronounced, making domain-adaptive LLMs an attractive option for organizations with substantial coding needs supported by LLMs

cs.AI↗

arXiv2024

Large Language Model (LLM) for Standard Cell Layout Design Optimization

Standard cells are essential components of modern digital circuit designs. With process technologies advancing toward 2nm, more routability issues have arisen due to the decreasing number of routing tracks, increasing number and complexity of design rules, and strict patterning rules. The state-of-the-art standard cell design automation framework is able to automatically design standard cell layouts in advanced nodes, but it is still struggling to generate highly competitive Performance-Power-Area (PPA) and routable cell layouts for complex sequential cell designs. Consequently, a novel and efficient methodology incorporating the expertise of experienced human designers to incrementally optimize the PPA of cell layouts is highly necessary and essential. High-quality device clustering, with consideration of netlist topology, diffusion sharing/break and routability in the layouts, can reduce complexity and assist in finding highly competitive PPA, and routable layouts faster. In this paper, we leverage the natural language and reasoning ability of Large Language Model (LLM) to generate high-quality cluster constraints incrementally to optimize the cell layout PPA and debug the routability with ReAct prompting. On a benchmark of sequential standard cells in 2nm, we demonstrate that the proposed method not only achieves up to 19.4% smaller cell area, but also generates 23.5% more LVS/DRC clean cell layouts than previous work. In summary, the proposed method not only successfully reduces cell area by 4.65% on average, but also is able to fix routability in the cell layout designs.

cs.AR↗

arXiv2024

RTLFixer: Automatically Fixing RTL Syntax Errors with Large Language Models

This paper presents RTLFixer, a novel framework enabling automatic syntax errors fixing for Verilog code with Large Language Models (LLMs). Despite LLM's promising capabilities, our analysis indicates that approximately 55% of errors in LLM-generated Verilog are syntax-related, leading to compilation failures. To tackle this issue, we introduce a novel debugging framework that employs Retrieval-Augmented Generation (RAG) and ReAct prompting, enabling LLMs to act as autonomous agents in interactively debugging the code with feedback. This framework demonstrates exceptional proficiency in resolving syntax errors, successfully correcting about 98.5% of compilation errors in our debugging dataset, comprising 212 erroneous implementations derived from the VerilogEval benchmark. Our method leads to 32.3% and 10.1% increase in pass@1 success rates in the VerilogEval-Machine and VerilogEval-Human benchmarks, respectively.

cs.AR↗

arXiv2024

ILILT: Implicit Learning of Inverse Lithography Technologies

Lithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow. Due to the limitations of lithography systems, Extensive design optimizations are required to tackle the design and silicon mismatch. Inverse lithography technology (ILT) is one of the promising solutions to perform pre-fabrication optimization, termed mask optimization. Because of mask optimization problems' constrained non-convexity, numerical ILT solvers rely heavily on good initialization to avoid getting stuck on sub-optimal solutions. Machine learning (ML) techniques are hence proposed to generate mask initialization for ILT solvers with one-shot inference, targeting faster and better convergence during ILT. This paper addresses the question of \textit{whether ML models can directly generate high-quality optimized masks without engaging ILT solvers in the loop}. We propose an implicit learning ILT framework: ILILT, which leverages the implicit layer learning method and lithography-conditioned inputs to ground the model. Trained to understand the ILT optimization procedure, ILILT can outperform the state-of-the-art machine learning solutions, significantly improving efficiency and quality.

cs.LG↗

arXiv2024

ChipNeMo: Domain-Adapted LLMs for Chip Design

ChipNeMo aims to explore the applications of large language models (LLMs) for industrial chip design. Instead of directly deploying off-the-shelf commercial or open-source LLMs, we instead adopt the following domain adaptation techniques: domain-adaptive tokenization, domain-adaptive continued pretraining, model alignment with domain-specific instructions, and domain-adapted retrieval models. We evaluate these methods on three selected LLM applications for chip design: an engineering assistant chatbot, EDA script generation, and bug summarization and analysis. Our evaluations demonstrate that domain-adaptive pretraining of language models, can lead to superior performance in domain related downstream tasks compared to their base LLaMA2 counterparts, without degradations in generic capabilities. In particular, our largest model, ChipNeMo-70B, outperforms the highly capable GPT-4 on two of our use cases, namely engineering assistant chatbot and EDA scripts generation, while exhibiting competitive performance on bug summarization and analysis. These results underscore the potential of domain-specific customization for enhancing the effectiveness of large language models in specialized applications.

