arXiv subjects

J. Olea

Publications and source records attributed to J. Olea.

3 recordsLinked to original sources

arXiv2025

Low-to-mid Al content ($x\sim$ 0-0.56) Al$_x$In$_{1-x}$N layers deposited on Si(100) by radio-frequency sputtering

Radio-frequency (RF) sputtering is a low-cost technique for the deposition of large-area single-phase AlInN on silicon layers with application in photovoltaic devices. Here, the effect of the Al mole fraction x from 0 to 0.56 on the structural, morphological, electrical, and optical properties of $n$ Al$_x$In$_{1-x}$N layers deposited at 550 $^\circ$C on p-Si(100) by RF sputtering is studied. X-ray diffraction data show a wurtzite structure oriented along the c-axis in all samples, where the full width at half maximum of the rocking curve around the InN (0002) diffraction peak decreases from $\sim 9^\circ$ to $\sim 3^\circ$ while incorporating Al to the AlInN layer. The rootmean-square surface roughness, estimated from atomic force microscopy, evolves from 20 nm for InN to 1.5 nm for Al$_{0.56}$In$_{0.44}$N. Low-temperature photoluminescence spectra show a blueshift of the emission energy from 1.59 eV (779 nm) for InN to 1.82 eV (681 nm) for Al$_{0.35}$In$_{0.65}$N according to the Al content rise. Hall effect measurements of Al$_x$In$_{1-x}$N ($0<x <0.35$) on sapphire samples grown simultaneously point to a residual n-type carrier concentration in the 1021 cm$^{-3}$ range. The developed n-AlInN/p-Si junctions present promising material properties to explore their performance operating as solar cell devices.

cond-mat.mtrl-sci↗

arXiv2019

High quality Al$_{0.37}$In$_{0.63}$N layers grown at low temperature (<300$^\circ$C) by radio-frequency sputtering

High-quality Al0.37In0.63N layers have been grown by reactive radio-frequency (RF) sputtering on sapphire, glass and Si (111) at low substrate temperature (from room temperature to 300°C). Their structural, chemical and optical properties are investigated as a function of the growth temperature and type of substrate. X-ray diffraction measurements reveal that all samples have a wurtzite crystallographic structure oriented with the c-axis perpendicular to the substrate surface, without parasitic orientations. The layers preserve their Al content at 37 % for the whole range of studied growth temperature. The samples grown at low temperatures (RT and 100°C) are almost fully relaxed, showing a closely-packed columnar-like morphology with an RMS surface roughness below 3 nm. The optical band gap energy estimated for layers grown at RT and 100°C on sapphire and glass substrates is of ~2.4 eV while it red shifts to ~2.03 eV at 300°C. The feasibility of growing high crystalline quality AlInN at low growth temperature even on amorphous substrates open new application fields for this material like surface plasmon resonance sensors developed directly on optical fibers and other applications where temperature is a handicap and the material cannot be heated.

physics.app-ph↗

arXiv2018

Influence of the AlN interlayer thickness on the photovoltaic properties of In-rich AlInN on Si heterojunctions deposited by RF sputtering

We report the influence of the AlN interlayer thickness (0-15 nm) on the photovoltaic properties of Al0.37In0.63N on Si heterojunction solar cells deposited by radio frequency sputtering. The poor junction band alignment and the presence of a 2-3 nm thick amorphous layer at the interface mitigates the response in devices fabricated by direct deposition of n-AlInN on p-Si(111). Adding a 4-nm-thick AlN buffer layer improves the AlInN crystalline quality and the interface alignment leading to devices with a conversion efficiency of 1.5% under 1-sun AM1.5G illumination. For thicker buffers the performance lessens due to inefficient tunnel transport through the AlN. These results demonstrate the feasibility of using In-rich AlInN alloys deposited by radio frequency sputtering as novel electron-selective contacts to Si-heterojunction solar cells.

physics.app-ph↗