arXiv subjects

Huili Grace Xing

Publications and source records attributed to Huili Grace Xing.

63 records · Page 4Linked to original sources

arXiv2014

Self-Assembled Ge QDs Formed by High Temperature Annealing on GaAs and AlxGa1-xAs (001)

This work studies the spontaneous self-assembly of Ge QDs on AlAs, GaAs, and AlGaAs by high temperature in-situ annealing in molecular beam epitaxy (MBE). The morphology of Ge dots formed on AlAs are observed by atom probe tomography, which revealed nearly spherical QDs with diameters approaching 10 nm and confirmed the complete absence of a wetting layer. Reflection high-energy electron diffraction (RHEED) and atomic force microscopy (AFM) of Ge annealed under similar conditions on GaAs and Al0.3Ga0.7As surfaces reveal the gradual suppression of QD formation with decreasing Al-content of the buffer. To investigate the prospects of using encapsulated Ge dots for upconverting photovoltaics, in which photocurrent can still be generated from photons with energy less than the host bandgap, Ge QDs are embedded into the active region of III-V PIN diodes by MBE. It is observed that orders of magnitude higher short-circuit current is obtained at photon energies below the GaAs bandgap compared with a reference PIN diode without Ge QDs. These results demonstrate the promise of Ge QDs for upconverting solar cells and the realization of device-quality integration of group IV and III-V semiconductors.

cond-mat.mtrl-sci↗

arXiv2014

Strain Sensitivity in the Nitrogen 1s NEXAFS Spectra of Gallium Nitride

The Nitrogen 1s near edge X-ray absorption fine structure (NEXAFS) of gallium nitride (GaN) shows a strong natural linear dichroism that arises from its anisotropic wurtzite structure. An additional spectroscopic variation arises from lattice strain in epitaxially grown GaN thin films. This variation is directly proportional to the degree of strain for some spectroscopic features. This strain variation is interpreted with the aid of density functional theory calculations.

cond-mat.mtrl-sci↗

arXiv2013

Single Particle Transport in Two-dimensional Heterojunction Interlayer Tunneling Field Effect Transistor

The single particle tunneling in a vertical stack consisting of monolayers of two-dimensional semiconductors is studied theoretically and its application to a novel Two-dimensional Heterojunction Interlayer Tunneling Field Effect Transistor (Thin-TFET) is proposed and described. The tunneling current is calculated by using a formalism based on the Bardeen's transfer Hamiltonian, and including a semi-classical treatment of scattering and energy broadening effects. The misalignment between the two 2D materials is also studied and found to influence the magnitude of the tunneling current, but have a modest impact on its gate voltage dependence. Our simulation results suggest that the Thin-TFETs can achieve very steep subthreshold swing, whose lower limit is ultimately set by the band tails in the energy gaps of the 2D materials produced by energy broadening. The Thin-TFET is thus very promising as a low voltage, low energy solid state electronic switch.

cond-mat.mes-hall↗

arXiv2013

Ge Quantum Dots Encapsulated by AlAs Grown by Molecular Beam Epitaxy on GaAs Without Extended Defects

We demonstrate nearly-spherical, strain-free, self-assembled Ge quantum dots (QDs) fully encapsulated by AlAs, grown on (100) GaAs by molecular beam epitaxy (MBE). The QDs were formed without a wetting layer using a high temperature, in-situ anneal. Subsequent AlAs overgrowth was free from threading dislocations and anti-phase domains. The straddling band alignment for Ge in AlAs promises strong and tunable confinement for both electrons and holes. The reflection high-energy electron diffraction (RHEED) pattern changed from 2x3 to 2x5 with anneal, which can be explained by surface reconstructions based on the electron-counting model.

cond-mat.mtrl-sci↗

arXiv2013

Raman and Photoluminescence Study of Dielectric and Thermal Effects on Atomically Thin MoS2

