arXiv subjects

I. Shlimak

Publications and source records attributed to I. Shlimak.

At least 19 recordsLinked to original sources

arXiv2019

Irradiation-induced broadening of the Raman spectra in monolayer graphene

Broadening of the Raman scattering (RS) spectra was studied in monolayer graphene samples irradiated with various dose of ions followed by annealing of radiation damage at different temperatures. It is shown that the width Γ (full width at half maximum, FWHM) of three main RS lines (G-, D-, and 2D) increases linearly with increase of the density of irradiation-induced point defects N d as ΔΓ = m N d . The slope m of the linear dependencies is the same for one-phonon emitting G-line and D-line, and almost double for two-phonon emitting 2D-line. It is also shown that the width of D-line Γ D for all samples is larger than one half of the width of 2D-line Γ 2D , which shows that in the case of D-line, elastic electron scattering on point defects leads to an additional decreasing the lifetime of the emitted phonon. Theoretical model of the width of D-line in disordered graphene is developed which explains the experimental observations and allows to determine the numerical coefficient in the in-plane transverse optic phonon dispersion in graphene.

cond-mat.mes-hall↗

arXiv2019

Irradiation-induced metal-insulator transition in monolayer graphene

A brief review of experiments directed to study a gradual localization of charge carriers and metal-insulator transition in samples of disordered monolayer graphene is presented. Disorder was induced by irradiation with different doses of heavy and light ions. Degree of disorder was controlled by measurements of the Raman scattering spectra. The temperature dependences of conductivity and magnetoresistance (MR) showed that at low disorder, conductivity is governed by the weak localization and antilocalization regime. Further increase of disorder leads to strong localization of charge carriers, when the conductivity is described by the variable-range-hopping (VRH) mechanism. It was observed that MR in the VRH regime is negative in perpendicular fields and is positive in parallel magnetic fields which allowed to reveal different mechanisms of hopping MR. Theoretical analysis is in a good agreement with experimental data.

cond-mat.mes-hall↗

arXiv2016

Influence of ageing on Raman spectra and the conductivity of monolayer graphene samples irradiated by heavy and light ions

The influence of long-term ageing (about one year) on the Raman scattering (RS) spectra and the temperature dependence of conductivity has been studied in two series of monolayer graphene samples irradiated by different doses of C$^{+}$ and Xe$^{+}$ ions. It is shown that the main result of ageing consists of changes in the intensity and position of D- and G- and 2D-lines in RS spectra and in an increase of the conductivity. The observed effects are explained in terms of an increase of the radius of the \textquotedblleft activated\textquotedblright{} area around structural defects.

cond-mat.mes-hall↗

arXiv2016

Effect of annealing on Raman scattering spectra of monolayer graphene samples gradually disordered by ion irradiation

The Raman scattering spectra (RS) of two series of monolayer graphene samples irradiated with various doses of C$^{+}$ and Xe$^{+}$ ions were measured after annealing in high vacuum, and in forming gas (95\%Ar+5\%H$_{2}$). It was found that these methods of annealing have dramatically different influence on the RS lines. Annealing in vacuum below 500$^{\circ}$C leads to significant decrease of both D-line, associated with defects, and 2D-line, associated with the intact lattice structure, which can be explained by annealing-induced enhanced doping. Further annealing in vacuum up to 1000$^{\circ}$C leads to significant increase of 2D-line together with continuous decrease of D-line, which gives evidence of partial removal of defects and recovery of the damaged lattice. Annealing in forming gas is less effective in this sense. The blue shift of all lines is observed after annealing. It is shown that below 500$^{\circ}$C, the unintentional doping is the main mechanism of shift, while at higher annealing temperatures, the lattice strain dominates due to mismatch of the thermal expansion coefficient of graphene and the SiO$_{2}$ substrate. Inhomogeneous distribution of stress and doping across the samples leads to the correlated variation of the amplitude and the peak position of RS lines.

