arXiv subjects

Herman Oprins

Publications and source records attributed to Herman Oprins.

2 recordsLinked to original sources

arXiv2025

Thermal Implications of Non-Uniform Power in BSPDN-Enabled 2.5D/3D Chiplet-based Systems-in-Package using Nanosheet Technology

Advances in nanosheet technologies have significantly increased power densities, exacerbating thermal management challenges in 2.5D/3D chiplet-based Systems-in-Package (SiP). While traditional thermal analyses often employ uniform power maps to simplify computational complexity, this practice neglects localized heating effects, leading to inaccuracies in thermal estimations, especially when comparing power delivery networks (PDN) in 3D integration. This work examines the thermal impact of non-uniform power distributions on SiPs utilizing frontside (FSPDN) and backside (BSPDN) power delivery approaches. Using high-resolution thermal simulations with non-uniform power maps at resolutions down to 5 micrometers, we demonstrate that uniform power assumptions substantially underestimate peak temperatures and fail to reveal critical thermal differences between BSPDN and FSPDN configurations in 3D scenarios. Our results highlight that BSPDN configurations in 3D, although beneficial in simplified uniform scenarios, exhibit pronounced thermal penalties under realistic, localized workloads due to limited lateral heat spreading. These findings emphasize the necessity of adopting fine-grained, workload-aware power maps in early-stage thermal modeling to enable accurate PDN assessment and informed thermal-aware design decisions in advanced nanosheet-based 3D SiP.

cs.ET↗

arXiv2024

Selecting Alternative Metals for Advanced Interconnects

Interconnect resistance and reliability have emerged as critical factors limiting the performance of advanced CMOS circuits. With the slowdown of transistor scaling, interconnect scaling has become the primary driver of continued circuit miniaturization. The associated scaling challenges for interconnects are expected to further intensify in future CMOS technology nodes. As interconnect dimensions approach the 10 nm scale, the limitations of conventional Cu dual-damascene metallization are becoming increasingly difficult to overcome, spurring over a decade of focused research into alternative metallization schemes. The selection of alternative metals is a highly complex process, requiring consideration of multiple criteria, including resistivity at reduced dimensions, reliability, thermal performance, process technology readiness, and sustainability. This tutorial introduces the fundamental criteria for benchmarking and selecting alternative metals and reviews the current state of the art in this field. It covers materials nearing adoption in high-volume manufacturing, materials currently under active research, and potential future directions for fundamental study. While early alternatives to Cu metallization have recently been introduced in commercial CMOS devices, the search for the optimal interconnect metal remains ongoing.

physics.app-ph↗