Atomically thin two-dimensional molybdenum disulfide (MoS2) sheets have attracted much attention due to their potential for future electronic applications. They not only present the best planar electrostatic control in a device, but also lend themselves readily for dielectric engineering. In this work, we experimentally investigated the dielectric effect on the Raman and photoluminescence (PL) spectra of monolayer MoS2 by comparing samples with and without HfO2 on top by atomic layer deposition (ALD). Based on considerations of the thermal, doping, strain and dielectric screening influences, it is found that the red shift in the Raman spectrum largely stems from modulation doping of MoS2 by the ALD HfO2, and the red shift in the PL spectrum is most likely due to strain imparted on MoS2 by HfO2. Our work also suggests that due to the intricate dependence of band structure of monolayer MoS2 on strain, one must be cautious to interpret its Raman and PL spectroscopy.

cond-mat.mtrl-sci↗

arXiv2013

A New Class of Electrically Tunable Metamaterial Terahertz Modulators

Switchable metamaterials offer unique solutions for efficiently manipulating electromagnetic waves, particularly for terahertz waves, which has been difficult since naturally occurring materials rarely respond to terahertz frequencies controllably. However, few terahertz modulators demonstrated to date exhibit simultaneously low attenuation and high modulation depth. In this letter we propose a new class of electrically-tunable terahertz metamaterial modulators employing metallic frequency-selective-surfaces (FSS) in conjunction with capacitively-tunable layers of electrons, promising near 100% modulation depth and < 15% attenuation. The fundamental departure in our design from the prior art is tuning enabled by self-gated electron layers that is independent from the metallic FSS. Our proposal is applicable to all possible electrically tunable elements including graphene, Si, MoS2, oxides etc, thus opening up myriad opportunities for realizing high performance switchable metamaterials over an ultra-wide terahertz frequency range.

physics.optics↗

arXiv2013

Coded-aperture imaging using photo-induced reconfigurable aperture arrays for mapping terahertz beams

We report terahertz coded-aperture imaging using photo-induced reconfigurable aperture arrays on a silicon wafer. The coded aperture was implemented using programmable illumination from a commercially available digital light processing projector. At 590 GHz, each of the array element apertures can be optically turned on and off with a modulation depth of 20 dB and a modulation rate of ~1.3 KHz. Prototype demonstrations of 4 by 4 coded-aperture imaging using Hadamard coding have been performed and this technique has been successfully applied to mapping THz beams by using a 6 by 6 aperture array at 590 GHz. The imaging results agree closely with theoretical calculations based on Gaussian beam transformation, demonstrating that this technique is promising for realizing real-time and low-cost terahertz cameras for many applications. The reported approach provides a simple but powerful means to visualize THz beams, which is highly desired in quasi-optical system alignment, quantum-cascade laser design and characterization, and THz antenna characterization.

physics.ins-det↗

arXiv2012

Efficient terahertz electro-absorption modulation employing graphene plasmonic structures

We propose and discuss terahertz electro-absorption modulators based on graphene plasmonic structures. The active device consists of a self-gated pair of graphene layers, which are patterned to structures supporting THz plasmonic resonances. These structures allow for efficient control of the effective THz optical conductivity, thus absorption, even at frequencies much higher than the Drude roll-off in graphene where most previously proposed graphene-based devices become inefficient. Our analysis shows that reflectance-based device configurations, engineered so that the electric field is enhanced in the active graphene pair, could achieve very high modulation-depth, even ~100%, at any frequency up to tens of THz.

cond-mat.mes-hall↗

arXiv2010

Scalability of Atomic-Thin-Body (ATB) Transistors Based on Graphene Nanoribbons

A general solution for the electrostatic potential in an atomic-thin-body (ATB) field-effect transistor geometry is presented. The effective electrostatic scaling length, λeff, is extracted from the analytical model, which cannot be approximated by the lowest order eigenmode as traditionally done in SOI-MOSFETs. An empirical equation for the scaling length that depends on the geometry parameters is proposed. It is shown that even for a thick SiO2 back oxide λeff can be improved efficiently by thinner top oxide thickness, and to some extent, with high-k dielectrics. The model is then applied to self-consistent simulation of graphene nanoribbon (GNR) Schottky-barrier field-effect transistors (SB-FETs) at the ballistic limit. In the case of GNR SB-FETs, for large λeff, the scaling is limited by the conventional electrostatic short channel effects (SCEs). On the other hand, for small λeff, the scaling is limited by direct source-to-drain tunneling. A subthreshold swing below 100mV/dec is still possible with a sub-10nm gate length in GNR SB-FETs.

cond-mat.mes-hall↗