cond-mat.mes-hall↗

arXiv2015

Hopping magnetoresistance in ion irradiated monolayer graphene

Magnetoresistance (MR) of ion irradiated monolayer graphene samples with variable-range hopping (VRH) mechanism of conductivity was measured at temperatures down to $T = 1.8$ K in magnetic fields up to $B = 8$ T. It was observed that in perpendicular magnetic fields, hopping resistivity $R$ decreases, which corresponds to negative MR (NMR), while parallel magnetic field results in positive MR (PMR) at low temperatures. NMR is explained on the basis of the "orbital" model in which perpendicular magnetic field suppresses the destructive interference of many paths through the intermediate sites in the total probability of the long-distance tunneling in the VRH regime. At low fields, a quadratic dependence ($|ΔR/R|\sim B^2$) of NMR is observed, while at $B > B^*$, the quadratic dependence is replaced by the linear one. It was found that all NMR curves for different samples and different temperatures could be merged into common dependence when plotted as a function of $B/B^*$. It is shown that $B^*\sim T^{1/2}$ in agreement with predictions of the "orbital" model. The obtained values of $B^*$ allowed also to estimate the localization radius $ξ$ of charge carriers for samples with different degree of disorder. PMR in parallel magnetic fields is explained by suppression of hopping transitions via double occupied states due to alignment of electron spins.

cond-mat.mes-hall↗

arXiv2015

Localization of charge carriers in monolayer graphene gradually disordered by ion irradiation

Gradual localization of charge carriers was studied in a series of micro-size samples of monolayer graphene fabricated on the common large scale film and irradiated by different doses of C$^+$ ions with energy 35 keV. Measurements of the temperature dependence of conductivity and magnetoresistance in fields up to 4 T showed that at low disorder, the samples are in the regime of weak localization and antilocalization. Further increase of disorder leads to strong localization regime, when conductivity is described by the variable-range-hopping (VRH) mechanism. A crossover from the Mott regime to the Efros-Shklovskii regime of VRH is observed with decreasing temperature. Theoretical analysis of conductivity in both regimes showed a remarkably good agreement with experimental data.

cond-mat.mes-hall↗

arXiv2015

Raman scattering and electrical resistance of highly disordered graphene

Raman scattering (RS) spectra and current-voltage characteristics at room temperature were measured in six series of small samples fabricated by means of electron-beam lithography on the surface of a large size (5x5 mm) industrial monolayer graphene film. Samples were irradiated by different doses of C${}^+$ ion beam up to $10^{15}$ cm${}^{-2}$. It was observed that at the utmost degree of disorder, the Raman spectra lines disappear which is accompanied by the exponential increase of resistance and change in the current-voltage characteristics.These effects are explained by suggestion that highly disordered graphene film ceases to be a continuous and splits into separate fragments. The relationship between structure (intensity of RS lines) and sample resistance is defined. It is shown that the maximal resistance of the continuous film is of order of reciprocal value of the minimal graphene conductivity $πh/4e^2\approx 20$ kOhm.

cond-mat.mes-hall↗

arXiv2013

Resistance asymmetry of a two-dimensional electron gas caused by an effective spin injection

We have performed conductivity measurements on a Si-MOSFET sample with a slot in the upper gate, allowing for different electron densities n_1 and n_2 across the slot. Dynamic longitudinal resistance was measured by a standard lock-in technique, while maintaining a large DC current through the source-drain channel. We find that in a parallel magnetic field, the resistance of the sample, R(I_DC), is asymmetric with respect to the direction of the DC current. The asymmetry becomes stronger with an increase of either the magnetic field or the difference between n_1 and n_2. These observations are interpreted in terms of the effective spin injection: the degree of spin polarisation is different in the two parts of the sample, implying different magnitudes of spin current away from the slot. The carriers thus leave the excess spin (of the appropriate sign) in the region around the slot, leading to spin accumulation (or depletion) and to the spin drift-diffusion phenomena. Due to the positive magnetoresistance of the two-dimensional electron gas, this change in a local magnetisation affects the resistivity near the slot and the measured net resistance, giving rise to an asymmetric contribution. We further observe that the value of R(I_DC) saturates at large I_DC; we suggest that this is due to electron tunnelling from the two-dimensional n-type layer into the p-type silicon (or into another "spin reservoir") at the slot.

