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Hongyan Wu

Publications and source records attributed to Hongyan Wu.

26 records · Page 2Linked to original sources

Graph Polish: A Novel Graph Generation Paradigm for Molecular Optimization

Molecular optimization, which transforms a given input molecule X into another Y with desirable properties, is essential in molecular drug discovery. The traditional translating approaches, generating the molecular graphs from scratch by adding some substructures piece by piece, prone to error because of the large set of candidate substructures in a large number of steps to the final target. In this study, we present a novel molecular optimization paradigm, Graph Polish, which changes molecular optimization from the traditional "two-language translating" task into a "single-language polishing" task. The key to this optimization paradigm is to find an optimization center subject to the conditions that the preserved areas around it ought to be maximized and thereafter the removed and added regions should be minimized. We then propose an effective and efficient learning framework T&S polish to capture the long-term dependencies in the optimization steps. The T component automatically identifies and annotates the optimization centers and the preservation, removal and addition of some parts of the molecule, and the S component learns these behaviors and applies these actions to a new molecule. Furthermore, the proposed paradigm can offer an intuitive interpretation for each molecular optimization result. Experiments with multiple optimization tasks are conducted on four benchmark datasets. The proposed T&S polish approach achieves significant advantage over the five state-of-the-art baseline methods on all the tasks. In addition, extensive studies are conducted to validate the effectiveness, explainability and time saving of the novel optimization paradigm.

cs.LG↗

Perturb More, Trap More: Understanding Behaviors of Graph Neural Networks

While graph neural networks (GNNs) have shown a great potential in various tasks on graph, the lack of transparency has hindered understanding how GNNs arrived at its predictions. Although few explainers for GNNs are explored, the consideration of local fidelity, indicating how the model behaves around an instance should be predicted, is neglected. In this paper, we first propose a novel post-hoc framework based on local fidelity for any trained GNNs - TraP2, which can generate a high-fidelity explanation. Considering that both relevant graph structure and important features inside each node need to be highlighted, a three-layer architecture in TraP2 is designed: i) interpretation domain are defined by Translation layer in advance; ii) local predictive behavior of GNNs being explained are probed and monitored by Perturbation layer, in which multiple perturbations for graph structure and feature-level are conducted in interpretation domain; iii) high faithful explanations are generated by fitting the local decision boundary through Paraphrase layer. Finally, TraP2 is evaluated on six benchmark datasets based on five desired attributions: accuracy, fidelity, decisiveness, insight and inspiration, which achieves $10.2\%$ higher explanation accuracy than the state-of-the-art methods.

cs.LG↗

HopGAT: Hop-aware Supervision Graph Attention Networks for Sparsely Labeled Graphs

Due to the cost of labeling nodes, classifying a node in a sparsely labeled graph while maintaining the prediction accuracy deserves attention. The key point is how the algorithm learns sufficient information from more neighbors with different hop distances. This study first proposes a hop-aware attention supervision mechanism for the node classification task. A simulated annealing learning strategy is then adopted to balance two learning tasks, node classification and the hop-aware attention coefficients, along the training timeline. Compared with state-of-the-art models, the experimental results proved the superior effectiveness of the proposed Hop-aware Supervision Graph Attention Networks (HopGAT) model. Especially, for the protein-protein interaction network, in a 40% labeled graph, the performance loss is only 3.9%, from 98.5% to 94.6%, compared to the fully labeled graph. Extensive experiments also demonstrate the effectiveness of supervised attention coefficient and learning strategies.

cs.LG↗

Plasma Surface Metallurgy of Materials Based on Double Glow Discharge Phenomenon

Plasma Surface Metallurgy/Alloying is a kind of surface metallurgy/alloying to employ low temperature plasma produced by glow discharge to diffuse alloying elements into the surface of substrate material to form an alloy layer. The first plasma surface metallurgy technology is plasma nitriding invented by German scientist Dr. Bernard Berghuas in 1930. He was the first person to apply glow discharge to realize the surface alloying. In order to break the limitation of plasma nitriding technology, which can only be applied to a few non-metallic gaseous elements such as nitrogen, carbon, sulfur, the "Double Glow Discharge Phenomenon"was found in 1978. Based on this phenomenon the "Double Glow Plasma Surface Metallurgy Technology", also known as the "Xu-Tec Process" was invented in 1980. It can utilize any chemical elements in the periodic table including solid metallic, gas non-metallic elements and their combination to realize plasma surface alloying, hence greatly expanded the field of surface alloying. Countless surface alloys with high hardness, wear resistance and corrosion resistance, such as high speed steels, nickel base alloys and burn resistant alloys have been produced on the surfaces of a variety of materials. This technology may greatly improve the surface properties of metal materials, comprehensively improve the quality of mechanical products, save a lot of precious alloy elements for human beings. Based on the plasma nitriding technology, the Xu-Tec Process has opened up a new material engineering field of "Plasma Surface Metallurgy". This Review Article briefly presents the history of glow discharge and surface alloying, double glow discharge phenomenon, basic principle and current status of Double Glow Plasma Surface Metallurgy/Alloying. Industrial applications, advantages and future potential of the Xu-Tec process are also presented.

physics.app-ph↗

A Series of Plasma Innovation Technologies by Double Glow Discharge Phenomenon

In order to break the limitation of plasma nitriding technology,which can be applied to a few nonmetallic gaseous elements, the "Double Glow Discharge Phenomenon" was found and then invented the "Double Glow Plasma Surface Metallurgy Technology". This double glow plasma surface metallurgy technology can use any element in the periodic table of chemical elements for surface alloying of metal materials. Countless surface alloys with special physical and chemical properties have been produced on the surfaces of conductive materials.By using double glow discharge phenomenon,a series of new plasma technologies,such as the double glow plasma graphene technology, double glow plasma brazing technology,double glow plasma sintering technology, double glow plasma nanotechnology,double glow plasma cleaning technology, double glow plasma carburizing without hydrogen and so on, have been invented.A very simple phenomenon of double glow discharge can generate about 10 plasma innovation technologies, which fully shows that there is still a lot of innovation space on the basis of classical physics.This paper briefly introduces the basic principles,functions and characteristics of each technology. The application prospects and development directions of plasma in metal materials and machinery manufacturing industry will also be discussed.

physics.app-ph↗

Effective Field Theory of Majorana Dark Matter

We revisit thermal Majorana dark matter from the viewpoint of minimal effective field theory. In this framework, analytic results for dark matter annihilation into standard model particles are derived. The dark matter parameter space subject to the latest LUX, PandaX-II and Xenon-1T limits is presented in a model-independent way. Applications to singlet-doublet and MSSM are presented.

hep-ph↗

Light Neutralino Dark Matter in the NMSSM

The next-to-minimal supersymmetric standard model can host light neutralino dark matter with mass of order GeV scale. It is dominated by the singlino component as a result of approximate Peccei-Quinn symmetry. This paper is devoted to address the question how light such neutralino dark matter can be in the light of the LHC Run 1 data as well as the latest LUX and Xenon1T limits. In particular, we show the sensitivity of parameter space of dark matter mass with respect to $Z$ boson and SM Higgs invisible decay.

hep-ph↗

Scalar Dark Matter: Real vs Complex

We update the parameter spaces for both a real and complex scalar dark matter via the Higgs portal. In the light of constraints arising from the LUX 2016 data, the latest Higgs invisible decay and the gamma ray spectrum, the dark matter resonant mass region is further restricted to a narrow window between $54.9-62.3$ GeV in both cases, and its large mass region is excluded until $834$ GeV and $3473$ GeV for the real and complex scalar, respectively.

hep-ph↗