arXiv subjects

Hongjie Dai

Publications and source records attributed to Hongjie Dai.

96 records · Page 6Linked to original sources

arXiv2004

High-Field, Quasi-Ballistic Transport in Short Carbon Nanotubes

Single walled carbon nanotubes with Pd ohmic contacts and lengths ranging from several microns down to 10 nm are investigated by electron transport experiments and theory. The mean free path (mfp) for acoustic phonon scattering is estimated to be lap~300 nm, and that for optical phonon scattering is lop~15 nm. Transport through very short (~10 nm) nanotubes is free of significant acoustic and optical phonon scattering and thus ballistic and quasi-ballistic at the low and high bias voltage limits respectively. High currents of up to 70 uA can flow through a short nanotube. Possible mechanisms for the eventual electrical breakdown of short nanotubes at high fields are discussed. The results presented here have important implications to high performance nanotube transistors and interconnects.

cond-mat.mes-hall↗

arXiv2004

Advancements in Complementary Carbon Nanotube Field-Effect Transistors

High performance p- and n-type single-walled carbon nanotube (SWNT) field-effect transistors (FETs) are obtained by using high and low work function metals, Pd and Al as source/drain (S/D) electrodes respectively. Ohmic contacts made to chemically intrinsic SWNTs, with no or small Schottky barriers (SB), afford high ON-state currents up to 20 uA per tube. The lack of significant Fermi-level pinning at the nanotube-metal interfaces allows for fine-tuning of the barrier heights for p-and n-channel conductions by changing the contact metals. The air-stable p- and n-FETs thus obtained can be used for complementary nanoelectronics, as demonstrated with the fabrication of an inverter. Other important issues regarding nanotube FETs including hysteresis, OFF-state leak currents, choice of nanotube diameter, and threshold voltage control are discussed.

cond-mat.mes-hall↗

arXiv2003

Carbon Nanotube Field-Effect Transistors With Integrated Ohmic Contacts and High-k Gate Dielectrics

High performance enhancement mode semiconducting carbon nanotube field-effect transistors (CNTFETs) are obtained by combining ohmic metal-tube contacts, high dielectric constant HfO2 films as gate insulators, and electrostatically doped nanotube segments as source/drain electrodes. The combination of these elements affords high ON currents, subthreshold swings of ~ 70-80 mV/decade, and allows for low OFF currents and suppressed ambipolar conduction. The doped source and drain approach resembles that of MOSFETs and can impart excellent OFF states to nanotube FETs under aggressive vertical scaling. This presents an important advantage over devices with metal source/drain, or devices commonly referred to as Schottky barrier FETs.

cond-mat.mes-hall↗

arXiv2003

Ballistic Transport in Metallic Nanotubes With Reliable Pd Ohmic Contacts

Contacting metallic single-walled carbon nanotubes by palladium (Pd) affords highly reproducible ohmic contacts and allows for detailed elucidation of ballistic transport in metallic nanotubes. The Pd ohmic contacts are more reliable than titanium (Ti) previously used for ballistic nanotube devices. In contrast, Pt contacts appear to give non-ohmic contacts to metallic nanotubes. For both ohmic and non-ohmic contacts, the length of the nanotube under the metal contact area is electrically turned off. Transport occurs from metal to nanotube at the edges of the contacts. Measurements with large numbers of Pd contacted nanotube samples reveal that the mean free path for defect scattering in SWNTs grown by chemical vapor deposition can be up to 4 microns. The mean free paths for acoustic phonon scattering are on the order of 500 nm at room temperature and >> 4 microns at low temperatures.

cond-mat↗

arXiv2003

Predicted Performance Advantages of Carbon Nanotube Transistors with Doped Nanotubes as Source/Drain

Most carbon nanotube field-effect transistors (CNTFETs) directly attach metal source/drain contacts to an intrinsic nanotube channel. When the gate oxide thickness is reduced, such transistors display strong ambipolar conduction, even when the Schottky barrier for electrons (or for holes) is zero. The resulting leakage current, which increases exponentially with the drain voltage, constrains the potential applications of such devices. In this paper, we use numerical simulations to show that if CNT based metal-oxide-semiconductor (MOS) FETs can be achieved by using heavily doped CNT sections as source and drain, ambipolar conduction will be suppressed, leakage current will be reduced, and the scaling limit imposed by source-drain tunneling will be extended. By eliminating the Schottky barrier between the source and channel, the transistor will be capable of delivering more on-current. The leakage current of such devices will be controlled by the full bandgap of CNTs (instead of half of the bandgap for SB CNTFETs) and band-to-band tunneling. These factors will depend on the diameter of nanotubes and the power supply voltage.

cond-mat.mes-hall↗

arXiv1994

Coulomb Gap and Correlated Vortex Pinning in Superconductors

The positions of columnar pins and magnetic flux lines determined from a decoration experiment on BSCCO were used to calculate the single--particle density of states at low temperatures in the Bose glass phase. A wide Coulomb gap is found, with gap exponent $s \approx 1.2$, as a result of the long--range interaction between the vortices. As a consequence, the variable--range hopping transport of flux lines is considerably reduced with respect to the non--interacting case, the effective Mott exponent being enhanced from $p_0 = 1/3$ to $p_{\rm eff} \approx 0.5$ for this specific experiment.

cond-mat↗