Searcharxiv⌕ Search

arXiv subjects

Jörg Pezoldt

Publications and source records attributed to Jörg Pezoldt.

2 recordsLinked to original sources

Photoluminescence kinetics of dark and bright excitons in atomically thin MoS$_2$

The fine structure of the exciton spectrum, containing optically allowed (bright) and forbidden (dark) exciton states, determines the radiation efficiency in nanostructures. We study time-resolved micro-photoluminescence in MoS$_2$ monolayers and bilayers, both unstrained and compressively strained, in a wide temperature range (10-300 K) to distinguish between exciton states optically allowed and forbidden, both in spin and momentum, as well as to estimate their characteristic decay times and contributions to the total radiation intensity. The decay times were found to either increase or decrease with increasing temperature, indicating the lowest bright or lowest dark state, respectively. Our results unambiguously show that, in an unstrained monolayer, the spin-allowed state is the lowest for a series of A excitons (1.9 eV) with the dark state being < 2 meV higher, and that the splitting energy can increase several times at compression. In contrast, in the indirect exciton series in bilayers (1.5 eV), the spin-forbidden state is the lowest, being about 3 meV below the bright one. The strong effect of strain on the exciton spectrum can explain the large scatter among the published data and must be taken into account to realize the desired optical properties of 2D MoS$_2$.

cond-mat.mes-hall↗

Ge incorporation inside 4H-SiC during Homoepitaxial growth by chemical vapor deposition

In this work, we report on the addition of GeH4 gas during homoepitaxial growth of 4H-SiC by chemical vapour deposition. Ge introduction does not affect dramatically the surface morphology and defect density though it is accompanied with Ge droplets accumulation at the surface. The Ge incorporation level inside the 4H-SiC matrix, ranging from few 1017 to few 1018 at.cm-3, was found to be mainly affected by the growth temperature and GeH4 flux. Other growth parameters like C/Si ratio, polarity, or off-orientation did not show any significant influence. On the other hand, adding GeH4 led to the increase of the intentional n type doping level by a factor of 2 to 5 depending on the C/Si ratio in the gas phase.

cond-mat.mtrl-sci↗