cond-mat.mes-hall↗

arXiv2012

Influence of spin polarization on resistivity of a two-dimensional electron gas in Si MOSFET at metallic densities

Positive magnetoresistance (PMR) of a silicon MOSFET in parallel magnetic fields B has been measured at high electron densities n >> n_c where n_c is the critical density of the metal-insulator transition (MIT). It turns out that the normalized PMR curves, R(B)/R(0), merge together when the field is scaled according to B/B_c(n) where B_c is the field in which electrons become fully spin polarized. The values of B_c have been calculated from the simple equality between the Zeeman splitting energy and the Fermi energy taking into account the experimentally measured dependence of the spin susceptibility on the electron density. This extends the range of validity of the scaling all the way to a deeply metallic regime far away from MIT. The subsequent analysis of PMR for low n >~ n_c demonstrated that the merging of the initial parts of curves can bee achieved only with taking into account the temperature dependence of B_c. It is also shown that the shape of the PMR curves at strong magnetic fields is affected by a crossover from a purely two-dimensional (2D) electron transport to a regime where out-of-plane carrier motion becomes important (quasi-three-dimensional regime).

cond-mat.str-el↗

arXiv2010

Structure and spatial distribution of Ge nanocrystals subjected to fast neutron irradiation

The influence of fast neutron irradiation on the structure and spatial distribution of Ge nanocrystals (NC) embedded in an amorphous SiO2 matrix has been studied. The investigation was conducted by means of laser Raman Scattering (RS), High Resolution Transmission Electron Microscopy (HR-TEM) and X-ray photoelectron spectroscopy (XPS). The irradiation of NC-Ge samples by a high dose of fast neutrons lead to a partial destruction of the nanocrystals. Full reconstruction of crystallinity was achieved after annealing the radiation damage at 800 deg. C, which resulted in full restoration of the RS spectrum. HR-TEM images show, however, that the spatial distributions of NC-Ge changed as a result of irradiation and annealing. A sharp decrease in NC distribution towards the SiO2 surface has been observed. This was accompanied by XPS detection of Ge oxides and elemental Ge within both the surface and subsurface region.

cond-mat.mes-hall↗

arXiv2009

Conductance asymmetry of a slot gate Si-MOSFET in a strong parallel magnetic field

We report measurements on a Si-MOSFET sample with a slot in the upper gate, allowing for different electron densities n_{1,2} across the slot. The dynamic longitudinal resistance was measured by the standard lock-in technique, while maintaining a large DC current through the source-drain channel. We find that the conductance of the sample in a strong parallel magnetic field is asymmetric with respect to the DC current direction. This asymmetry increases with magnetic field. The results are interpreted in terms of electron spin accumulation or depletion near the slot.

cond-mat.mes-hall↗

arXiv2008

Electron transport in a slot-gate Si MOSFET

The transversal and longitudinal resistance in the quantum Hall effect regime was measured in a Si MOSFET sample in which a slot-gate allows one to vary the electron density and filling factor in different parts of the sample. In case of unequal gate voltages, the longitudinal resistances on the opposite sides of the sample differ from each other because the originated Hall voltage difference is added to the longitudinal voltage only on one side depending on the gradient of the gate voltages and the direction of the external magnetic field. After subtracting the Hall voltage difference, the increase in longitudinal resistance is observed when electrons on the opposite sides of the slot occupy Landau levels with different spin orientations.

cond-mat.mes-hall↗

arXiv2006

Manifestation of the Exchange Enhancement of the Valley Splitting in the Quantum Hall Effect Regime

We report a new "dip" effect in the Hall resistance, R_{xy}, of a Si metal-oxide-semiconductor field-effect transistor in the quantum Hall effect regime. With increasing magnetic field, the Hall resistance moves from the plateau at Landau filling factor ν=6 directly to the plateau at ν=4, skipping the plateau at ν=5. However, when the filling factor approaches ν=5, the Hall resistance sharply "dives" to the value 1/5(h/e^2) characteristic of the ν=5 plateau, and then returns to 1/4(h/e^2). This is interpreted as a manifestation of the oscillating exchange enhancement of the valley splitting when the Fermi level is in the middle between two adjacent valley-split Landau bands with the asymmetric position of the extended states.