cs.CL↗

arXiv2024

Optimizing Predictive AI in Physical Design Flows with Mini Pixel Batch Gradient Descent

Exploding predictive AI has enabled fast yet effective evaluation and decision-making in modern chip physical design flows. State-of-the-art frameworks typically include the objective of minimizing the mean square error (MSE) between the prediction and the ground truth. We argue the averaging effect of MSE induces limitations in both model training and deployment, and good MSE behavior does not guarantee the capability of these models to assist physical design flows which are likely sabotaged due to a small portion of prediction error. To address this, we propose mini-pixel batch gradient descent (MPGD), a plug-and-play optimization algorithm that takes the most informative entries into consideration, offering probably faster and better convergence. Experiments on representative benchmark suits show the significant benefits of MPGD on various physical design prediction tasks using CNN or Graph-based models.

cs.LG↗

arXiv2024

BoolGebra: Attributed Graph-learning for Boolean Algebraic Manipulation

Boolean algebraic manipulation is at the core of logic synthesis in Electronic Design Automation (EDA) design flow. Existing methods struggle to fully exploit optimization opportunities, and often suffer from an explosive search space and limited scalability efficiency. This work presents BoolGebra, a novel attributed graph-learning approach for Boolean algebraic manipulation that aims to improve fundamental logic synthesis. BoolGebra incorporates Graph Neural Networks (GNNs) and takes initial feature embeddings from both structural and functional information as inputs. A fully connected neural network is employed as the predictor for direct optimization result predictions, significantly reducing the search space and efficiently locating the optimization space. The experiments involve training the BoolGebra model w.r.t design-specific and cross-design inferences using the trained model, where BoolGebra demonstrates generalizability for cross-design inference and its potential to scale from small, simple training datasets to large, complex inference datasets. Finally, BoolGebra is integrated with existing synthesis tool ABC to perform end-to-end logic minimization evaluation w.r.t SOTA baselines.

cs.AR↗

arXiv2023

VerilogEval: Evaluating Large Language Models for Verilog Code Generation

The increasing popularity of large language models (LLMs) has paved the way for their application in diverse domains. This paper proposes a benchmarking framework tailored specifically for evaluating LLM performance in the context of Verilog code generation for hardware design and verification. We present a comprehensive evaluation dataset consisting of 156 problems from the Verilog instructional website HDLBits. The evaluation set consists of a diverse set of Verilog code generation tasks, ranging from simple combinational circuits to complex finite state machines. The Verilog code completions can be automatically tested for functional correctness by comparing the transient simulation outputs of the generated design with a golden solution. We also demonstrate that the Verilog code generation capability of pretrained language models could be improved with supervised fine-tuning by bootstrapping with LLM generated synthetic problem-code pairs.

cs.LG↗

arXiv2022

An Adversarial Active Sampling-based Data Augmentation Framework for Manufacturable Chip Design

Lithography modeling is a crucial problem in chip design to ensure a chip design mask is manufacturable. It requires rigorous simulations of optical and chemical models that are computationally expensive. Recent developments in machine learning have provided alternative solutions in replacing the time-consuming lithography simulations with deep neural networks. However, the considerable accuracy drop still impedes its industrial adoption. Most importantly, the quality and quantity of the training dataset directly affect the model performance. To tackle this problem, we propose a litho-aware data augmentation (LADA) framework to resolve the dilemma of limited data and improve the machine learning model performance. First, we pretrain the neural networks for lithography modeling and a gradient-friendly StyleGAN2 generator. We then perform adversarial active sampling to generate informative and synthetic in-distribution mask designs. These synthetic mask images will augment the original limited training dataset used to finetune the lithography model for improved performance. Experimental results demonstrate that LADA can successfully exploits the neural network capacity by narrowing down the performance gap between the training and testing data instances.

cs.LG↗

arXiv2022

TAG: Learning Circuit Spatial Embedding From Layouts

Analog and mixed-signal (AMS) circuit designs still rely on human design expertise. Machine learning has been assisting circuit design automation by replacing human experience with artificial intelligence. This paper presents TAG, a new paradigm of learning the circuit representation from layouts leveraging text, self-attention and graph. The embedding network model learns spatial information without manual labeling. We introduce text embedding and a self-attention mechanism to AMS circuit learning. Experimental results demonstrate the ability to predict layout distances between instances with industrial FinFET technology benchmarks. The effectiveness of the circuit representation is verified by showing the transferability to three other learning tasks with limited data in the case studies: layout matching prediction, wirelength estimation, and net parasitic capacitance prediction.

cs.AR↗