Searcharxiv⌕ Search

arXiv subjects

J. Ruud van Ommen

Publications and source records attributed to J. Ruud van Ommen.

2 recordsLinked to original sources

Ionomer-free Iridium Anodes with Low Loading for Zero-gap Electrolyzers via Direct Atomic Layer Deposition

Proton exchange membrane water electrolysis (PEMWE) is among the most promising techniques to provide hydrogen as both energy carrier and feedstock for the chemical industry, due to its compatibility with intermittent renewable electricity sources. However, a major bottleneck in scaling up PEMWE is the limited supply of the anode catalyst Ir. This work shows a novel approach to tailoring ionomer-free catalyst layers based on custom-made microporous substrates and two different atomic layer deposition (ALD) processes, both using Ir(EtCp)(CHD) precursor. Thermal ALD using O3 as counter-reactant yields mostly metallic Ir/IrOx and an electrode Ir loading of 0.21 mg/cm2. The PEMWE cell-level performance is comparable to a commercial catalyst-coated membrane anode despite 7x lower loading, and is maintained over an accelerated durability test equivalent to 600 h of intermittent operation. Moreover, using a low-loading ALD-made cathode, the total platinum group metal loading is only 0.24 mg/cm2. Plasma-enhanced ALD reduces the Ir loading to 0.04 mg/cm2 by tailoring the catalyst distribution, however, yields lower-activity IrO2. Finally, direct ALD catalyst deposition needs no ionomer-bearing ink. The anodes are therefore compatible with various membrane materials, as demonstrated in a CO2 electrolysis experiment with an anion exchange membrane.

cond-mat.mtrl-sci↗

Atomic layer deposition on particulate materials from 1988 through 2023: A quantitative review of technologies, materials and applications

Atomic layer deposition (ALD) is widely studied for numerous applications and is commercially employed in the semiconductor industry, where planar substrates are the norm. However, the inherent ALD feature of coating virtually any surface geometry with atomistic thickness control is equally attractive for coating particulate materials (supports). In this review, we provide a comprehensive overview of the developments in this decades-old field of ALD on particulate materials, drawing on a bottom-up and quantitative analysis of 799 articles from this field. The obtained dataset is the basis for abstractions regarding reactor types (specifically for particles), coating materials, reactants, supports and processing conditions. Furthermore, the dataset enables direct access to specific processing conditions (for a given material, surface functionality, application etc.) and increases accessibility of the respective literature. We also review fundamental concepts of ALD on particles, and discuss the most common applications, i.e., catalysis (thermo-, electro-, photo-), batteries, luminescent phosphors and healthcare. Finally, we identify historical trends, and provide an outlook on prospective developments.

cond-mat.mtrl-sci↗