cond-mat.mes-hall↗

arXiv2005

Transverse "resistance overshoot" in a Si/SiGe two-dimensional electron gas in the quantum Hall effect regime

We investigate the peculiarities of the "overshoot" phenomena in the transverse Hall resistance R_{xy} in Si/SiGe. Near the low magnetic field end of the quantum Hall effect plateaus, when the filling factor νapproaches an integer i, R_{xy} overshoots the normal plateau value h/ie^2. However, if magnetic field B increases further, R_{xy} decreases to its normal value. It is shown that in the investigated sample n-Si/Si_{0.7}Ge_{0.3}, overshoots exist for almost all ν. Existence of overshoot in R_{xy} observed in different materials and for different ν, where splitting of the adjacent Landau bands has different character, hints at the common origin of this effect. Comparison of the experimental curves R_{xy}(ν) for ν= 3 and ν= 5 with and without overshoot showed that this effect exist in the whole interval between plateaus, not only in the region where R_{xy} exceeds the normal plateau value.

cond-mat.mes-hall↗

arXiv2003

Longitudinal conductivity in Si/SiGe heterostructure at integer filling factors

We have investigated temperature dependence of the longitudinal conductivity $σ_{xx}$ at integer filling factors $ν=i$ for Si/SiGe heterostructure in the quantum Hall effect regime. It is shown that for odd $i$, when the Fermi level $E_{F}$ is situated between the valley-split levels, $Δσ_{xx}$ is determined by quantum corrections to conductivity caused by the electron-electron interaction: $Δσ_{xx}(T)\sim \ln T$. For even $i$, when $E_{F}$ is located between cyclotron-split levels or spin-split levels, $σ_{xx}\sim \exp[-Δ_{i}/T]$ for $i=6,10,12$ and $\sim \exp [-(T_{0i}/T)]^{1/2}$ for $i=4,8$. For further decrease of $T$, all dependences $σ_{xx}(T)$ tend to almost temperature-independent residual conductivity $σ_{i}(0)$. A possible mechanism for $σ_{i}(0)$ is discussed.

cond-mat.mes-hall↗

arXiv2001

Isotopically engineered silicon/silicon-germanium nanostructures as basic elements for a nuclear spin quantum computer

The idea of quantum computation is the most promising recent developments in the high-tech domain, while experimental realization of a quantum computer poses a formidable challenge. Among the proposed models especially attractive are semiconductor based nuclear spin quantum computer's (S-NSQC), where nuclear spins are used as quantum bistable elements, ''qubits'', coupled to the electron spin and orbital dynamics. We propose here a scheme for implementation of basic elements for S-NSQC's which are realizable within achievements of the modern nanotechnology. These elements are expected to be based on a nuclear-spin-controlled isotopically engineered Si/SiGe heterojunction, because in these semiconductors one can vary the abundance of nuclear spins by engineering the isotopic composition. A specific device is suggested, which allows one to model the processes of recording, reading and information transfer on a quantum level using the technique of electrical detection of the magnetic state of nuclear spins. Improvement of this technique for a semiconductor system with a relatively small number of nuclei might be applied to the manipulation of nuclear spin ''qubits'' in the future S-NSQC.

cond-mat.mes-hall↗

arXiv1999

A possible role of D^- band in hopping conductivity and metal-insulator transition in 2D structures

A simple two-band model is suggested explaining recently reported unusual features for hopping magnetoresistance and the metal-insulator transition in 2D structures. The model implies that the conductivity is dominated by the upper Hubbard band (D^- band). Experimental studies of hopping magnetoresistance for Si delta doped GaAs/AlGaAs heterostructure give additional evidences for the model.

cond-mat.mes-hall↗

arXiv1999

Fluctuation-Stimulated Variable-Range Hopping

Qualitatively new transport mechanism is suggested for hopping of carriers according to which the variable-range hopping (VRH) arises from the resonant tunneling between transport states brought into resonance by Coulomb potentials produced by surrounding sites with fluctuating occupations. A semiquantitative description of the hopping transport is given based on the assumption that fluctuations of energies of hopping sites have spectral density 1/f.

cond-mat.dis-nn↗