Henry Garland | Searcharxiv

arXiv2026

Fast Homoepitaxy on (100) \b{eta}-Ga2O3 Substrates with Large Grown-In Offcut

The choice of crystalline orientation and offcut angle is non-trivial for low-symmetry $\beta\text{-Ga}_2\text{O}_3$, where anisotropy impacts bulk and thin film synthesis, material properties, and power device fabrication and performance. Scalable (100)-oriented $\beta\text{-Ga}_2\text{O}_3$ wafers are desirable for electronic devices but are not typically used due to 10-30x slower growth rates compared to other orientations. Here we report molecular beam epitaxy (MBE) growth rates equal to the fast growth direction by using (100) $Ga_2O_3$ wafers with large grown-in offcuts. The offcuts (up to 13.4{\deg}) are directly grown by Edge-defined Film-fed Growth (EFG) of 2D ribbons with rotated seed crystals, avoiding material loss from crystal boule offcut methods while maintaining high crystalline quality. Chemical-mechanical polishing produces epitaxy-ready substrates, and step flow growth is observed across all offcut angles. We measure an unintentional n-type doping density of $2{\times}10^{15} cm^{-3}$, one of the lowest values reported for MBE-grown films. Planar Schottky barrier diodes on these epilayers without edge termination have an on/off ratio ~10$^5$ and an average breakdown field of 1.56 MV/cm, comparable to or exceeding similar devices fabricated on other orientations. Overall, these results illustrate the importance of both crystal face and offcut angle and validate the use of the scalable (100)-oriented $\beta\text{-Ga}_2\text{O}_3$ wafers.

cond-mat.mtrl-sci↗

arXiv2025

Stability, growth, and doping of In$_{2}$(Si, Ge)$_{2}$O$_{7}$ as promising n-type wide-gap semiconductors

In this paper we investigate, computationally and experimentally, the phase stability, electronic structure properties, and the propensity for n-type doping of In$_{2}$X$_{2}$O$_{7}$ (X=Si, Ge) ternary oxides. This family of materials contains promising novel wide-gap semiconductors based on their estimated high $n$-type Baliga figures of merit and acceptable thermal conductivity for power electronics applications. Here, we find that both In$_{2}$Si$_{2}$O$_{7}$ and In$_{2}$Ge$_{2}$O$_{7}$ to be n-type dopable, with Zr providing between 10$^{16}$ and above 10$^{21}$ cm$^{-3}$ net donor concentrations under O-poor conditions, depending on the chemistry, structure (ground-state thorvetite or high-pressure pyrochlore) and synthesis temperature. Initial thin-film growth and annealing leads to polycrystalline In$_{2}$Ge$_{2}$O$_{7}$ thin films in thorvetite structure with band gap over 4 eV, and confirms Zr doping predictions by achieving electron concentrations at 10$^{14}$-10$^{16}$ cm$^{-3}$ under O-rich condition. While future epitaxial growth development is still needed, this study establishes In$_{2}$X$_{2}$O$_{7}$ as promising n-type wide-gap semiconductors for power electronic applications.

cond-mat.mtrl-sci↗